Inventor · disambiguated record
Evans Lee
Also filed as: LEE EVANS · LEE EVANS Y · LEE EVANS YIP
22 granted patents·6 pending applications·2,032 citations·filing 1994–2019
97Inventor score
Top patents by PatentIndex Score
28 records- 0198US8496756B2Methods for processing substrates in process systems having shared resourcesCRUSE JAMES P·Filed 2010·Granted Jul 30, 2013·518 cites·20 claims
- 0298US5605637AAdjustable dc bias control in a plasma reactorAPPLIED MATERIALS INC·Filed 1994·Granted Feb 25, 1997·231 cites·21 claims
- 0397US5891350AAdjusting DC bias voltage in plasma chambersAPPLIED MATERIALS INC·Filed 1996·Granted Apr 6, 1999·186 cites·21 claims
- 0496US6716302B2Dielectric etch chamber with expanded process windowAPPLIED MATERIALS INC·Filed 2002·Granted Apr 6, 2004·91 cites·18 claims
- 0596US6364957B1Support assembly with thermal expansion compensationAPPLIED MATERIALS INC·Filed 2000·Granted Apr 2, 2002·368 cites·55 claims
- 0694US6797639B2Dielectric etch chamber with expanded process windowAPPLIED MATERIALS INC·Filed 2002·Granted Sep 28, 2004·63 cites·30 claims
- 0793US6432259B1Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution platesAPPLIED MATERIALS INC·Filed 1999·Granted Aug 13, 2002·104 cites·101 claims
- 0892US6916399B1Temperature controlled window with a fluid supply systemAPPLIED MATERIALS INC·Filed 1999·Granted Jul 12, 2005·168 cites·20 claims
- 0992US6192827B1Double slit-valve doors for plasma processingAPPLIED MATERIALS INC·Filed 1998·Granted Feb 27, 2001·108 cites·16 claims
- 1090US6513452B2Adjusting DC bias voltage in plasma chamberAPPLIED MATERIALS INC·Filed 2001·Granted Feb 4, 2003·29 cites·20 claims
- 1183US7374636B2Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactorAPPLIED MATERIALS INC·Filed 2002·Granted May 20, 2008·21 cites·16 claims
- 1282US6221782B1Adjusting DC bias voltage in plasma chamberAPPLIED MATERIALS INC·Filed 1999·Granted Apr 24, 2001·31 cites·12 claims
- 1382US6076482AThin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusionAPPLIED MATERIALS INC·Filed 1997·Granted Jun 20, 2000·41 cites·36 claims
- 1480US10504765B2Electrostatic chuck assembly having a dielectric fillerAPPLIED MATERIALS INC·Filed 2017·Granted Dec 10, 2019·2 cites·20 claims
- 1579US7147719B2Double slit-valve doors for plasma processingAPPLIED MATERIALS INC·Filed 2003·Granted Dec 12, 2006·17 cites·15 claims
- 1678US7294224B2Magnet assembly for plasma containmentAPPLIED MATERIALS INC·Filed 2003·Granted Nov 13, 2007·15 cites·31 claims
- 1776US6863835B1Magnetic barrier for plasma in chamber exhaustFiled 2000·Granted Mar 8, 2005·10 cites·33 claims
- 1873US6647918B1Double slit-valve doors for plasma processingAPPLIED MATERIALS INC·Filed 2000·Granted Nov 18, 2003·13 cites·43 claims
- 1971US8721798B2Methods for processing substrates in process systems having shared resourcesCRUSE JAMES P·Filed 2010·Granted May 13, 2014·2 cites·16 claims
- 2071US7316199B2Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamberAPPLIED MATERIALS INC·Filed 2002·Granted Jan 8, 2008·9 cites·11 claims
- 2164US6773544B2Magnetic barrier for plasma in chamber exhaustFiled 2001·Granted Aug 10, 2004·5 cites·17 claims
- 2263US10930540B2Electrostatic chuck assembly having a dielectric fillerAPPLIED MATERIALS INC·Filed 2019·Granted Feb 23, 2021·0 cites·9 claims
- 2360US2007091535A1Temperature controlled semiconductor processing chamber linerAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2447US2011265951A1Twin chamber processing systemAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 2544US2005003675A1Dielectric etch chamber with expanded process windowFiled 2004·Application pending·0 cites
- 2642US2002069970A1Temperature controlled semiconductor processing chamber linerAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
- 2737US2011265884A1Twin chamber processing system with shared vacuum pumpAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 2831US2008066785A1Method of refurbishing a magnet assembly for plasma process chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →