USD655261SActiveUtility

Gas-separating plate for reactor for manufacturing semiconductor

Assignee: HONMA MANABUPriority: Oct 21, 2010Filed: Apr 13, 2011Granted: Mar 6, 2012

Est. expiryOct 21, 2030(~4.2 yrs left)· nominal 20-yr term from priority

PatentIndex Score

421

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Claims

exact text as granted — not AI-modified

CLAIM 
     
       The ornamental design for gas-separating plate for reactor for manufacturing semiconductor, as shown and described.

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