Inventor · disambiguated record
Fei-Gwo Tsai
Also filed as: TSAI FEI-GWO
31 granted patents·4 pending applications·206 citations·filing 2000–2024
96Inventor score
Files withTAIWAN SEMICONDUCTOR MFG16TAIWAN SEMICONDUCTOR MFG CO LTD14CHANG HSIAO C1LEE YUNG-YAO1LIN FENG-LUNG1
Top patents by PatentIndex Score
35 records- 0193US8202681B2Hybrid multi-layer maskLIN FENG-LUNG·Filed 2011·Granted Jun 19, 2012·102 cites·20 claims
- 0286US8709267B2Double patterning method using tilt-angle depositionYU CHWEN·Filed 2011·Granted Apr 29, 2014·8 cites·20 claims
- 0385US10101662B2Developing methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 16, 2018·3 cites·20 claims
- 0485US10073354B2Exposure method of wafer substrate, manufacturing method of semiconductor device, and exposure toolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Sep 11, 2018·3 cites·20 claims
- 0583US7160654B2Method of the adjustable matching map system in lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jan 9, 2007·17 cites·16 claims
- 0682US11003091B2Method of fabricating reticleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 11, 2021·1 cites·20 claims
- 0782US9733568B2Tool and method of developingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Aug 15, 2017·4 cites·19 claims
- 0879US9188876B2Method of determining overlay error and control system for dynamic control of reticle positionLEE YUNG-YAO·Filed 2012·Granted Nov 17, 2015·3 cites·20 claims
- 0977US10534272B2Method of fabricating reticleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jan 14, 2020·1 cites·20 claims
- 1076US10627718B2Developing methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Apr 21, 2020·1 cites·20 claims
- 1175US11940737B2Method of fabricating reticleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 26, 2024·0 cites·20 claims
- 1274US8007966B2Multiple technology node maskTAIWAN SEMICONDUCTOR MFG·Filed 2011·Granted Aug 30, 2011·2 cites·20 claims
- 1372US9081306B2Method of optimizing lithography tools utilizationTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Jul 14, 2015·2 cites·20 claims
- 1472US7241541B2Method of the adjustable matching map system in lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jul 10, 2007·2 cites·12 claims
- 1572US6361911B1Using a dummy frame pattern to improve CD control of VSB E-beam exposure system and the proximity effect of laser beam exposure system and Gaussian E-beam exposure systemTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Mar 26, 2002·29 cites·3 claims
- 1670US11150558B2Developing methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Oct 19, 2021·0 cites·20 claims
- 1768US6383693B1Method of forming a photomask utilizing electron beam dosage compensation method employing dummy patternTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted May 7, 2002·10 cites·16 claims
- 1866US9466101B2Detection of defects on wafer during semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Oct 11, 2016·3 cites·20 claims
- 1962US7875406B2Multiple technology node maskTAIWAN SEMICONDUCTOR MFG·Filed 2008·Granted Jan 25, 2011·1 cites·20 claims
- 2062US7043327B2Lithography apparatus and method employing non-environmental variable correctionTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted May 9, 2006·6 cites·20 claims
- 2157US2025237941A1Pellicle for euv applicationsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2255US9908201B2Systems and methods for edge bead removalTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Mar 6, 2018·0 cites·21 claims
- 2355US7244533B2Method of the adjustable matching map system in lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jul 17, 2007·0 cites·10 claims
- 2454US8003281B2Hybrid multi-layer maskTAIWAN SEMICONDUCTOR MFG·Filed 2008·Granted Aug 23, 2011·0 cites·12 claims
- 2554US6841313B2Photomask with dies relating to different functionalitiesTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Jan 11, 2005·6 cites·15 claims
- 2652US2024422888A1Extreme ultraviolet light source with thermal stabilizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2749US7871742B2Method for controlling phase angle of a mask by post-treatmentTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Jan 18, 2011·0 cites·14 claims
- 2840US12027407B2Substrate support apparatus and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jul 2, 2024·0 cites·20 claims
- 2940US7037628B2Method of a floating pattern loading system in mask dry-etching critical dimension controlTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted May 2, 2006·1 cites·13 claims
- 3040US2007012335A1Photomask cleaning using vacuum ultraviolet (VUV) light cleaningCHANG HSIAO C·Filed 2005·Application pending·0 cites
- 3138US8624338B2Multi-nanometer-projection apparatus for lithography, oxidation, inspection, and measurementTSAI FEI-GWO·Filed 2011·Granted Jan 7, 2014·0 cites·19 claims
- 3237US9618855B2Lithography system and method for mask inspectionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Apr 11, 2017·0 cites·11 claims
- 3337US6799312B1Dark line CD and XY-CD improvement method of the variable shaped beam lithography in mask or wafer makingTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Sep 28, 2004·0 cites·18 claims
- 3435US7368229B2Composite layer method for minimizing PED effectTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted May 6, 2008·1 cites·22 claims
- 3535US2003228047A1Photomask transparent substrate protection during removal of opaque photomask defectsTAIWAN SEMICONDUCTOR MFG·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →