Assignee
DHINDSA RAJINDER
US·32 granted patents·6 pending applications·1,562 citations·filing 2004–2013
Top patents by PatentIndex Score
38 records- 0199US8484846B2Method of joining components for a composite showerhead electrode assembly for a plasma processing apparatusDHINDSA RAJINDER·Filed 2012·Granted Jul 16, 2013·525 cites·15 claims
- 0299US8313610B2Temperature control modules for showerhead electrode assemblies for plasma processing apparatusesDHINDSA RAJINDER·Filed 2008·Granted Nov 20, 2012·199 cites·16 claims
- 0398US8652298B2Triode reactor design with multiple radiofrequency powersDHINDSA RAJINDER·Filed 2011·Granted Feb 18, 2014·160 cites·20 claims
- 0497US8869742B2Plasma processing chamber with dual axial gas injection and exhaustDHINDSA RAJINDER·Filed 2010·Granted Oct 28, 2014·195 cites·21 claims
- 0597US8216486B2Temperature control module using gas pressure to control thermal conductance between liquid coolant and component bodyDHINDSA RAJINDER·Filed 2011·Granted Jul 10, 2012·131 cites·17 claims
- 0697US8211324B2Methods and arrangements for controlling plasma processing parametersDHINDSA RAJINDER·Filed 2010·Granted Jul 3, 2012·29 cites·22 claims
- 0796US8563619B2Methods and arrangements for plasma processing system with tunable capacitanceDHINDSA RAJINDER·Filed 2007·Granted Oct 22, 2013·29 cites·20 claims
- 0896US8147648B2Composite showerhead electrode assembly for a plasma processing apparatusDHINDSA RAJINDER·Filed 2008·Granted Apr 3, 2012·34 cites·16 claims
- 0995US9184028B2Dual plasma volume processing apparatus for neutral/ion flux controlDHINDSA RAJINDER·Filed 2010·Granted Nov 10, 2015·34 cites·32 claims
- 1095US8900398B2Local plasma confinement and pressure control arrangement and methods thereofDHINDSA RAJINDER·Filed 2010·Granted Dec 2, 2014·27 cites·14 claims
- 1195US8080760B2Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactorDHINDSA RAJINDER·Filed 2010·Granted Dec 20, 2011·30 cites·15 claims
- 1293US8083855B2Temperature control module using gas pressure to control thermal conductance between liquid coolant and component bodyDHINDSA RAJINDER·Filed 2008·Granted Dec 27, 2011·25 cites·13 claims
- 1392US8449679B2Temperature controlled hot edge ring assemblyDHINDSA RAJINDER·Filed 2008·Granted May 28, 2013·20 cites·16 claims
- 1491US8906197B2Plasma processing chamber having electrodes for cleaning chamberDHINDSA RAJINDER·Filed 2012·Granted Dec 9, 2014·9 cites·7 claims
- 1590US8846539B2Apparatus including showerhead electrode and heater for plasma processingDHINDSA RAJINDER·Filed 2010·Granted Sep 30, 2014·10 cites·15 claims
- 1689US9536711B2Method and apparatus for DC voltage control on RF-powered electrodeDHINDSA RAJINDER·Filed 2008·Granted Jan 3, 2017·14 cites·20 claims
- 1788US8262922B2Plasma confinement rings having reduced polymer deposition characteristicsDHINDSA RAJINDER·Filed 2008·Granted Sep 11, 2012·8 cites·12 claims
- 1887US8337623B2Methods for plasma cleaning an internal peripheral region of a plasma processing chamberDHINDSA RAJINDER·Filed 2011·Granted Dec 25, 2012·6 cites·20 claims
- 1987US8299390B2Apparatus and method for controlling plasma density profileDHINDSA RAJINDER·Filed 2010·Granted Oct 30, 2012·13 cites·13 claims
- 2086US9779916B2Radio frequency (RF) ground return arrangementsDHINDSA RAJINDER·Filed 2010·Granted Oct 3, 2017·15 cites·18 claims
- 2181US8450635B2Method and apparatus for inducing DC voltage on wafer-facing electrodeDHINDSA RAJINDER·Filed 2008·Granted May 28, 2013·7 cites·16 claims
- 2279US8262847B2Plasma-enhanced substrate processing method and apparatusDHINDSA RAJINDER·Filed 2006·Granted Sep 11, 2012·5 cites·13 claims
- 2378US8290717B2Methods and apparatus for wafer area pressure control in an adjustable gap plasma chamberDHINDSA RAJINDER·Filed 2009·Granted Oct 16, 2012·4 cites·18 claims
- 2477US9184074B2Apparatus and methods for edge ring implementation for substrate processingDHINDSA RAJINDER·Filed 2010·Granted Nov 10, 2015·3 cites·9 claims
- 2576US8097120B2Process tuning gas injection from the substrate edgeDHINDSA RAJINDER·Filed 2006·Granted Jan 17, 2012·5 cites·17 claims
- 2675US8317968B2Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processingDHINDSA RAJINDER·Filed 2004·Granted Nov 27, 2012·15 cites·13 claims
- 2774US8591755B2Methods for controlling plasma constituent flux and deposition during semiconductor fabrication and apparatus for implementing the sameDHINDSA RAJINDER·Filed 2010·Granted Nov 26, 2013·2 cites·11 claims
- 2871US8911637B2Plasma-enhanced substrate processing method and apparatusDHINDSA RAJINDER·Filed 2012·Granted Dec 16, 2014·2 cites·20 claims
- 2971US8500952B2Plasma confinement rings having reduced polymer deposition characteristicsDHINDSA RAJINDER·Filed 2012·Granted Aug 6, 2013·4 cites·20 claims
- 3064US8784948B2Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamberDHINDSA RAJINDER·Filed 2011·Granted Jul 22, 2014·1 cites·10 claims
- 3162US8911590B2Integrated capacitive and inductive power sources for a plasma etching chamberDHINDSA RAJINDER·Filed 2006·Granted Dec 16, 2014·1 cites·17 claims
- 3256US2014034243A1Apparatus for plasma processing system with tunable capacitanceDHINDSA RAJINDER·Filed 2013·Application pending·0 cites
- 3355US2013206337A1Arrangements for controlling plasma processing parametersDHINDSA RAJINDER·Filed 2012·Application pending·0 cites
- 3453US9251999B2Capacitively-coupled plasma processing system having a plasma processing chamber for processing a substrateDHINDSA RAJINDER·Filed 2012·Granted Feb 2, 2016·0 cites·22 claims
- 3549US2011073257A1Unitized confinement ring arrangements and methods thereofDHINDSA RAJINDER·Filed 2010·Application pending·0 cites
- 3649US2011011534A1Apparatus for adjusting an edge ring potential during substrate processingDHINDSA RAJINDER·Filed 2009·Application pending·0 cites
- 3743US2013220975A1Hybrid plasma processing systemsDHINDSA RAJINDER·Filed 2012·Application pending·0 cites
- 3842US2014060739A1Rf ground return in plasma processing systems and methods thereforDHINDSA RAJINDER·Filed 2012·Application pending·0 cites
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