Inventor · disambiguated record
Wayne French
Also filed as: FRENCH WAYNE · FRENCH WAYNE R
5 granted patents·7 pending applications·22 citations·filing 2008–2025
74Inventor score
Top patents by PatentIndex Score
12 records- 0193US8053364B2Closed-loop sputtering controlled to enhance electrical characteristics in deposited layerINTERMOLECULAR INC·Filed 2008·Granted Nov 8, 2011·18 cites·11 claims
- 0272US9029232B2Nonvolatile memory elementsINTERMOLECULAR INC·Filed 2014·Granted May 12, 2015·1 cites·20 claims
- 0371US2025224678A1Photoresist deposition using independent multichannel showerheadAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0469US12282256B2Photoresist deposition using independent multichannel showerheadAPPLIED MATERIALS INC·Filed 2021·Granted Apr 22, 2025·0 cites·18 claims
- 0567US9040465B2Dielectric doping using high productivity combinatorial methodsINTERMOLECULAR INC·Filed 2012·Granted May 26, 2015·2 cites·19 claims
- 0659US8895951B2Closed loop sputtering controlled to enhance electrical characteristics in deposited layerFRENCH WAYNE R·Filed 2011·Granted Nov 25, 2014·1 cites·19 claims
- 0759US2023124304A1Controlled delivery of low-vapor-pressure precursor into a chamberAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 0858US2024128061A1Apparatus design for film removal from the bevel and edge of the substrateAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 0952US2022197146A1Photoresists by physical vapor depositionAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 1050US2022199406A1Vapor deposition of carbon-doped metal oxides for use as photoresistsAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 1144US2013171832A1Enhanced Isolation For Combinatorial Atomic Layer Deposition (ALD)FRENCH WAYNE·Filed 2011·Application pending·0 cites
- 1239US2014166840A1Substrate CarrierINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →