Inventor · disambiguated record
Emile Y. Sahouria
Also filed as: SAHOURIA EMILE · SAHOURIA EMILE Y
25 granted patents·5 pending applications·1,344 citations·filing 2000–2016
97Inventor score
Top patents by PatentIndex Score
30 records- 0199US6516459B1Integrated circuit design correction using fragment correspondenceMENTOR GRAPHICS CORP·Filed 2000·Granted Feb 4, 2003·309 cites·43 claims
- 0298US7367009B2Convergence technique for model-based optical and process correctionMENTOR GRAPHICS CORP·Filed 2006·Granted Apr 29, 2008·53 cites·7 claims
- 0398US6415421B2Integrated verification and manufacturability toolMENTOR GRAPHICS CORP·Filed 2000·Granted Jul 2, 2002·377 cites·40 claims
- 0497US6430737B1Convergence technique for model-based optical and process correctionMENTOR GRAPHICS CORP·Filed 2000·Granted Aug 6, 2002·83 cites·24 claims
- 0596US6425113B1Integrated verification and manufacturability toolFiled 2000·Granted Jul 23, 2002·142 cites·45 claims
- 0695US6668367B2Selective promotion for resolution enhancement techniquesFiled 2002·Granted Dec 23, 2003·65 cites·27 claims
- 0794US7240321B2Selective promotion for resolution enhancement techniquesCOBB NICOLAS B·Filed 2003·Granted Jul 3, 2007·57 cites·13 claims
- 0893US7017141B2Integrated verification and manufacturability toolANDERSON LEIGH C·Filed 2002·Granted Mar 21, 2006·87 cites·11 claims
- 0991US7802226B2Data preparation for multiple mask printingMENTOR GRAPHICS CORP·Filed 2007·Granted Sep 21, 2010·15 cites·20 claims
- 1089US7028284B2Convergence technique for model-based optical and process correctionCOBB NICOLAS BAILEY·Filed 2002·Granted Apr 11, 2006·53 cites·31 claims
- 1189US6901574B2Data management method for mask writingFiled 2001·Granted May 31, 2005·45 cites·15 claims
- 1284US9292643B2Mask creation with hierarchy management using cover cellsSAHOURIA EMILE Y·Filed 2010·Granted Mar 22, 2016·6 cites·33 claims
- 1384US8826196B2Integration of optical proximity correction and mask data preparationMENTOR GRAPHICS CORP·Filed 2013·Granted Sep 2, 2014·7 cites·20 claims
- 1481US7069534B2Mask creation with hierarchy management using cover cellsSAHOURIA EMILE Y·Filed 2003·Granted Jun 27, 2006·23 cites·13 claims
- 1579US8635562B2Data flow branching in mask data preparationMENTOR GRAPHICS CORP·Filed 2012·Granted Jan 21, 2014·2 cites·16 claims
- 1678US7716624B2Mask creation with hierarchy management using cover cellsSAHOURIA EMILE Y·Filed 2006·Granted May 11, 2010·6 cites·24 claims
- 1771US8234599B2Use of graphs to decompose layout design dataSAHOURIA EMILE Y·Filed 2009·Granted Jul 31, 2012·9 cites·24 claims
- 1870US8713483B2IC layout parsing for multiple masksTRITCHKOV ALEXANDER·Filed 2007·Granted Apr 29, 2014·5 cites·19 claims
- 1958US9996651B2Mask creation with hierarchy management using cover cellsMENTOR GRAPHICS CORP·Filed 2016·Granted Jun 12, 2018·0 cites·24 claims
- 2056US2014212793A1Multiresolution Mask WritingMENTOR GRAPHICS CORP·Filed 2013·Application pending·0 cites
- 2151US9448481B2Generalization of shot definitions for mask and wafer writing toolsMENTOR GRAPHICS CORP·Filed 2015·Granted Sep 20, 2016·0 cites·20 claims
- 2251US8560981B2Segmenting integrated circuit layout design files using speculative parsingSAHOURIA EMILE Y·Filed 2008·Granted Oct 15, 2013·0 cites·20 claims
- 2351US2012141924A1Multiresolution Mask WritingSAHOURIA EMILE Y·Filed 2011·Application pending·0 cites
- 2450US9134616B2Generalization of shot definitions for mask and wafer writing toolsSAHOURIA EMILE Y·Filed 2010·Granted Sep 15, 2015·0 cites·9 claims
- 2550US2010218159A1Data Flow Branching in Mask Data PreparationSAHOURIA EMILE·Filed 2009·Application pending·0 cites
- 2648US8930856B2Mask rule checking based on curvatureMENTOR GRAPHICS CORP·Filed 2013·Granted Jan 6, 2015·0 cites·10 claims
- 2747US8640059B2Forming separation directives using a printing feasibility analysisSAHOURIA EMILE Y·Filed 2008·Granted Jan 28, 2014·0 cites·27 claims
- 2845US2009070732A1Fracture Shot Count ReductionMENTOR GRAPHICS CORP·Filed 2007·Application pending·0 cites
- 2940US8516401B2Mask model calibration technologies involving etch effect and exposure effectSAHOURIA EMILE·Filed 2009·Granted Aug 20, 2013·0 cites·14 claims
- 3040US2010023914A1Use Of Graphs To Decompose Layout Design DataSAHOURIA EMILE Y·Filed 2009·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Emile Y. Sahouria files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →