Inventor · disambiguated record
Tomohiro Iseki
Also filed as: ISEKI TOMOHIRO
24 granted patents·7 pending applications·67 citations·filing 2004–2022
94Inventor score
Files withTOKYO ELECTRON LTD22YOSHIHARA KOUSUKE5FUKUDA YOSHITERU1MITSUBISHI CHEM CORP1TAKAYANAGI KOJI1
Top patents by PatentIndex Score
31 records- 0188US8043657B2Coating treatment methodTOKYO ELECTRON LTD·Filed 2007·Granted Oct 25, 2011·11 cites·5 claims
- 0285US7820243B2Resist coating method and resist coating apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Oct 26, 2010·9 cites·22 claims
- 0382US8956694B2Developing apparatus, developing method and storage mediumTAKEGUCHI HIROFUMI·Filed 2010·Granted Feb 17, 2015·4 cites·7 claims
- 0482US8304018B2Coating methodTAKAYANAGI KOJI·Filed 2010·Granted Nov 6, 2012·8 cites·9 claims
- 0579US8414972B2Coating treatment method, coating treatment apparatus, and computer-readable storage mediumYOSHIHARA KOUSUKE·Filed 2008·Granted Apr 9, 2013·5 cites·8 claims
- 0679US8225738B2Resist coating method and resist coating apparatusYOSHIHARA KOUSUKE·Filed 2011·Granted Jul 24, 2012·4 cites·13 claims
- 0777US8496991B2Coating treatment methodYOSHIHARA KOUSUKE·Filed 2011·Granted Jul 30, 2013·3 cites·2 claims
- 0875US9690202B2Developing method, developing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jun 27, 2017·2 cites·16 claims
- 0972US7906173B2Resist coating method and resist coating apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Mar 15, 2011·3 cites·12 claims
- 1072US7479190B2Coating treatment apparatus and coating treatment methodTOKYO ELECTRON LTD·Filed 2005·Granted Jan 20, 2009·4 cites·11 claims
- 1170US8505479B2Resist coating apparatusYOSHIHARA KOUSUKE·Filed 2010·Granted Aug 13, 2013·2 cites·22 claims
- 1269US10211050B2Method for photo-lithographic processing in semiconductor device manufacturingTOKYO ELECTRON LTD·Filed 2016·Granted Feb 19, 2019·1 cites·4 claims
- 1367US9649577B2Bubble removing method, bubble removing apparatus, degassing apparatus, and computer-readable recording mediumTOKYO ELECTRON LTD·Filed 2014·Granted May 16, 2017·2 cites·12 claims
- 1467US8318247B2Coating treatment method, coating treatment apparatus, and computer-readable storage mediumYOSHIHARA KOUSUKE·Filed 2008·Granted Nov 27, 2012·2 cites·2 claims
- 1564US9952512B2Developing method, developing apparatus, and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Apr 24, 2018·1 cites·7 claims
- 1658US7520936B2Hardening processing apparatus, hardening processing method, and coating film forming apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Apr 21, 2009·6 cites·18 claims
- 1756US10901320B2Developing method, developing apparatus, and computer-readable recording mediumTOKYO ELECTRON LTD·Filed 2018·Granted Jan 26, 2021·0 cites·5 claims
- 1852US8851011B2Coating treatment method, coating treatment apparatus, and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted Oct 7, 2014·0 cites·8 claims
- 1952US2022176341A1Metal oxide, oxygen adsorption and desorption device, oxygen concentrating device, and method for producing metal oxideMITSUBISHI CHEM CORP·Filed 2022·Application pending·0 cites
- 2050US7832352B2Coating treatment method and coating treatment apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Nov 16, 2010·0 cites·4 claims
- 2148US10606177B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Mar 31, 2020·0 cites·10 claims
- 2248US10120286B2Developing method, developing apparatus, and computer-readable recording mediumTOKYO ELECTRON LTD·Filed 2015·Granted Nov 6, 2018·0 cites·12 claims
- 2348US2009291198A1Coating treatment method, computer-readable storage medium, and coating treatment apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2448US2009226621A1Coating treatment method, computer-readable storage medium, and coating treatment apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2547US9627232B2Substrate processing method, substrate processing apparatus and non-transitory storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Apr 18, 2017·0 cites·9 claims
- 2646US2009181174A1Method of treating substrate and computer storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2746US2010151126A1Substrate coating method and substrate coating apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2845US8697187B2Coating treatment method and coating treatment apparatusFUKUDA YOSHITERU·Filed 2010·Granted Apr 15, 2014·0 cites·3 claims
- 2945US2016049292A1Semiconductor Device Manufacturing MethodTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 3043US2007254099A1Resist coating method, resist coating apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 3137US9899243B2Light irradiation apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Feb 20, 2018·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →