Inventor · disambiguated record
William L. Guthrie
Also filed as: GUTHRIE WILLIAM · GUTHRIE WILLIAM L · GUTHRIE WILLIAM LESLIE
25 granted patents·2 pending applications·3,672 citations·filing 1985–2015
98Inventor score
Files withAPPLIED MATERIALS INC12IBM9SANDISK TECHNOLOGIES INC2SANDISK TECHNOLOGIES LLC2GUTHRIE WILLIAM L1
Top patents by PatentIndex Score
27 records- 0199US6280290B1Method of forming a transparent window in a polishing padAPPLIED MATERIALS INC·Filed 2000·Granted Aug 28, 2001·165 cites·15 claims
- 0299US6045439AForming a transparent window in a polishing pad for a chemical mechanical polishing apparatusAPPLIED MATERIALS INC·Filed 1999·Granted Apr 4, 2000·228 cites·20 claims
- 0399US5893796AForming a transparent window in a polishing pad for a chemical mechanical polishing apparatusAPPLIED MATERIALS INC·Filed 1996·Granted Apr 13, 1999·739 cites·18 claims
- 0498US4954142AMethod of chemical-mechanical polishing an electronic component substrate and polishing slurry thereforIBM·Filed 1989·Granted Sep 4, 1990·330 cites·24 claims
- 0597US7255629B2Polishing assembly with a windowAPPLIED MATERIALS INC·Filed 2006·Granted Aug 14, 2007·24 cites·15 claims
- 0697US5795215AMethod and apparatus for using a retaining ring to control the edge effectAPPLIED MATERIALS INC·Filed 1996·Granted Aug 18, 1998·243 cites·5 claims
- 0797US4944836AChem-mech polishing method for producing coplanar metal/insulator films on a substrateIBM·Filed 1985·Granted Jul 31, 1990·539 cites·11 claims
- 0897US4789648AMethod for producing coplanar multi-level metal/insulator films on a substrate and for forming patterned conductive lines simultaneously with stud viasIBM·Filed 1985·Granted Dec 6, 1988·526 cites·6 claims
- 0996US7118450B2Polishing pad with window and method of fabricating a window in a polishing padAPPLIED MATERIALS INC·Filed 2005·Granted Oct 10, 2006·19 cites·17 claims
- 1095US5709593AApparatus and method for distribution of slurry in a chemical mechanical polishing systemAPPLIED MATERIALS INC·Filed 1995·Granted Jan 20, 1998·188 cites·10 claims
- 1195US5337015AIn-situ endpoint detection method and apparatus for chemical-mechanical polishing using low amplitude input voltageIBM·Filed 1993·Granted Aug 9, 1994·171 cites·21 claims
- 1293US6910944B2Method of forming a transparent window in a polishing padAPPLIED MATERIALS INC·Filed 2001·Granted Jun 28, 2005·28 cites·45 claims
- 1393US4702792AMethod of forming fine conductive lines, patterns and connectorsIBM·Filed 1985·Granted Oct 27, 1987·120 cites·16 claims
- 1492US6020264AMethod and apparatus for in-line oxide thickness determination in chemical-mechanical polishingIBM·Filed 1997·Granted Feb 1, 2000·141 cites·22 claims
- 1587US9817752B2Data integrity enhancement to protect against returning old versions of dataSANDISK TECHNOLOGIES LLC·Filed 2015·Granted Nov 14, 2017·6 cites·19 claims
- 1687US7011565B2Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatusAPPLIED MATERIALS INC·Filed 2003·Granted Mar 14, 2006·22 cites·41 claims
- 1787US6280297B1Apparatus and method for distribution of slurry in a chemical mechanical polishing systemAPPLIED MATERIALS INC·Filed 2000·Granted Aug 28, 2001·24 cites·15 claims
- 1882US6632377B1Chemical-mechanical planarization of metallurgyIBM·Filed 1999·Granted Oct 14, 2003·70 cites·10 claims
- 1980US10101918B2Systems and methods for generating hint information associated with a host commandSANDISK TECHNOLOGIES INC·Filed 2015·Granted Oct 16, 2018·3 cites·22 claims
- 2080US8364992B2Method and system for reducing power consumption by command selection in a hard disk driveHGST Netherlands BV·Filed 2008·Granted Jan 29, 2013·13 cites·22 claims
- 2179US9824007B2Data integrity enhancement to protect against returning old versions of dataSANDISK TECHNOLOGIES LLC·Filed 2015·Granted Nov 21, 2017·3 cites·25 claims
- 2275US6131271AMethod of planarizing first pole piece layer of write head by lapping without delamination of first pole piece layer from wafer substrateIBM·Filed 1999·Granted Oct 17, 2000·28 cites·21 claims
- 2374US6051499AApparatus and method for distribution of slurry in a chemical mechanical polishing systemAPPLIED MATERIALS INC·Filed 1997·Granted Apr 18, 2000·28 cites·8 claims
- 2468US8949491B1Buffer memory reservation techniques for use with a NAND flash memorySANDISK TECHNOLOGIES INC·Filed 2013·Granted Feb 3, 2015·2 cites·20 claims
- 2558US2014038501A1Transparent window in a polishing padAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 2646US5633195ALaser planarization of zone 1 deposited metal films for submicron metal interconnectsIBM·Filed 1995·Granted May 27, 1997·12 cites·9 claims
- 2744US2008098170A1System and method for incremental RPO-type algorithm in disk driveGUTHRIE WILLIAM L·Filed 2006·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →