Inventor · disambiguated record
Madhavi R. Chandrachood
Also filed as: CHANDRACHOOD MADHAVI · CHANDRACHOOD MADHAVI R · CHANDRACHOOD MADHAVI RAJARAM
36 granted patents·9 pending applications·1,177 citations·filing 1996–2021
98Inventor score
Files withAPPLIED MATERIALS INC33CHANDRACHOOD MADHAVI R3KUMAR AJAY3CHANDRACHOOD MADHAVI2LEWINGTON RICHARD2
Top patents by PatentIndex Score
45 records- 0199US7955516B2Etching of nano-imprint templates using an etch reactorAPPLIED MATERIALS INC·Filed 2007·Granted Jun 7, 2011·522 cites·17 claims
- 0297US7682518B2Process for etching a metal layer suitable for use in photomask fabricationAPPLIED MATERIALS INC·Filed 2006·Granted Mar 23, 2010·183 cites·18 claims
- 0393US7771895B2Method of etching extreme ultraviolet light (EUV) photomasksAPPLIED MATERIALS INC·Filed 2006·Granted Aug 10, 2010·25 cites·26 claims
- 0492US8202441B2Process for etching a metal layer suitable for use in photomask fabricationCHANDRACHOOD MADHAVI R·Filed 2010·Granted Jun 19, 2012·22 cites·17 claims
- 0592US7909961B2Method and apparatus for photomask plasma etchingAPPLIED MATERIALS INC·Filed 2006·Granted Mar 22, 2011·21 cites·4 claims
- 0691US7976671B2Mask etch plasma reactor with variable process gas distributionAPPLIED MATERIALS INC·Filed 2006·Granted Jul 12, 2011·20 cites·16 claims
- 0791US7520999B2Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one anotherAPPLIED MATERIALS INC·Filed 2006·Granted Apr 21, 2009·16 cites·20 claims
- 0890US7943005B2Method and apparatus for photomask plasma etchingAPPLIED MATERIALS INC·Filed 2006·Granted May 17, 2011·15 cites·19 claims
- 0989US9218944B2Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensorsCHANDRACHOOD MADHAVI R·Filed 2006·Granted Dec 22, 2015·15 cites·12 claims
- 1089US6106634AMethods and apparatus for reducing particle contamination during wafer transportAPPLIED MATERIALS INC·Filed 1999·Granted Aug 22, 2000·83 cites·22 claims
- 1188US7967930B2Plasma reactor for processing a workpiece and having a tunable cathodeAPPLIED MATERIALS INC·Filed 2006·Granted Jun 28, 2011·11 cites·21 claims
- 1287US7504041B2Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicatorAPPLIED MATERIALS INC·Filed 2006·Granted Mar 17, 2009·13 cites·15 claims
- 1387US6371836B1Groove cleaning device for chemical-mechanical polishingAPPLIED MATERIALS INC·Filed 2000·Granted Apr 16, 2002·26 cites·9 claims
- 1483US8017029B2Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backsideAPPLIED MATERIALS INC·Filed 2006·Granted Sep 13, 2011·7 cites·19 claims
- 1583US6192601B1Method and apparatus for reducing particle contamination during wafer transportAPPLIED MATERIALS INC·Filed 2000·Granted Feb 27, 2001·26 cites·19 claims
- 1683US6135868AGroove cleaning device for chemical-mechanical polishingAPPLIED MATERIALS INC·Filed 1998·Granted Oct 24, 2000·49 cites·10 claims
- 1782US8002946B2Mask etch plasma reactor with cathode providing a uniform distribution of etch rateAPPLIED MATERIALS INC·Filed 2006·Granted Aug 23, 2011·8 cites·11 claims
- 1881US6572453B1Multi-fluid polishing processAPPLIED MATERIALS INC·Filed 2000·Granted Jun 3, 2003·25 cites·20 claims
- 1975US8012366B2Process for etching a transparent workpiece including backside endpoint detection stepsAPPLIED MATERIALS INC·Filed 2006·Granted Sep 6, 2011·3 cites·16 claims
- 2074US7829243B2Method for plasma etching a chromium layer suitable for photomask fabricationAPPLIED MATERIALS INC·Filed 2005·Granted Nov 9, 2010·4 cites·21 claims
- 2173US6432826B1Planarized Cu cleaning for reduced defectsAPPLIED MATERIALS INC·Filed 1999·Granted Aug 13, 2002·35 cites·30 claims
- 2272US7964818B2Method and apparatus for photomask etchingAPPLIED MATERIALS INC·Filed 2006·Granted Jun 21, 2011·3 cites·11 claims
- 2372US7419551B2Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one anotherAPPLIED MATERIALS INC·Filed 2006·Granted Sep 2, 2008·4 cites·16 claims
- 2469US7521000B2Process for etching photomasksAPPLIED MATERIALS INC·Filed 2004·Granted Apr 21, 2009·6 cites·19 claims
- 2565US7431797B2Plasma reactor with a dynamically adjustable plasma source power applicatorAPPLIED MATERIALS INC·Filed 2006·Granted Oct 7, 2008·2 cites·19 claims
- 2664US8293430B2Method for etching a molybdenum layer suitable for photomask fabricationCHANDRACHOOD MADHAVI·Filed 2005·Granted Oct 23, 2012·2 cites·1 claims
- 2764US6558471B2Scrubber operationAPPLIED MATERIALS INC·Filed 2001·Granted May 6, 2003·10 cites·15 claims
- 2862US7790334B2Method for photomask plasma etching using a protected maskAPPLIED MATERIALS INC·Filed 2005·Granted Sep 7, 2010·1 cites·13 claims
- 2962US6921494B2Backside etching in a scrubberAPPLIED MATERIALS INC·Filed 2003·Granted Jul 26, 2005·8 cites·25 claims
- 3059US11249386B2Extreme ultraviolet mask with backside coatingAPPLIED MATERIALS INC·Filed 2019·Granted Feb 15, 2022·0 cites·20 claims
- 3158US11915932B2Plasma etching of mask materialsAPPLIED MATERIALS INC·Filed 2021·Granted Feb 27, 2024·0 cites·20 claims
- 3257US2014190632A1Method and apparatus for photomask plasma etchingAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 3353US7104267B2Planarized copper cleaning for reduced defectsAPPLIED MATERIALS INC·Filed 2000·Granted Sep 12, 2006·3 cites·54 claims
- 3452US2007017898A1Method and apparatus for photomask plasma etchingKUMAR AJAY·Filed 2006·Application pending·0 cites
- 3548US10170280B2Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wallAPPLIED MATERIALS INC·Filed 2015·Granted Jan 1, 2019·0 cites·15 claims
- 3648US8568553B2Method and apparatus for photomask plasma etchingKUMAR AJAY·Filed 2011·Granted Oct 29, 2013·0 cites·20 claims
- 3748US2013040231A1Method for etching a molybdenum layer suitable for photomask fabricationCHANDRACHOOD MADHAVI·Filed 2012·Application pending·0 cites
- 3848US2008099437A1Plasma reactor for processing a transparent workpiece with backside process endpoint detectionLEWINGTON RICHARD·Filed 2006·Application pending·0 cites
- 3945US2006000802A1Method and apparatus for photomask plasma etchingKUMAR AJAY·Filed 2004·Application pending·0 cites
- 4043US2008179282A1Mask etch processCHANDRACHOOD MADHAVI R·Filed 2007·Application pending·0 cites
- 4142US2008099451A1Workpiece rotation apparatus for a plasma reactor systemLEWINGTON RICHARD·Filed 2006·Application pending·0 cites
- 4241US8778574B2Method for etching EUV material layers utilized to form a photomaskYU KEVEN·Filed 2013·Granted Jul 15, 2014·0 cites·21 claims
- 4339US5777245AParticle dispersing system and method for testing semiconductor manufacturing equipmentAPPLIED MATERIALS INC·Filed 1996·Granted Jul 7, 1998·9 cites·3 claims
- 4435US2010276391A1Inductively coupled plasma reactor having rf phase control and methods of use thereofAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 4530US2001052351A1Method for cleaning semiconductor wafer having copper structure formed thereonFiled 1998·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →