Inventor · disambiguated record
Kanshi Chinone
Also filed as: CHINONE KANSHI
5 granted patents·3 pending applications·17 citations·filing 2004–2012
70Inventor score
Technology areasH10P
Top patents by PatentIndex Score
8 records- 0183US8853082B2Polishing liquid for CMP and polishing method using the sameHANANO MASAYUKI·Filed 2010·Granted Oct 7, 2014·15 cites·39 claims
- 0266US8323604B2Cerium salt, producing method thereof, cerium oxide and cerium based polishing slurryCHINONE KANSHI·Filed 2010·Granted Dec 4, 2012·2 cites·13 claims
- 0347US2013014446A1Cerium salt, producing method thereof, serium oxide and cerium based polishing slurryHITACHI CHEMICAL CO LTD·Filed 2012·Application pending·0 cites
- 0442US8439995B2Abrasive compounds for semiconductor planarizationCHINONE KANSHI·Filed 2010·Granted May 14, 2013·0 cites·11 claims
- 0539US2007166216A1Cerium salt, producing method thereof, cerium oxide and cerium based polishing slurryHITACHI CHEMICAL CO LTD·Filed 2004·Application pending·0 cites
- 0638US2006283092A1Abrasive compounds for semiconductor planarizationHITACHI CHEMICAL CO LTD·Filed 2004·Application pending·0 cites
- 0732US8328893B2Method of producing oxide particles, slurry, polishing slurry, and method of polishing substrateSAKURADA TAKAFUMI·Filed 2007·Granted Dec 11, 2012·0 cites·46 claims
- 0830US9022834B2Polishing solution for CMP and polishing method using the polishing solutionSATOU EIICHI·Filed 2011·Granted May 5, 2015·0 cites·22 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →