Gettering members, methods of forming the same, and methods of performing immersion lithography using the same

Abstract

Provided herein are gettering members that include a monitor substrate and a conditioning layer thereon. Also provided herein are methods of forming gettering layers and methods of performing immersion lithography processes using the same.

1 . A gettering member, comprising:
 a monitor substrate; and   a conditioning layer comprising an organic compound on the monitor substrate.   
     
     
         2 . The gettering member according to  claim 1 , wherein the conditioning layer comprises hexamethyldisilazane (HMDS). 
     
     
         3 . The gettering member according to  claim 1 , wherein the conditioning layer comprises at least one fluorinated compound selected from the group consisting of perfluoroacetate, hexafluoroalcohol and polytetrafluoroethylene. 
     
     
         4 . The gettering member according to  claim 1 , wherein the conditioning layer comprises at least one non-fluorinated polymer selected from the group consisting of acrylate, meta-acrylate, polynorbornene, polystyrene, polyethylene, polycycloolefin, polycycloolefin-co-maleic anhydride, polymethyl methacrylate and polyvinyl ether-co-maleic anhydride. 
     
     
         5 . The gettering member according to  claim 1 , wherein the monitor substrate comprises single-crystalline silicon, poly-crystalline silicon, amorphous silicon, silicon oxide or any combination thereof. 
     
     
         6 . A method of forming a gettering member, comprising forming a conditioning layer comprising an organic compound on a monitor substrate. 
     
     
         7 . The method according to  claim 6 , wherein forming the conditioning layer comprises:
 facing the monitor substrate toward a liquid comprising HMDS; and   evaporating the HMDS such that HMDS is deposited on the monitor substrate to form the conditioning layer.   
     
     
         8 . The method according to  claim 6 , wherein forming the conditioning layer comprises:
 melting or dissolving a solid hydrophobic material;   applying the melted or dissolved hydrophobic material to the monitor substrate; and optionally   applying heat to the monitor substrate to form a film of the hydrophobic material.   
     
     
         9 . The method according to  claim 8 , wherein the hydrophobic material comprises at least one fluorinated compound selected from the group consisting of perfluoroacetate, hexafluoroalcohol and polytetrafluoroethylene. 
     
     
         10 . The method according to  claim 8 , wherein the hydrophobic material comprises at least one non-fluorinated polymer selected from the group consisting of acrylate, meta-acrylate, polynorbornene, polystyrene, polyethylene, polycycloolefin, polycycloolefin co-maleic anhydride, polymethyl methacrylate and polyvinyl ether-co-maleic anhydride. 
     
     
         11 . The method according to  claim 6 , wherein the monitor substrate comprises single-crystalline silicon, poly-crystalline silicon, amorphous silicon, silicon oxide or any combination thereof.