Inventor · disambiguated record
Luigi Capodieci
Also filed as: CAPODIECI LUIGI
44 granted patents·3 pending applications·1,871 citations·filing 1995–2014
98Inventor score
Top patents by PatentIndex Score
47 records- 0198US6492066B1Characterization and synthesis of OPC structures by fourier space analysis and/or wavelet transform expansionADVANCED MICRO DEVICES INC·Filed 1999·Granted Dec 10, 2002·232 cites·21 claims
- 0298US6044007AModification of mask layout data to improve writeability of OPCADVANCED MICRO DEVICES INC·Filed 1999·Granted Mar 28, 2000·299 cites·23 claims
- 0396US6187483B1Mask quality measurements by fourier space analysisADVANCED MICRO DEVICES INC·Filed 1999·Granted Feb 13, 2001·163 cites·19 claims
- 0495US6978438B1Optical proximity correction (OPC) technique using generalized figure of merit for photolithograhic processingADVANCED MICRO DEVICES INC·Filed 2003·Granted Dec 20, 2005·73 cites·22 claims
- 0594US7080349B1Method of developing optimized optical proximity correction (OPC) fragmentation script for photolithographic processingADVANCED MICRO DEVICES INC·Filed 2004·Granted Jul 18, 2006·62 cites·20 claims
- 0694US6553562B2Method and apparatus for generating masks utilized in conjunction with dipole illumination techniquesASML MASKTOOLS BV·Filed 2001·Granted Apr 22, 2003·258 cites·28 claims
- 0793US7207017B1Method and system for metrology recipe generation and review and analysis of design, simulation and metrology resultsADVANCED MICRO DEVICES INC·Filed 2004·Granted Apr 17, 2007·85 cites·25 claims
- 0891US6583041B1Microdevice fabrication method using regular arrays of lines and spacesADVANCED MICRO DEVICES INC·Filed 2000·Granted Jun 24, 2003·75 cites·25 claims
- 0990US8918745B2Stitch insertion for reducing color density differences in double patterning technology (DPT)WANG LYNN·Filed 2013·Granted Dec 23, 2014·9 cites·20 claims
- 1090US6562639B1Utilizing electrical performance data to predict CD variations across stepper fieldADVANCED MICRO DEVICES INC·Filed 2001·Granted May 13, 2003·65 cites·27 claims
- 1189US7194725B1System and method for design rule creation and selectionADVANCED MICRO DEVICES INC·Filed 2004·Granted Mar 20, 2007·57 cites·22 claims
- 1288US8898606B1Layout pattern correction for integrated circuitsGLOBALFOUNDRIES INC·Filed 2013·Granted Nov 25, 2014·18 cites·20 claims
- 1388US7269804B2System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniquesADVANCED MICRO DEVICES INC·Filed 2004·Granted Sep 11, 2007·27 cites·15 claims
- 1487US8555215B2Methods for decomposing circuit design layouts and for fabricating semiconductor devices using decomposed patternsZOU YI·Filed 2012·Granted Oct 8, 2013·8 cites·18 claims
- 1586US8418105B1Methods for pattern matching in a double patterning technology-compliant physical design flowWANG LYNN T·Filed 2012·Granted Apr 9, 2013·13 cites·15 claims
- 1686US7310155B1Extraction of tool independent line-edge-roughness (LER) measurements using in-line programmed LER and reliability structuresADVANCED MICRO DEVICES INC·Filed 2004·Granted Dec 18, 2007·25 cites·16 claims
- 1783US6115108AIllumination modification scheme synthesis using lens characterization dataADVANCED MICRO DEVICES INC·Filed 1998·Granted Sep 5, 2000·52 cites·11 claims
- 1882US8924896B2Automated design layout pattern correction based on context-aware patternsWANG LYNN·Filed 2013·Granted Dec 30, 2014·8 cites·16 claims
- 1982US8516407B1Methods for quantitatively evaluating the quality of double patterning technology-compliant layoutsWANG LYNN T·Filed 2012·Granted Aug 20, 2013·9 cites·19 claims
- 2082US7657864B2System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniquesGLOBALFOUNDRIES INC·Filed 2007·Granted Feb 2, 2010·5 cites·15 claims
- 2181US7263683B1Simplified optical proximity correction based on 1-dimension versus 2-dimension pattern shape classificationADVANCED MICRO DEVICES INC·Filed 2004·Granted Aug 28, 2007·18 cites·24 claims
- 2280US7354682B1Chromeless mask for contact holesADVANCED MICRO DEVICES INC·Filed 2004·Granted Apr 8, 2008·17 cites·28 claims
- 2380US7313769B1Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability marginADVANCED MICRO DEVICES INC·Filed 2004·Granted Dec 25, 2007·30 cites·20 claims
- 2480US7313777B1Layout verification based on probability of printing faultADVANCED MICRO DEVICES INC·Filed 2005·Granted Dec 25, 2007·10 cites·30 claims
- 2578US6272392B1Methodology for extracting effective lens aberrations using a neural networkADVANCED MICRO DEVICES INC·Filed 1998·Granted Aug 7, 2001·39 cites·16 claims
- 2678US6013396AFabrication of chrome/phase grating phase shift mask by interferometric lithographyADVANCED MICRO DEVICES INC·Filed 1998·Granted Jan 11, 2000·38 cites·10 claims
- 2775US7757190B2Design rules checking augmented with pattern matchingADVANCED MICRO DEVICES INC·Filed 2006·Granted Jul 13, 2010·8 cites·12 claims
- 2873US7799517B1Single/double dipole mask for contact holesGLOBALFOUNDRIES INC·Filed 2004·Granted Sep 21, 2010·11 cites·17 claims
- 2973US6262435B1Etch bias distribution across semiconductor waferFiled 1998·Granted Jul 17, 2001·36 cites·6 claims
- 3068US8103979B2System for generating and optimizing mask assist features based on hybrid (model and rules) methodologyZOU YI·Filed 2008·Granted Jan 24, 2012·2 cites·13 claims
- 3168US7015148B1Reduce line end pull back by exposing and etching space after mask one trim and etchADVANCED MICRO DEVICES INC·Filed 2004·Granted Mar 21, 2006·12 cites·17 claims
- 3268US6040118ACritical dimension equalization across the field by second blanket exposure at low dose over bleachable resistADVANCED MICRO DEVICES INC·Filed 1998·Granted Mar 21, 2000·27 cites·19 claims
- 3363US8910090B2Methods involving pattern matching to identify and resolve potential non-double-patterning-compliant patterns in double patterning applicationsGLOBALFOUNDRIES INC·Filed 2013·Granted Dec 9, 2014·1 cites·11 claims
- 3463US8589844B2Methods for analyzing design rulesMUDDU SWAMY·Filed 2012·Granted Nov 19, 2013·2 cites·19 claims
- 3563US6037082ADesign of a new phase shift mask with alternating chrome/phase structuresADVANCED MICRO DEVICES INC·Filed 1998·Granted Mar 14, 2000·21 cites·16 claims
- 3662US6458606B2Etch bias distribution across semiconductor waferADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 1, 2002·6 cites·18 claims
- 3761US7027130B2Device and method for determining an illumination intensity profile of an illuminator for a lithography systemADVANCED MICRO DEVICES INC·Filed 2004·Granted Apr 11, 2006·6 cites·20 claims
- 3860US7543256B1System and method for designing an integrated circuit deviceADVANCED MICRO DEVICES INC·Filed 2004·Granted Jun 2, 2009·6 cites·2 claims
- 3960US7305645B1Method for manufacturing place & route based on 2-D forbidden patternsADVANCED MICRO TECHNOLOGIES IN·Filed 2004·Granted Dec 4, 2007·9 cites·31 claims
- 4057US6974652B1Lithographic photomask and method of manufacture to improve photomask test measurementADVANCED MICRO DEVICES INC·Filed 2003·Granted Dec 13, 2005·4 cites·22 claims
- 4157US5717612APost-exposure bake simulator for chemically amplified photoresistsADVANCED MICRO DEVICES INC·Filed 1995·Granted Feb 10, 1998·16 cites·22 claims
- 4253US7071085B1Predefined critical spaces in IC patterning to reduce line end pull backADVANCED MICRO DEVICES INC·Filed 2004·Granted Jul 4, 2006·4 cites·18 claims
- 4352US8124300B1Method of lithographic mask correction using localized transmission adjustmentSINGH BHANWAR·Filed 2004·Granted Feb 28, 2012·4 cites·20 claims
- 4446US6995433B1Microdevice having non-linear structural component and method of fabricationADVANCED MICRO DEVICES INC·Filed 2004·Granted Feb 7, 2006·1 cites·13 claims
- 4546US2015286763A1Pattern matching for predicting defect limited yieldGLOBALFOUNDRIES INC·Filed 2014·Application pending·0 cites
- 4646US2009144686A1Method and apparatus for monitoring marginal layout design rulesLENSING KEVIN R·Filed 2007·Application pending·0 cites
- 4745US2009144692A1Method and apparatus for monitoring optical proximity correction performanceCAIN JASON P·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →