Inventor · disambiguated record
Tomohisa Konno
Also filed as: KONNO TOMOHISA
18 granted patents·11 pending applications·298 citations·filing 2001–2013
95Inventor score
Top patents by PatentIndex Score
29 records- 0191US8513127B2Chemical mechanical planarization processes for fabrication of FinFET devicesCHANG JOSEPHINE B·Filed 2011·Granted Aug 20, 2013·10 cites·20 claims
- 0290US6747095B2Crosslinked rubber particles and rubber compositionsJSR CORP·Filed 2001·Granted Jun 8, 2004·33 cites·10 claims
- 0389US8524606B2Chemical mechanical planarization with overburden maskCHARNS LESLIE·Filed 2011·Granted Sep 3, 2013·11 cites·25 claims
- 0489US6832949B2Window member for chemical mechanical polishing and polishing padJSR CORP·Filed 2002·Granted Dec 21, 2004·44 cites·24 claims
- 0589US6653404B2Rubber compositionsJSR CORP·Filed 2001·Granted Nov 25, 2003·33 cites·14 claims
- 0688US7498294B2Cleaning composition, method for cleaning semiconductor substrate, and process for manufacturing semiconductor deviceJSR CORP·Filed 2005·Granted Mar 3, 2009·15 cites·16 claims
- 0788US6559219B2Rubber compositionsJSR CORP·Filed 2001·Granted May 6, 2003·31 cites·20 claims
- 0884US6727307B2Rubber compositionBRIDGESTONE CORP·Filed 2001·Granted Apr 27, 2004·20 cites·7 claims
- 0983US7183211B2Process for chemical mechanical polishing of semiconductor substrate and aqueous dispersion for chemical mechanical polishingJSR CORP·Filed 2003·Granted Feb 27, 2007·29 cites·51 claims
- 1080US6699935B2Rubber compositionJSR CORP·Filed 2001·Granted Mar 2, 2004·21 cites·33 claims
- 1179US6562929B2Conjugated diene-based rubber and method of producing the same, oil extended rubber and rubber composition containing the sameJSR CORP·Filed 2001·Granted May 13, 2003·15 cites·22 claims
- 1275US6703470B2Conjugated diene-based rubber, oil extended rubber and rubber composition containing the sameJSR CORP·Filed 2001·Granted Mar 9, 2004·10 cites·20 claims
- 1373US6740704B2Methods for producing diene-based rubber/inorganic compound complexes and rubber compositions containing the sameJSR CORP·Filed 2001·Granted May 25, 2004·12 cites·13 claims
- 1472US8497210B2Shallow trench isolation chemical mechanical planarizationCHARNS LESLIE·Filed 2011·Granted Jul 30, 2013·2 cites·25 claims
- 1570US8574330B2Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method for semiconductor deviceNAMIE YUUJI·Filed 2007·Granted Nov 5, 2013·5 cites·14 claims
- 1665US7378349B2Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing methodJSR CORP·Filed 2005·Granted May 27, 2008·2 cites·8 claims
- 1753US2008274620A1Chemical mechanical polishing agent kit and chemical mechanical polishing method using the sameJSR CORP·Filed 2008·Application pending·0 cites
- 1852US8507383B2Fabrication of replacement metal gate devicesANDO TAKASHI·Filed 2011·Granted Aug 13, 2013·0 cites·24 claims
- 1948US2014011360A1Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method for semiconductor deviceJSR CORP·Filed 2013·Application pending·0 cites
- 2045US6977286B2Crosslinked rubber particles and rubber compositionsJSR CORP·Filed 2004·Granted Dec 20, 2005·5 cites·17 claims
- 2143US2008045016A1Cleaning composition, cleaning method, and manufacturing method of semiconductor deviceJSR CORP·Filed 2007·Application pending·0 cites
- 2243US2004237413A1Chemical mechanical polishing agent kit and chemical mechanical polishing method using the sameJSR CORP·Filed 2004·Application pending·0 cites
- 2342US2006276041A1Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersionJSR CORP·Filed 2006·Application pending·0 cites
- 2441US2004030027A1Diene rubber/inorganic compound composite and method for producing the same and rubber compositionFiled 2001·Application pending·0 cites
- 2540US2015344739A1Aqueous dispersion for chemical mechanical polishing, and chemical mechanical polishing methodJSR CORP·Filed 2013·Application pending·0 cites
- 2640US2009088511A1Electroless plating liquidJSR CORP·Filed 2007·Application pending·0 cites
- 2738US2009325383A1Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method for semiconductor deviceJSR CORP·Filed 2008·Application pending·0 cites
- 2838US2004162011A1Aqueous dispersion for chemical mechanical polishing and production process of semiconductor deviceJSR CORP·Filed 2003·Application pending·0 cites
- 2937US2013005219A1Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method using sameJSR CORP·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →