Inventor · disambiguated record
Heinz Reinhardt
Also filed as: REINHARDT HEINZ · REINHARDT HEINZ F
20 granted patents·7 pending applications·1,447 citations·filing 1994–2011
97Inventor score
Files withRODEL INC14FREUDENBERG CARL KG3ROHM & HAAS ELECT MAT3GUENTHER JUERGEN1LAZAREVIC ALEXANDRA1
Top patents by PatentIndex Score
27 records- 0198US5578362APolymeric polishing pad containing hollow polymeric microelementsRODEL INC·Filed 1994·Granted Nov 26, 1996·433 cites·21 claims
- 0297US5900164AMethod for planarizing a semiconductor device surface with polymeric pad containing hollow polymeric microelementsRODEL INC·Filed 1997·Granted May 4, 1999·141 cites·17 claims
- 0394US6231434B1Polishing pads and methods relating theretoRODEL INC·Filed 2000·Granted May 15, 2001·44 cites·2 claims
- 0494US6017265AMethods for using polishing padsRODEL INC·Filed 1997·Granted Jan 25, 2000·186 cites·8 claims
- 0593US6899611B2Polishing pad for a semiconductor device having a dissolvable substanceROHM & HAAS ELECT MAT·Filed 2002·Granted May 31, 2005·32 cites·8 claims
- 0692US6069080AFixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the likeRODEL INC·Filed 1998·Granted May 30, 2000·126 cites·37 claims
- 0790US6337281B1Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the likeRODEL INC·Filed 2000·Granted Jan 8, 2002·44 cites·31 claims
- 0890US6095902APolyether-polyester polyurethane polishing pads and related methodsRODEL INC·Filed 1998·Granted Aug 1, 2000·86 cites·6 claims
- 0989US6419556B1Method of polishing using a polishing padRODEL INC·Filed 2000·Granted Jul 16, 2002·33 cites·7 claims
- 1087US6454633B1Polishing pads of flocked hollow fibers and methods relating theretoRODEL INC·Filed 2000·Granted Sep 24, 2002·31 cites·9 claims
- 1186US6099954APolishing material and method of polishing a surfaceRODEL INC·Filed 1999·Granted Aug 8, 2000·72 cites·7 claims
- 1285US6894620B2Method and device for monitoring the service life of a filterFREUDENBERG CARL KG·Filed 2002·Granted May 17, 2005·38 cites·17 claims
- 1385US6439989B1Polymeric polishing pad having continuously regenerated work surfaceRODEL INC·Filed 1999·Granted Aug 27, 2002·39 cites·14 claims
- 1484US6325703B2Polishing pads and methods relating theretoRODEL INC·Filed 2001·Granted Dec 4, 2001·23 cites·11 claims
- 1583US6019666AMosaic polishing pads and methods relating theretoRODEL INC·Filed 1998·Granted Feb 1, 2000·69 cites·21 claims
- 1678US6106754AMethod of making polishing padsRODEL INC·Filed 1997·Granted Aug 22, 2000·35 cites·9 claims
- 1765US6903021B2Method of polishing a semiconductor deviceROHM & HAAS ELECT MAT·Filed 2004·Granted Jun 7, 2005·6 cites·10 claims
- 1861US8709138B2Filter medium for particulate filtrationLAZAREVIC ALEXANDRA·Filed 2009·Granted Apr 29, 2014·5 cites·16 claims
- 1960US8128729B2Filter arrangementGUENTHER JUERGEN·Filed 2011·Granted Mar 6, 2012·2 cites·17 claims
- 2052US2005221741A1Polymeric polishing pad having continuously regenerated work surfaceREINHARDT HEINZ F·Filed 2005·Application pending·0 cites
- 2149US7270762B2Polishing compositions for noble metalsROHM & HAAS ELECT MAT·Filed 2003·Granted Sep 18, 2007·2 cites·10 claims
- 2249US2009211455A1Filter arrangementFREUDENBERG CARL KG·Filed 2006·Application pending·0 cites
- 2338US2002039839A1Polishing compositions for noble metalsFiled 2001·Application pending·0 cites
- 2436US2001050268A1Polishing pad of a polyurethane of propane diolFiled 2001·Application pending·0 cites
- 2535US2003006396A1Polishing composition for CMP having abrasive particlesFiled 2002·Application pending·0 cites
- 2635US2002111027A1Polishing compositions for noble metalsFiled 2000·Application pending·0 cites
- 2732US2006130442A1Ozone filter materialFREUDENBERG CARL KG·Filed 2003·Application pending·0 cites
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