Inventor · disambiguated record
James Rogers
Also filed as: ROGERS JAMES · ROGERS JAMES H · ROGERS JAMES HUGH · ROGERS JR JAMES H
87 granted patents·11 pending applications·1,248 citations·filing 1974–2024
99Inventor score
Top patents by PatentIndex Score
98 records- 0199US10312048B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2017·Granted Jun 4, 2019·48 cites·19 claims
- 0298US11848176B2Plasma processing using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2021·Granted Dec 19, 2023·5 cites·25 claims
- 0398US11776789B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2022·Granted Oct 3, 2023·6 cites·20 claims
- 0498US11728124B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2021·Granted Aug 15, 2023·5 cites·13 claims
- 0598US11699572B2Feedback loop for controlling a pulsed voltage waveformAPPLIED MATERIALS INC·Filed 2020·Granted Jul 11, 2023·8 cites·30 claims
- 0698US11694876B2Apparatus and method for delivering a plurality of waveform signals during plasma processingAPPLIED MATERIALS INC·Filed 2022·Granted Jul 4, 2023·10 cites·26 claims
- 0798US11462388B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·6 cites·20 claims
- 0898US11284500B2Method of controlling ion energy distribution using a pulse generatorAPPLIED MATERIALS INC·Filed 2020·Granted Mar 22, 2022·21 cites·20 claims
- 0998US11232933B2Temperature and bias control of edge ringAPPLIED MATERIALS INC·Filed 2020·Granted Jan 25, 2022·5 cites·20 claims
- 1098US11069504B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2020·Granted Jul 20, 2021·7 cites·21 claims
- 1198US10923321B2Apparatus and method of generating a pulsed waveformAPPLIED MATERIALS INC·Filed 2020·Granted Feb 16, 2021·52 cites·25 claims
- 1298US10916408B2Apparatus and method of forming plasma using a pulsed waveformAPPLIED MATERIALS INC·Filed 2020·Granted Feb 9, 2021·54 cites·26 claims
- 1398US10791617B2Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2020·Granted Sep 29, 2020·62 cites·20 claims
- 1498US10685807B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2019·Granted Jun 16, 2020·38 cites·16 claims
- 1598US10555412B2Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2018·Granted Feb 4, 2020·67 cites·32 claims
- 1698US10448495B1Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2019·Granted Oct 15, 2019·63 cites·15 claims
- 1798US10448494B1Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2019·Granted Oct 15, 2019·68 cites·30 claims
- 1898US10103010B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2018·Granted Oct 16, 2018·34 cites·10 claims
- 1998US9947517B1Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2016·Granted Apr 17, 2018·48 cites·20 claims
- 2097US12237148B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2023·Granted Feb 25, 2025·2 cites·21 claims
- 2197US11948780B2Automatic electrostatic chuck bias compensation during plasma processingAPPLIED MATERIALS INC·Filed 2021·Granted Apr 2, 2024·7 cites·15 claims
- 2297US11462389B2Pulsed-voltage hardware assembly for use in a plasma processing systemAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·12 cites·17 claims
- 2397US8901935B2Methods and apparatus for detecting the confinement state of plasma in a plasma processing systemVALCORE JR JOHN C·Filed 2010·Granted Dec 2, 2014·31 cites·17 claims
- 2496US12148595B2Plasma uniformity control in pulsed DC plasma chamberAPPLIED MATERIALS INC·Filed 2021·Granted Nov 19, 2024·4 cites·20 claims
- 2596US11901157B2Apparatus and methods for controlling ion energy distributionAPPLIED MATERIALS INC·Filed 2021·Granted Feb 13, 2024·5 cites·17 claims
- 2696US11791138B2Automatic electrostatic chuck bias compensation during plasma processingAPPLIED MATERIALS INC·Filed 2021·Granted Oct 17, 2023·4 cites·26 claims
- 2796US10991556B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2019·Granted Apr 27, 2021·11 cites·20 claims
- 2896US10553404B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2017·Granted Feb 4, 2020·13 cites·20 claims
- 2996US10504702B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2018·Granted Dec 10, 2019·14 cites·20 claims
- 3096US7430986B2Plasma confinement ring assemblies having reduced polymer deposition characteristicsLAM RES CORP·Filed 2005·Granted Oct 7, 2008·28 cites·20 claims
- 3195US11798790B2Apparatus and methods for controlling ion energy distributionAPPLIED MATERIALS INC·Filed 2020·Granted Oct 24, 2023·3 cites·20 claims
- 3295US10763081B2Apparatus and methods for manipulating radio frequency power at an edge ring in plasma process deviceAPPLIED MATERIALS INC·Filed 2018·Granted Sep 1, 2020·13 cites·17 claims
- 3395US10685862B2Controlling the RF amplitude of an edge ring of a capacitively coupled plasma process deviceAPPLIED MATERIALS INC·Filed 2016·Granted Jun 16, 2020·13 cites·20 claims
- 3495USD797691SComposite edge ringAPPLIED MATERIALS INC·Filed 2016·Granted Sep 19, 2017·59 cites·1 claims
- 3595US6368678B1Plasma processing system and methodFiled 2000·Granted Apr 9, 2002·62 cites·38 claims
- 3694US11984306B2Plasma chamber and chamber component cleaning methodsAPPLIED MATERIALS INC·Filed 2021·Granted May 14, 2024·2 cites·20 claims
- 3794US11476145B2Automatic ESC bias compensation when using pulsed DC biasAPPLIED MATERIALS INC·Filed 2018·Granted Oct 18, 2022·10 cites·20 claims
- 3894US10784089B2Temperature and bias control of edge ringAPPLIED MATERIALS INC·Filed 2019·Granted Sep 22, 2020·7 cites·20 claims
- 3994US7713379B2Plasma confinement rings including RF absorbing material for reducing polymer depositionLAM RES CORP·Filed 2005·Granted May 11, 2010·20 cites·15 claims
- 4093US12183557B2Apparatus and methods for controlling ion energy distributionAPPLIED MATERIALS INC·Filed 2023·Granted Dec 31, 2024·1 cites·21 claims
- 4192US12255051B2Multi-shape voltage pulse trains for uniformity and etch profile tuningAPPLIED MATERIALS INC·Filed 2022·Granted Mar 18, 2025·3 cites·21 claims
- 4292US6027337AOxidation ovenC A LITZLER CO INC·Filed 1998·Granted Feb 22, 2000·66 cites·30 claims
- 4390US10748748B2RF impedance model based fault detectionLAM RES CORP·Filed 2018·Granted Aug 18, 2020·7 cites·30 claims
- 4488US8262922B2Plasma confinement rings having reduced polymer deposition characteristicsDHINDSA RAJINDER·Filed 2008·Granted Sep 11, 2012·8 cites·12 claims
- 4587US4233600AMethod and system for detecting plate clashing in disc refinersPULP PAPER RES INST·Filed 1978·Granted Nov 11, 1980·31 cites·10 claims
- 4687US2024395502A1Feedback loop for controlling a pulsed voltage waveformAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4786US11508554B2High voltage filter assemblyAPPLIED MATERIALS INC·Filed 2019·Granted Nov 22, 2022·4 cites·16 claims
- 4886US10256075B2Gas splitting by time average injection into different zones by fast gas valvesAPPLIED MATERIALS INC·Filed 2016·Granted Apr 9, 2019·4 cites·15 claims
- 4986US6228429B1Methods and apparatus for processing insulating substratesINTEVAC INC·Filed 2000·Granted May 8, 2001·21 cites·18 claims
- 5084US12057292B2Feedback loop for controlling a pulsed voltage waveformAPPLIED MATERIALS INC·Filed 2023·Granted Aug 6, 2024·0 cites·20 claims
Showing the top 50 of 98 patent records by PatentIndex Score.
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