Inventor · disambiguated record
Derren N. Dunn
Also filed as: DUNN DERREN · DUNN DERREN N · DUNN DERREN NEYLON
23 granted patents·5 pending applications·112 citations·filing 2004–2021
94Inventor score
Top patents by PatentIndex Score
28 records- 0195US7402532B2Structure to improve adhesion between top CVD low-k dielectric and dielectric capping layerIBM·Filed 2006·Granted Jul 22, 2008·28 cites·1 claims
- 0292US10706200B2Generative adversarial networks for generating physical design layout patterns of integrated multi-layersIBM·Filed 2018·Granted Jul 7, 2020·9 cites·25 claims
- 0389US10699055B2Generative adversarial networks for generating physical design layout patternsIBM·Filed 2018·Granted Jun 30, 2020·9 cites·25 claims
- 0489US10606975B2Coordinates-based generative adversarial networks for generating synthetic physical design layout patternsIBM·Filed 2018·Granted Mar 31, 2020·6 cites·20 claims
- 0589US10599807B2Automatic generation of via patterns with coordinate-based recurrent neural network (RNN)IBM·Filed 2018·Granted Mar 24, 2020·5 cites·20 claims
- 0687US10990747B2Automatic generation of via patterns with coordinate-based recurrent neural network (RNN)IBM·Filed 2020·Granted Apr 27, 2021·2 cites·20 claims
- 0784US10592635B2Generating synthetic layout patterns by feedforward neural network based variational autoencodersIBM·Filed 2018·Granted Mar 17, 2020·5 cites·20 claims
- 0883US10621301B2Coordinates-based variational autoencoder for generating synthetic via layout patternsIBM·Filed 2018·Granted Apr 14, 2020·3 cites·20 claims
- 0982US7102232B2Structure to improve adhesion between top CVD low-k dielectric and dielectric capping layerIBM·Filed 2004·Granted Sep 5, 2006·19 cites·13 claims
- 1081US10921715B2Semiconductor structure for optical validationIBM·Filed 2019·Granted Feb 16, 2021·1 cites·20 claims
- 1178US11568101B2Predictive multi-stage modelling for complex process controlIBM·Filed 2019·Granted Jan 31, 2023·2 cites·16 claims
- 1278US10579764B2Co-modeling post-lithography critical dimensions and post-etch critical dimensions with multi-task neural networksIBM·Filed 2018·Granted Mar 3, 2020·3 cites·20 claims
- 1378US10429743B2Optical mask validationIBM·Filed 2017·Granted Oct 1, 2019·1 cites·20 claims
- 1476US10725454B2Mask process aware calibration using mask pattern fidelity inspectionsIBM·Filed 2018·Granted Jul 28, 2020·1 cites·20 claims
- 1574US7211507B2PE-ALD of TaN diffusion barrier region on low-k materialsIBM·Filed 2004·Granted May 1, 2007·15 cites·20 claims
- 1673US10650111B2Electrical mask validationIBM·Filed 2017·Granted May 12, 2020·1 cites·24 claims
- 1763US11288429B2Electrical mask validationIBM·Filed 2020·Granted Mar 29, 2022·0 cites·20 claims
- 1858US9087739B2Pattern improvement in multiprocess patterningDUNN DERREN N·Filed 2009·Granted Jul 21, 2015·1 cites·10 claims
- 1958US7975246B2MEEF reduction by elongation of square shapesIBM·Filed 2008·Granted Jul 5, 2011·1 cites·20 claims
- 2052US9034562B2Pattern improvement in multiprocess patterningIBM·Filed 2013·Granted May 19, 2015·0 cites·3 claims
- 2150US10768532B2Co-optimization of lithographic and etching processes with complementary post exposure bake by laser annealingIBM·Filed 2018·Granted Sep 8, 2020·0 cites·20 claims
- 2249US10657420B2Modeling post-lithography stochastic critical dimension variation with multi-task neural networksIBM·Filed 2018·Granted May 19, 2020·0 cites·25 claims
- 2349US2006098862A1Nanoscale defect image detection for semiconductorsIBM·Filed 2004·Application pending·0 cites
- 2447US2023177218A1Enabling device security by design enumeration selective targetingIBM·Filed 2021·Application pending·0 cites
- 2546US10678971B2Space exploration with Bayesian inferenceIBM·Filed 2018·Granted Jun 9, 2020·0 cites·18 claims
- 2645US2009191468A1Contact Level Mask Layouts By Introducing Anisotropic Sub-Resolution Assist FeaturesIBM·Filed 2008·Application pending·0 cites
- 2742US2007072412A1Preventing damage to interlevel dielectricADVANCED MICRO DEVICES INC AMD·Filed 2005·Application pending·0 cites
- 2842US2021049242A1Process Optimization by Clamped Monte Carlo DistributionIBM·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →