Inventor · disambiguated record
Norman Chen
Also filed as: CHEN NORMAN · CHEN NORMAN S · CHEN NORMAN SHAOWEN
27 granted patents·1 pending application·90 citations·filing 2003–2022
94Inventor score
Files withGLOBALFOUNDRIES INC12TAIWAN SEMICONDUCTOR MFG CO LTD5TAIWAN SEMICONDUCTOR MFG4LIU GEORGE2GLOBAL FOUNDRIES INC1
Top patents by PatentIndex Score
28 records- 0197US10459352B2Mask cleaningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Oct 29, 2019·10 cites·20 claims
- 0290US9026977B2Power rail layout for dense standard cell libraryGLOBALFOUNDRIES INC·Filed 2013·Granted May 5, 2015·15 cites·6 claims
- 0389US7432042B2Immersion lithography process and mask layer structure applied in the sameUNITED MICROELECTRONICS CORP·Filed 2003·Granted Oct 7, 2008·34 cites·7 claims
- 0488US10386715B2Methodology for post-integration awareness in optical proximity correctionGLOBALFOUNDRIES INC·Filed 2017·Granted Aug 20, 2019·4 cites·15 claims
- 0583US11921434B2Mask cleaningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Mar 5, 2024·0 cites·20 claims
- 0683US8782571B2Multiple patterning process for forming trenches or holes using stitched assist featuresSUN YUYANG·Filed 2012·Granted Jul 15, 2014·5 cites·9 claims
- 0781US8612904B1Use of polarization and composite illumination source for advanced optical lithographyGLOBALFOUNDRIES INC·Filed 2012·Granted Dec 17, 2013·5 cites·25 claims
- 0880US11740563B2Mask cleaningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 29, 2023·0 cites·20 claims
- 0974US8010915B2Grid-based fragmentation for optical proximity correction in photolithography mask applicationsGLOBALFOUNDRIES INC·Filed 2008·Granted Aug 30, 2011·4 cites·20 claims
- 1074US7642101B2Semiconductor device having in-chip critical dimension and focus patternsTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jan 5, 2010·4 cites·14 claims
- 1170US11256179B2Mask cleaningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Feb 22, 2022·0 cites·20 claims
- 1270US8993224B2Multiple patterning process for forming trenches or holes using stitched assist featuresGLOBALFOUNDRIES INC·Filed 2014·Granted Mar 31, 2015·1 cites·7 claims
- 1368US7838205B2Utilization of electric field with isotropic development in photolithographyTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Nov 23, 2010·2 cites·18 claims
- 1467US7387969B2Top patterned hardmask and method for patterningTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Jun 17, 2008·2 cites·14 claims
- 1563US9443055B2Methods for retargeting circuit design layouts and for fabricating semiconductor devices using retargeted layoutsGLOBALFOUNDRIES INC·Filed 2015·Granted Sep 13, 2016·1 cites·14 claims
- 1661US9171735B2Method for fabricating a semiconductor integrated circuit with a litho-etch, litho-etch process for etching trenchesGLOBALFOUNDRIES INC·Filed 2013·Granted Oct 27, 2015·1 cites·17 claims
- 1761US8910094B2Retargeting semiconductor device shapes for multiple patterning processesGLOBALFOUNDRIES INC·Filed 2013·Granted Dec 9, 2014·1 cites·10 claims
- 1859US7776494B2Lithographic mask and methods for fabricating a semiconductor deviceGLOBAL FOUNDRIES INC·Filed 2006·Granted Aug 17, 2010·1 cites·20 claims
- 1953US12461450B2OPC modeling methodHEFECHIP CORPORATION LTD·Filed 2022·Granted Nov 4, 2025·0 cites·11 claims
- 2053US9064086B2Retargeting semiconductor device shapes for multiple patterning processesGLOBALFOUNDRIES INC·Filed 2014·Granted Jun 23, 2015·0 cites·8 claims
- 2152US9484300B2Device resulting from printing minimum width semiconductor features at non-minimum pitchGLOBALFOUNDRIES INC·Filed 2015·Granted Nov 1, 2016·0 cites·7 claims
- 2250US10401837B2Generating risk inventory and common process window for adjustment of manufacturing toolGLOBALFOUNDRIES INC·Filed 2017·Granted Sep 3, 2019·0 cites·17 claims
- 2349US9263349B2Printing minimum width semiconductor features at non-minimum pitch and resulting deviceGLOBALFOUNDRIES INC·Filed 2013·Granted Feb 16, 2016·0 cites·11 claims
- 2448US9366969B2Methodology for implementing enhanced optical lithography for hole patterning in semiconductor fabricationTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jun 14, 2016·0 cites·20 claims
- 2547US8472005B2Methodology for implementing enhanced optical lithography for hole patterning in semiconductor fabricationLIU GEORGE·Filed 2007·Granted Jun 25, 2013·0 cites·19 claims
- 2645US9091923B2Contrast enhancing exposure system and method for use in semiconductor fabricationLIU GEORGE·Filed 2007·Granted Jul 28, 2015·0 cites·10 claims
- 2743US9886543B2Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Feb 6, 2018·0 cites·20 claims
- 2839US2013232456A1Optical proximity correction methods for masks to be used in multiple patterning processesKALLINGAL CHIDAMBARAM G·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →