Inventor · disambiguated record
Matthew Spuller
Also filed as: SPULLER MATTHEW · SPULLER MATTHEW T
12 granted patents·3 pending applications·17 citations·filing 2003–2023
85Inventor score
Files withAPPLIED MATERIALS INC11APPLIED MATERIAS INC1GEORGIA TECH RES INST1LEE KWANGDUK DOUGLAS1YEH WENDY H1
Top patents by PatentIndex Score
15 records- 0196US11348769B2Plasma-enhanced anneal chamber for wafer outgassingAPPLIED MATERIALS INC·Filed 2020·Granted May 31, 2022·5 cites·12 claims
- 0288US10770272B2Plasma-enhanced anneal chamber for wafer outgassingAPPLIED MATERIALS INC·Filed 2017·Granted Sep 8, 2020·5 cites·12 claims
- 0381US12347679B2System and method for radical and thermal processing of substratesAPPLIED MATERIALS INC·Filed 2023·Granted Jul 1, 2025·0 cites·20 claims
- 0478US11817297B2System and method for managing substrate outgassingAPPLIED MATERIALS INC·Filed 2020·Granted Nov 14, 2023·1 cites·20 claims
- 0577US7776516B2Graded ARC for high NA and immersion lithographyAPPLIED MATERIALS INC·Filed 2006·Granted Aug 17, 2010·4 cites·14 claims
- 0670US11823901B2System and method for radical and thermal processing of substratesAPPLIED MATERIALS INC·Filed 2021·Granted Nov 21, 2023·0 cites·20 claims
- 0769US11587789B2System and method for radical and thermal processing of substratesAPPLIED MATERIALS INC·Filed 2020·Granted Feb 21, 2023·0 cites·18 claims
- 0855US12327763B2Treatment methods for titanium nitride filmsAPPLIED MATERIALS INC·Filed 2021·Granted Jun 10, 2025·0 cites·19 claims
- 0953US2008254233A1Plasma-induced charge damage control for plasma enhanced chemical vapor deposition processesLEE KWANGDUK DOUGLAS·Filed 2007·Application pending·0 cites
- 1050US2022298620A1Enhanced oxidation with hydrogen radical pretreatmentAPPLIED MATERIAS INC·Filed 2022·Application pending·0 cites
- 1148US6786977B2Gas-expanded liquids, methods of use thereof, and systems using gas-expanded liquids for cleaning integrated circuitsGEORGIA TECH RES INST·Filed 2003·Granted Sep 7, 2004·2 cites·19 claims
- 1247US2008008842A1Method for plasma processingAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 1346US11978646B2Thermal chamber with improved thermal uniformityAPPLIED MATERIALS INC·Filed 2018·Granted May 7, 2024·0 cites·18 claims
- 1445US7851385B2Low temperature conformal oxide formation and applicationsAPPLIED MATERIALS INC·Filed 2008·Granted Dec 14, 2010·0 cites·19 claims
- 1544US8125034B2Graded ARC for high NA and immersion lithographyYEH WENDY H·Filed 2010·Granted Feb 28, 2012·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →