Electrical joint member for reducing an electrical resistance between conductive members in a plasma processing apparatus

Abstract

In a plasma processing apparatus, a member for propagating high frequency from a high frequency power supply and/or to which the high frequency is applied. A power feed rod is electromagnetically shielded between a matching unit and a bottom plate of a chamber by a coaxial cylindrical conductor connected to a ground potential. A surface potential system disposed in an appropriate distance from the power feed rod in radius direction is installed in the cylindrical conductor, and measures in a non-contact state the electrostatic surface potential of the power feed rod through electrostatic capacitance and provides a controller with a surface potential detection signal including surface potential measurement value information. The controller performs a required signal processing or operation processing on the basis of the surface potential detection signal from the surface potential system, thereby obtaining the measurement value of the DC potential on the power feed rod.

1 . An electrical joint member provided between conductive members joined with each other in a processing apparatus in order to reduce an electrical resistance between the conductive members, comprising:
 an elastic body; and   a surface metal layer of aluminum formed on a surface of the elastic body.   
     
     
         2 . The electrical joint member of  claim 1 , wherein the elastic body is formed of an organic compound material. 
     
     
         3 . The electrical joint member of  claim 1 , wherein the surface metal layer is formed on the surface of the elastic body by evaporation or CVD. 
     
     
         4 . The electrical joint member of  claim 1 , wherein a thickness of the surface metal layer is equal to or less than 100 μm. 
     
     
         5 . The electrical joint member of  claim 1 , wherein a high frequency flows between the conductive members joined with each other. 
     
     
         6 . A plasma processing apparatus constituted by assembling a plurality of conductive members and performing a predetermined processing on a substrate to be processed by a plasma of a processing gas, the processing gas being converted into the plasma by using a high frequency, wherein the electrical joint member described in  claim 1  is provided between the conductive members joined with each other. 
     
     
         7 . The electrical joint member of  claim 1 , wherein the elastic body is a spiral made of a metal material. 
     
     
         8 . The electrical joint member of  claim 7 , wherein the metal material constituting the elastic body is titanium, a stainless steel or a copper alloy. 
     
     
         9 . An electrical joint member provided between conductive members joined with each other in a processing apparatus in order to reduce an electrical resistance between the conductive members, comprising:
 an elastic body made of a first metal material; and   a surface metal layer made of a second metal material and formed on a surface of the elastic body, the second metal material having a resistivity smaller than that of the first metal material and causing no negative effects on a process.   
     
     
         10 . The electrical joint member of  claim 9 , wherein the elastic body is a spiral. 
     
     
         11 . The electrical joint member of  claim 9 , wherein the first metal material is titanium, a stainless steel or a copper alloy. 
     
     
         12 . The electrical joint member of  claim 9 , wherein the second metal material is aluminum. 
     
     
         13 . The electrical joint member of  claim 9 , wherein the surface metal layer is formed on the surface of the elastic body by evaporation or CVD. 
     
     
         14 . The electrical joint member of  claim 9 , wherein a thickness of the surface metal layer is equal to or less than 100 μm. 
     
     
         15 . The electrical joint member of  claim 9 , wherein a high frequency flows between the conductive members joined with each other. 
     
     
         16 . A plasma processing apparatus constituted by assembling a plurality of conductive members and performing a predetermined processing on a substrate to be processed by a plasma of a processing gas, the processing gas being converted into the plasma by using a high frequency, wherein the electrical joint member described in  claim 9  is provided between the conductive members joined with each other.