US2014038501A1PendingUtilityA1
Transparent window in a polishing pad
Est. expiryMar 28, 2015(expired)· nominal 20-yr term from priority
H10P 52/00B24B 49/12B24B 49/04B24B 51/00B24B 37/013G01B 11/0683B24B 47/12G01B 11/06B24B 37/205
58
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Claims
Abstract
A polishing pad assembly for a chemical mechanical polishing apparatus includes a polishing pad having a polishing surface and a surface opposite the polishing surface for attachment to a platen, and a solid light-transmissive window formed in the polishing pad. The light-transmissive window is more transmissive to light than the polishing pad. The light-transmissive window has a light-diffusing bottom surface.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 - 16 . (canceled)
17 . A polishing article for a chemical mechanical polishing apparatus, comprising:
a polishing pad having a polishing surface, a bottom surface, and an aperture extending from the polishing surface to the bottom surface, the aperture including a first section with a first lateral dimension and a second section with a different second lateral dimension, the first section being closer to the polishing surface than the second section; and a window positioned at least in the first section of the aperture, the window having a top surface and a lower surface, and wherein at least some of the lower surface is recessed relative to the bottom surface of the polishing pad.
18 . The polishing article of claim 17 , wherein the window includes a first portion positioned in the first section of the aperture and a second portion positioned in the second section of the aperture.
19 . The polishing article of claim 18 , wherein the first lateral dimension is larger than the second lateral dimension.
20 . The polishing article of claim 18 , wherein the first lateral dimension is smaller than the second lateral dimension.
21 . The polishing article of claim 17 , wherein the first lateral dimension is larger than the second lateral dimension.
22 . The polishing article of claim 17 , wherein the polishing pad includes a covering layer with the polishing surface and a backing layer with the bottom surface.
23 . The polishing article of claim 22 , wherein the covering layer is secured to the backing layer with an adhesive.
24 . The polishing article of claim 22 , wherein the backing layer is softer than the covering layer.
25 . The polishing article of claim 22 , wherein the first section of the aperture is formed through the covering layer and the second section of the aperture is formed through the backing layer.
26 . The polishing article of claim 25 , wherein the window includes a first portion positioned in the first section of the aperture and a second portion positioned in the second section of the aperture.
27 . The polishing article of claim 26 , wherein the first lateral dimension is larger than the second lateral dimension.
28 . The polishing article of claim 26 , wherein the first lateral dimension is smaller than the second lateral dimension.
29 . The polishing article of claim 25 , wherein the first lateral dimension is larger than the second lateral dimension.
30 . The polishing article of claim 17 , wherein the plug is a polyurethane material.
31 . The polishing article of claim 17 , wherein the window is secured in the aperture by an adhesive.
32 . The polishing article of claim 17 , wherein the window is molded to the polishing pad.
33 . The polishing article of claim 17 , wherein the top surface of the window is substantially coplanar with the polishing surface.
34 . The polishing article of claim 17 , wherein the polishing pad comprises a first material having pores, and the window comprises the first material substantially without pores.Join the waitlist — get patent alerts
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