Inventor · disambiguated record
Atsuko Takafuji
Also filed as: TAKAFUJI ATSUKO
37 granted patents·3 pending applications·1,142 citations·filing 1991–2012
98Inventor score
Top patents by PatentIndex Score
40 records- 0199US6172363B1Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 1997·Granted Jan 9, 2001·185 cites·20 claims
- 0298US6583413B1Method of inspecting a circuit pattern and inspecting instrumentHITACHI LTD·Filed 2000·Granted Jun 24, 2003·123 cites·14 claims
- 0397US6329826B1Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2000·Granted Dec 11, 2001·95 cites·4 claims
- 0496US7417444B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2005·Granted Aug 26, 2008·25 cites·7 claims
- 0596US6700122B2Wafer inspection system and wafer inspection process using charged particle beamHITACHI LTD·Filed 2002·Granted Mar 2, 2004·88 cites·12 claims
- 0695US6797954B2Patterned wafer inspection method and apparatus thereforHITACHI LTD·Filed 2003·Granted Sep 28, 2004·42 cites·7 claims
- 0793US6348690B1Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 1998·Granted Feb 19, 2002·51 cites·30 claims
- 0891US6825480B1Charged particle beam apparatus and automatic astigmatism adjustment methodHITACHI LTD·Filed 2000·Granted Nov 30, 2004·38 cites·10 claims
- 0990US7952074B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2008·Granted May 31, 2011·8 cites·18 claims
- 1090US7397031B2Method of inspecting a circuit pattern and inspecting instrumentHITACHI LTD·Filed 2006·Granted Jul 8, 2008·10 cites·7 claims
- 1190US6979823B2Patterned wafer inspection method and apparatus thereforHITACHI LTD·Filed 2004·Granted Dec 27, 2005·21 cites·9 claims
- 1287US7242015B2Patterned wafer inspection method and apparatus thereforHITACHI LTD·Filed 2005·Granted Jul 10, 2007·6 cites·21 claims
- 1387US7098455B2Method of inspecting a circuit pattern and inspecting instrumentHITACHI LTD·Filed 2003·Granted Aug 29, 2006·26 cites·5 claims
- 1487US7012252B2Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 2005·Granted Mar 14, 2006·5 cites·12 claims
- 1586US6509564B1Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application methodHITACHI LTD·Filed 1999·Granted Jan 21, 2003·39 cites·6 claims
- 1686US6087673AMethod of inspecting pattern and apparatus thereofHITACHI LTD·Filed 1998·Granted Jul 11, 2000·58 cites·29 claims
- 1785US6559663B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2001·Granted May 6, 2003·20 cites·10 claims
- 1885US6452178B2Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 2001·Granted Sep 17, 2002·23 cites·16 claims
- 1984US7439504B2Pattern inspection method and apparatus using electron beamHITACHI LTD·Filed 2005·Granted Oct 21, 2008·6 cites·4 claims
- 2084US7026830B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2003·Granted Apr 11, 2006·19 cites·6 claims
- 2184US6476390B1Method and apparatus for inspecting integrated circuit pattern using a plurality of charged particle beamsHITACHI LTD·Filed 1998·Granted Nov 5, 2002·68 cites·16 claims
- 2281US6236057B1Method of inspecting pattern and apparatus thereof with a differential brightness image detectionHITACHI LTD·Filed 2000·Granted May 22, 2001·15 cites·23 claims
- 2380US7439506B2Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 2007·Granted Oct 21, 2008·3 cites·30 claims
- 2480US6614022B2Pattern inspection method and apparatus using electron beamHITACHI LTD·Filed 2001·Granted Sep 2, 2003·11 cites·28 claims
- 2579US5490193AX-ray computed tomography systemHITACHI LTD·Filed 1991·Granted Feb 6, 1996·50 cites·32 claims
- 2674US6512227B2Method and apparatus for inspecting patterns of a semiconductor device with an electron beamHITACHI LTD·Filed 2001·Granted Jan 28, 2003·10 cites·17 claims
- 2773US7030394B2Charged particle beam apparatus and automatic astigmatism adjustment methodHITACHI LTD·Filed 2004·Granted Apr 18, 2006·8 cites·10 claims
- 2873US6768113B2Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application methodHITACHI LTD·Filed 2002·Granted Jul 27, 2004·7 cites·2 claims
- 2973US6376854B2Method of inspecting a pattern on a substrateHITACHI LTD·Filed 2001·Granted Apr 23, 2002·8 cites·10 claims
- 3071US6987265B2Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 2002·Granted Jan 17, 2006·9 cites·12 claims
- 3171US6940069B2Pattern inspection method and apparatus using electron beamHITACHI LTD·Filed 2003·Granted Sep 6, 2005·6 cites·11 claims
- 3270US5561697AMicrotron electron acceleratorHITACHI MEDICAL CORP·Filed 1995·Granted Oct 1, 1996·52 cites·4 claims
- 3360US8134125B2Method and apparatus of an inspection system using an electron beamIWABUCHI YUKO·Filed 2008·Granted Mar 13, 2012·0 cites·18 claims
- 3459US7348558B2Charged particle beam apparatus and automatic astigmatism adjustment methodHITACHI LTD·Filed 2006·Granted Mar 25, 2008·2 cites·13 claims
- 3559US7232996B2Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 2005·Granted Jun 19, 2007·0 cites·12 claims
- 3657US8604430B2Method and an apparatus of an inspection system using an electron beamIWABUCHI YUKO·Filed 2012·Granted Dec 10, 2013·0 cites·6 claims
- 3744US2003111616A1Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application methodHITACHI LTD·Filed 2002·Application pending·0 cites
- 3842US2006022295A1Evaluation method and manufacturing method of semiconductor deviceTAKAFUJI ATSUKO·Filed 2005·Application pending·0 cites
- 3937US5399873AMicrotron electron acceleratorHITACHI MEDICAL CORP·Filed 1993·Granted Mar 21, 1995·5 cites·25 claims
- 4031US2002117635A1Patterned wafer inspection method and apparatus thereforFiled 1998·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →