Inventor · disambiguated record
Toshihiro Hayami
Also filed as: HAYAMI TOSHIHIRO
30 granted patents·8 pending applications·965 citations·filing 1995–2020
97Inventor score
Top patents by PatentIndex Score
38 records- 0198US7951262B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted May 31, 2011·486 cites·21 claims
- 0297US8603293B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2011·Granted Dec 10, 2013·73 cites·22 claims
- 0397US7988816B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Aug 2, 2011·63 cites·22 claims
- 0493US7895970B2Structure for plasma processing chamber, plasma processing chamber, plasma processing apparatus, and plasma processing chamber componentTOKYO ELECTRON LTD·Filed 2006·Granted Mar 1, 2011·18 cites·12 claims
- 0593US7718007B2Substrate supporting member and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted May 18, 2010·23 cites·12 claims
- 0693US5705019APlasma processing apparatusSUMITOMO METAL IND·Filed 1996·Granted Jan 6, 1998·86 cites·5 claims
- 0791US7815740B2Substrate mounting table, substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2006·Granted Oct 19, 2010·19 cites·16 claims
- 0889US9490105B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2013·Granted Nov 8, 2016·6 cites·19 claims
- 0987US10854431B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2019·Granted Dec 1, 2020·2 cites·12 claims
- 1083US10546727B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 28, 2020·2 cites·9 claims
- 1182US5885472AMethod for detecting etching endpoint, and etching apparatus and etching system using the method thereofSUMITOMO METAL IND·Filed 1996·Granted Mar 23, 1999·53 cites·8 claims
- 1281US6091045APlasma processing apparatus utilizing a microwave window having a thinner inner areaSUMITOMO METAL IND·Filed 1997·Granted Jul 18, 2000·41 cites·6 claims
- 1379US11195697B2Plasma control apparatusSPP TECH CO LTD·Filed 2017·Granted Dec 7, 2021·3 cites·2 claims
- 1476US7767055B2Capacitive coupling plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Aug 3, 2010·5 cites·17 claims
- 1574US2021082669A1Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1669US8157952B2Plasma processing chamber, potential controlling apparatus, potential controlling method, program for implementing the method, and storage medium storing the programHONDA MASANOBU·Filed 2006·Granted Apr 17, 2012·2 cites·5 claims
- 1767US8038833B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2009·Granted Oct 18, 2011·2 cites·5 claims
- 1867US7870751B2Temperature control system and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Jan 18, 2011·3 cites·9 claims
- 1967US5951887APlasma processing apparatus and plasma processing methodSUMITOMO METAL IND·Filed 1997·Granted Sep 14, 1999·19 cites·12 claims
- 2065US6092486APlasma processing apparatus and plasma processing methodSUMIMOTO METAL INDSUTRIES LTD·Filed 1998·Granted Jul 25, 2000·22 cites·13 claims
- 2157US7368876B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted May 6, 2008·3 cites·11 claims
- 2256US10529539B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 7, 2020·0 cites·8 claims
- 2356US5626714AMethod for detecting etching endpoint and etching apparatus and etching system using the method thereofSUMITOMO METAL IND·Filed 1995·Granted May 6, 1997·17 cites·2 claims
- 2452US8628640B2Plasma processing unit and high-frequency electric power supplying unitHAYAMI TOSHIHIRO·Filed 2004·Granted Jan 14, 2014·3 cites·25 claims
- 2551US7008275B2Electrical joint forming member and plasma processing apparatusNEOMAX MATERIALS CO LTD·Filed 2004·Granted Mar 7, 2006·3 cites·5 claims
- 2649US8286581B2High frequency power source and its control method, and plasma processing apparatusHAYAMI TOSHIHIRO·Filed 2004·Granted Oct 16, 2012·5 cites·5 claims
- 2749US2011214815A1Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2011·Application pending·0 cites
- 2846US8771461B2Plasma processing apparatusHAYAMI TOSHIHIRO·Filed 2008·Granted Jul 8, 2014·0 cites·20 claims
- 2946US2016118225A1Plasma Processing Apparatus and Opening and Closing Mechanism used thereinSPP TECHNOLOGIES CO LTD·Filed 2014·Application pending·0 cites
- 3045US8852388B2Plasma processorHAYAMI TOSHIHIRO·Filed 2008·Granted Oct 7, 2014·0 cites·2 claims
- 3145US2012009829A1Electrical joint member for reducing an electrical resistance between conductive members in a plasma processing apparatusMAEBASHI SATOSHI·Filed 2011·Application pending·0 cites
- 3244US2016358748A1Plasma Processing Apparatus and Coil Used ThereinSPP TECH CO LTD·Filed 2014·Application pending·0 cites
- 3343US2016153091A1Heating Device and Plasma Processing Apparatus Provided TherewithSPP TECHNOLOGIES CO LTD·Filed 2014·Application pending·0 cites
- 3440US2005095732A1Plasma processing apparatus and method and apparatus for measuring DC potentialTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 3538US2004108066A1Temperature measuring method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 3636US6669810B1Method for detecting etching endpoint, and etching apparatus and etching system using the method thereofSUMITOMO METAL IND·Filed 1998·Granted Dec 30, 2003·4 cites·5 claims
- 3731US6149761AEtching apparatus and etching system using the method thereofSUMITOMO METAL IND·Filed 1999·Granted Nov 21, 2000·2 cites·5 claims
- 3830US9199303B2Metal filling apparatusYAMAGUCHI YUKITAKA·Filed 2012·Granted Dec 1, 2015·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →