Inventor · disambiguated record
Eishi Shiobara
Also filed as: SHIOBARA EISHI
37 granted patents·11 pending applications·320 citations·filing 1999–2020
97Inventor score
Top patents by PatentIndex Score
48 records- 0196US8883405B2Method for forming patternSHIOBARA EISHI·Filed 2012·Granted Nov 11, 2014·23 cites·14 claims
- 0293US6569595B1Method of forming a patternTOSHIBA KK·Filed 2000·Granted May 27, 2003·58 cites·10 claims
- 0392US8419995B2Imprint methodYONEDA IKUO·Filed 2009·Granted Apr 16, 2013·19 cites·13 claims
- 0489US7294586B2Method of processing a substrate, heating apparatus, and method of forming a patternTOSHIBA KK·Filed 2005·Granted Nov 13, 2007·11 cites·8 claims
- 0587US11112344B2Particle measuring method and detection liquidKIOXIA CORP·Filed 2020·Granted Sep 7, 2021·2 cites·15 claims
- 0686US7779777B2Substrate processing apparatus and methodTOSHIBA KK·Filed 2009·Granted Aug 24, 2010·9 cites·6 claims
- 0786US6576562B2Manufacturing method of semiconductor device using mask pattern having high etching resistanceTOSHIBA KK·Filed 2001·Granted Jun 10, 2003·36 cites·23 claims
- 0880US8187797B2Method of manufacturing semiconductor deviceSHIOBARA EISHI·Filed 2009·Granted May 29, 2012·7 cites·8 claims
- 0979US8097398B2Method for manufacturing semiconductor deviceKONDOH TAKEHIRO·Filed 2009·Granted Jan 17, 2012·8 cites·20 claims
- 1079US7009148B2Method of processing a substrate, heating apparatus, and method of forming a patternTOSHIBA KK·Filed 2003·Granted Mar 7, 2006·16 cites·17 claims
- 1178US6270948B1Method of forming patternTOSHIBA KK·Filed 1999·Granted Aug 7, 2001·54 cites·12 claims
- 1277US6881058B2Apparatus for processing substrate and method of processing the sameTOSHIBA KK·Filed 2001·Granted Apr 19, 2005·14 cites·25 claims
- 1375US8158332B2Method of manufacturing a semiconductor deviceMATSUNAGA KENTARO·Filed 2010·Granted Apr 17, 2012·4 cites·20 claims
- 1474US8747682B2Pattern formation method and method for manufacturing semiconductor deviceMATSUNAGA KENTARO·Filed 2010·Granted Jun 10, 2014·4 cites·10 claims
- 1574US7687227B2Resist pattern forming method and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2005·Granted Mar 30, 2010·3 cites·17 claims
- 1672US7662542B2Pattern forming method and semiconductor device manufacturing methodTOSHIBA KK·Filed 2006·Granted Feb 16, 2010·4 cites·12 claims
- 1771US7662546B2Apparatus for processing substrate and method of processing the sameTOSHIBA KK·Filed 2005·Granted Feb 16, 2010·2 cites·19 claims
- 1871US7527918B2Pattern forming method and method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2004·Granted May 5, 2009·11 cites·6 claims
- 1971US7005249B2Apparatus for processing substrate and method of processing the sameTOSHIBA KK·Filed 2005·Granted Feb 28, 2006·2 cites·8 claims
- 2069US7026099B2Pattern forming method and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2003·Granted Apr 11, 2006·12 cites·18 claims
- 2167US11366380B2Reflective maskKIOXIA CORP·Filed 2020·Granted Jun 21, 2022·0 cites·20 claims
- 2267US7851139B2Pattern forming methodTOSHIBA KK·Filed 2008·Granted Dec 14, 2010·2 cites·17 claims
- 2363US8198005B2Method of forming resist patternSHIOBARA EISHI·Filed 2009·Granted Jun 12, 2012·1 cites·18 claims
- 2463US7794923B2Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2007·Granted Sep 14, 2010·1 cites·18 claims
- 2562US6420271B2Method of forming a patternTOSHIBA KK·Filed 2001·Granted Jul 16, 2002·8 cites·20 claims
- 2660US8329385B2Method of manufacturing a semiconductor deviceSHIOBARA EISHI·Filed 2009·Granted Dec 11, 2012·1 cites·17 claims
- 2756US6841404B2Method for determining optical constant of antireflective layer, and method for forming resist patternTOSHIBA KK·Filed 2002·Granted Jan 11, 2005·5 cites·14 claims
- 2855US2008064226A1Method of processing a substrate, heating apparatus, and method of forming a patternTOSHIBA KK·Filed 2007·Application pending·0 cites
- 2954US7368209B2Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2004·Granted May 6, 2008·3 cites·28 claims
- 3052US7968272B2Semiconductor device manufacturing method to form resist patternTOSHIBA KK·Filed 2006·Granted Jun 28, 2011·0 cites·4 claims
- 3152US7005238B2Apparatus for processing substrate and method of processing the sameTOSHIBA KK·Filed 2005·Granted Feb 28, 2006·0 cites·20 claims
- 3250US7973907B2Method for treating substrate, method for conveying substrate, and apparatus for conveying substrateTOSHIBA KK·Filed 2008·Granted Jul 5, 2011·0 cites·17 claims
- 3350US7687279B2Evaluation method for chemical solution, qualification method for chemical solution and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2005·Granted Mar 30, 2010·0 cites·4 claims
- 3450US2011229826A1Semiconductor device manufacturing method to form resist pattern, and substrate processing apparatusKAWAMURA DAISUKE·Filed 2011·Application pending·0 cites
- 3550US2007266936A1Substrate processing apparatus and methodSHIOBARA EISHI·Filed 2007·Application pending·0 cites
- 3649US2008073286A1Waste liquid processing method in semiconductor manufacturing process and substrate processing apparatusSHIOBARA EISHI·Filed 2007·Application pending·0 cites
- 3748US8080429B2Evaluation method for chemical solution, qualification method for chemical solution and method for manufacturing semiconductor deviceITO SHINICHI·Filed 2010·Granted Dec 20, 2011·0 cites·2 claims
- 3848US7537871B2Method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2006·Granted May 26, 2009·0 cites·15 claims
- 3947US9891524B2Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2015·Granted Feb 13, 2018·0 cites·10 claims
- 4045US2008003837A1Substrate processing method and semiconductor device manufacturing method carried out in a lithographic processHAYASAKI KEI·Filed 2007·Application pending·0 cites
- 4145US2007199579A1Substrate treatment method, substrate treatment apparatus, and semiconductor device manufacturing methodHAYASAKI KEI·Filed 2007·Application pending·0 cites
- 4244US9958794B2Manufacturing apparatus of semiconductor device and management method of manufacturing apparatus of semiconductor deviceTOSHIBA KK·Filed 2015·Granted May 1, 2018·0 cites·8 claims
- 4342US8753803B2Pattern forming methodKAWAMURA YOSHIHISA·Filed 2010·Granted Jun 17, 2014·0 cites·16 claims
- 4442US2008138746A1Pattern formation method using fine pattern formation material for use in semiconductor fabrication stepKONDOH TAKEHIRO·Filed 2007·Application pending·0 cites
- 4540US2007010028A1Chemical solution qualification method, semiconductor device fabrication method, and liquid crystal display manufacturing methodKONDOH TAKEHIRO·Filed 2006·Application pending·0 cites
- 4640US2005069819A1Method for forming resist pattern and method for manufacturing semiconductor deviceFiled 2004·Application pending·0 cites
- 4737US2009123878A1Patterning methodMIYOSHI SEIRO·Filed 2008·Application pending·0 cites
- 4830US2010304568A1Pattern forming methodMIYOSHI SEIRO·Filed 2010·Application pending·0 cites
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