Inventor · disambiguated record
Chan Hwang
Also filed as: HWANG CHAN · HWANG CHAN SEUNG
18 granted patents·9 pending applications·342 citations·filing 1997–2025
93Inventor score
Top patents by PatentIndex Score
27 records- 0194US10600789B2Micro-pattern forming method, capacitor and method of manufacturing the same, semiconductor device and method of manufacturing the same, and electronic system including semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Mar 24, 2020·10 cites·20 claims
- 0293US6492198B2Method for fabricating a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Dec 10, 2002·97 cites·13 claims
- 0393US6455408B1Method for manufacturing semiconductor devices having redistribution patterns with a concave pattern in a bump pad areaSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Sep 24, 2002·134 cites·6 claims
- 0489US10644006B1Micro-pattern forming method, capacitor and method of manufacturing the same, semiconductor device and method of manufacturing the same, and electronic system including semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted May 5, 2020·2 cites·20 claims
- 0587US6621164B2Chip size package having concave pattern in the bump pad area of redistribution patterns and method for manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Sep 16, 2003·57 cites·10 claims
- 0680US10204912B2Micro-pattern forming method, capacitor and method of manufacturing the same, semiconductor device and method of manufacturing the same, and electronic system including semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Feb 12, 2019·2 cites·20 claims
- 0772US10620528B2Method of fabricating phase shift mask and method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Apr 14, 2020·1 cites·8 claims
- 0867US9070701B2Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Jun 30, 2015·2 cites·12 claims
- 0964US11327395B2Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted May 10, 2022·0 cites·20 claims
- 1062US7361433B2Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Apr 22, 2008·9 cites·18 claims
- 1158US11960212B2Extreme ultraviolet lithography device and method of operating extreme ultraviolet lithography deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Apr 16, 2024·0 cites·20 claims
- 1258US2025264810A1Method of configuring extreme ultraviolet (euv) source, and euv exposure method using the euv sourceSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 1358US2024027890A1Reflective mask and method of designing anti-reflection pattern of the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1457US5923957AProcess for manufacturing a lead-on-chip semiconductor device package having a discontinuous adhesive layer formed from liquid adhesiveSAMSUNG ELECTRONICS CO LTD·Filed 1997·Granted Jul 13, 1999·26 cites·10 claims
- 1557US2024152043A1Method of manufacturing extreme ultraviolet (euv) mask for forming semiconductor memory deviceSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1656US11733601B2EUV photomask and method of forming mask pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Aug 22, 2023·0 cites·20 claims
- 1754US2024045336A1Method for forming resist pattern by using extreme ultraviolet light and method for forming pattern by using the resist pattern as maskSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1853US12300490B2Method of manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted May 13, 2025·0 cites·20 claims
- 1953US2025372380A1Method of manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 2053US2024313066A1Method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2152US7932019B2Gettering members, methods of forming the same, and methods of performing immersion lithography using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Apr 26, 2011·0 cites·16 claims
- 2251US2024112915A1Method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 2349US11635697B2Semiconductor device manufacturing systemSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Apr 25, 2023·0 cites·18 claims
- 2449US2024023305A1Fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 2548US7139064B2Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Nov 21, 2006·2 cites·20 claims
- 2645US10825777B2Method of fabricating a semiconductor device with an overlay key patternSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Nov 3, 2020·0 cites·19 claims
- 2745US2011227070A1Gettering members, methods of forming the same, and methods of performing immersion lithography using the sameYOON JIN-YOUNG·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →