Inventor · disambiguated record
David S. Ballance
Also filed as: BALLANCE DAVID S · BALLANCE DAVID STEPHEN
22 granted patents·1,879 citations·filing 1991–2014
97Inventor score
Top patents by PatentIndex Score
22 records- 0198US5781693AGas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetweenAPPLIED MATERIALS INC·Filed 1996·Granted Jul 14, 1998·909 cites·28 claims
- 0296US6090210AMulti-zone gas flow control in a process chamberAPPLIED MATERIALS INC·Filed 1996·Granted Jul 18, 2000·234 cites·16 claims
- 0391US7884321B2Method and system for non-destructive distribution profiling of an element in a filmREVERA INC·Filed 2008·Granted Feb 8, 2011·10 cites·4 claims
- 0490US8269167B2Method and system for non-destructive distribution profiling of an element in a filmDECECCO PAOLA·Filed 2011·Granted Sep 18, 2012·9 cites·8 claims
- 0590US5960555AMethod and apparatus for purging the back side of a substrate during chemical vapor processingAPPLIED MATERIALS INC·Filed 1997·Granted Oct 5, 1999·92 cites·24 claims
- 0684US5848889ASemiconductor wafer support with graded thermal massAPPLIED MATERIALS INC·Filed 1996·Granted Dec 15, 1998·74 cites·27 claims
- 0783US6395363B1Sloped substrate supportAPPLIED MATERIALS INC·Filed 1996·Granted May 28, 2002·88 cites·18 claims
- 0882US9201030B2Method and system for non-destructive distribution profiling of an element in a filmDECECCO PAOLA·Filed 2014·Granted Dec 1, 2015·2 cites·4 claims
- 0982US5320868AMethod of forming SI-O containing coatingsDOW CORNING·Filed 1993·Granted Jun 14, 1994·42 cites·10 claims
- 1079US5884412AMethod and apparatus for purging the back side of a substrate during chemical vapor processingAPPLIED MATERIALS INC·Filed 1996·Granted Mar 23, 1999·49 cites·24 claims
- 1179US5145723AProcess for coating a substrate with silicaDOW CORNING·Filed 1991·Granted Sep 8, 1992·70 cites·10 claims
- 1277US8610059B2Method and system for non-destructive distribution profiling of an element in a filmDECECCO PAOLA·Filed 2012·Granted Dec 17, 2013·2 cites·11 claims
- 1377US6123766AMethod and apparatus for achieving temperature uniformity of a substrateAPPLIED MATERIALS INC·Filed 1997·Granted Sep 26, 2000·37 cites·15 claims
- 1474US5441765AMethod of forming Si-O containing coatingsDOW CORNING·Filed 1993·Granted Aug 15, 1995·48 cites·12 claims
- 1573US6133152ACo-rotating edge ring extension for use in a semiconductor processing chamberAPPLIED MATERIALS INC·Filed 1997·Granted Oct 17, 2000·43 cites·22 claims
- 1673US5523163ALow dielectric constant coatingsDOW CORNING·Filed 1995·Granted Jun 4, 1996·39 cites·3 claims
- 1771US5310583AVapor phase deposition of hydrogen silsesquioxane resin in the presence of nitrous oxideDOW CORNING·Filed 1992·Granted May 10, 1994·35 cites·13 claims
- 1861US5920797AMethod for gaseous substrate supportAPPLIED MATERIALS INC·Filed 1996·Granted Jul 6, 1999·25 cites·22 claims
- 1960US6035100AReflector cover for a semiconductor processing chamberAPPLIED MATERIALS INC·Filed 1997·Granted Mar 7, 2000·25 cites·22 claims
- 2059US5436029ACuring silicon hydride containing materials by exposure to nitrous oxideDOW CORNING·Filed 1992·Granted Jul 25, 1995·33 cites·17 claims
- 2154US8916823B2Method and system for non-destructive distribution profiling of an element in a filmREVARA INC·Filed 2013·Granted Dec 23, 2014·0 cites·12 claims
- 2243US5820923ACuring silica precursors by exposure to nitrous oxideDOW CORNING·Filed 1992·Granted Oct 13, 1998·13 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →