Inventor · disambiguated record
Katsuyuki Hishiya
Also filed as: HISHIYA KATSUYUKI
21 granted patents·1 pending application·1,927 citations·filing 2008–2016
96Inventor score
Top patents by PatentIndex Score
22 records- 0198USD655260SGas-separating plate for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Mar 6, 2012·421 cites·1 claims
- 0298USD655261SGas-separating plate for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Mar 6, 2012·421 cites·1 claims
- 0398USD654882SGas-separating plate for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Feb 28, 2012·421 cites·1 claims
- 0498USD654884STop plate for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Feb 28, 2012·525 cites·1 claims
- 0591US9932674B2Film deposition apparatus, film deposition method, and computer-readable recording mediumKATO HITOSHI·Filed 2012·Granted Apr 3, 2018·14 cites·20 claims
- 0687US9453280B2Film deposition apparatus, film deposition method and storage mediumKATO HITOSHI·Filed 2012·Granted Sep 27, 2016·4 cites·5 claims
- 0783US7896648B2Vertical heat processing apparatus and heat processing method using the vertical heat processing apparatusTOKYO ELECTRON LTD·Filed 2008·Granted Mar 1, 2011·10 cites·6 claims
- 0881USD654883STop plate for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Feb 28, 2012·28 cites·1 claims
- 0977US9702043B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jul 11, 2017·1 cites·10 claims
- 1077USD655259STop plate for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Mar 6, 2012·22 cites·1 claims
- 1177USD655257STop plate for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Mar 6, 2012·23 cites·1 claims
- 1274US7922485B2Vertical type heat processing apparatus and vertical type heat processing methodTOKYO ELECTRON LTD·Filed 2008·Granted Apr 12, 2011·5 cites·22 claims
- 1371US8231381B2Processing system for process object and thermal processing method for process objectHISHIYA KATSUYUKI·Filed 2008·Granted Jul 31, 2012·4 cites·16 claims
- 1469US8414242B2Processing apparatus and processing methodHISHIYA KATSUYUKI·Filed 2009·Granted Apr 9, 2013·3 cites·4 claims
- 1568US9062373B2Film deposition apparatusKATO HITOSHI·Filed 2012·Granted Jun 23, 2015·2 cites·13 claims
- 1667US10550467B2Film formation apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Feb 4, 2020·1 cites·9 claims
- 1766US8181769B2Workpiece transfer mechanism, workpiece transfer method and workpiece processing systemHISHIYA KATSUYUKI·Filed 2008·Granted May 22, 2012·3 cites·10 claims
- 1860USD655258SSide wall for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Mar 6, 2012·11 cites·1 claims
- 1953USD655262SSide wall for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Mar 6, 2012·8 cites·1 claims
- 2049US2012094011A1Film deposition apparatus and film deposition methodHISHIYA KATSUYUKI·Filed 2011·Application pending·0 cites
- 2138US10519550B2Film formation apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Dec 31, 2019·0 cites·5 claims
- 2235US9048273B2Substrate conveying container opening/closing device, lid opening/closing device and semiconductor manufacturing apparatusOYAMA KATSUHIKO·Filed 2012·Granted Jun 2, 2015·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →