Inventor · disambiguated record
Ernest E. Allen
Also filed as: ALLEN ERNEST · ALLEN ERNEST E · ALLEN ERNEST EVERETT · ALLEN JR ERNEST E
17 granted patents·3 pending applications·127 citations·filing 1998–2021
92Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT ASS INC10EATON CORP3VARIAN SEMICONDUCTOR EQUIPMENT3APPLIED MATERIALS INC1AXCELIS TECH INC1
Top patents by PatentIndex Score
20 records- 0192US10325752B1Performance extraction setVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Jun 18, 2019·12 cites·19 claims
- 0290US10276340B1Low particle capacitively coupled components for workpiece processingVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Apr 30, 2019·6 cites·18 claims
- 0384US10569299B2Hydrophobic shafts for use in process chambersVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Feb 25, 2020·1 cites·9 claims
- 0479US9865433B1Gas injection system for ion beam deviceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Jan 9, 2018·2 cites·20 claims
- 0572US8563407B2Dual sided workpiece handlingHERTEL RICHARD J·Filed 2010·Granted Oct 22, 2013·4 cites·10 claims
- 0671US9287085B2Processing apparatus and method of treating a substrateVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2014·Granted Mar 15, 2016·2 cites·17 claims
- 0769US10974276B2Hydrophobic shafts for use in process chambersVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2020·Granted Apr 13, 2021·0 cites·10 claims
- 0869US8659229B2Plasma attenuation for uniformity controlKURUNCZI PETER·Filed 2011·Granted Feb 25, 2014·3 cites·18 claims
- 0969US6347919B1Wafer processing chamber having separable upper and lower halvesEATON CORP·Filed 1999·Granted Feb 19, 2002·35 cites·59 claims
- 1065US8941082B2Dual sided workpiece handlingVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Jan 27, 2015·0 cites·8 claims
- 1163US6231054B1Elastomeric sliding seal for vacuum bellowsAXCELIS TECH INC·Filed 1998·Granted May 15, 2001·27 cites·15 claims
- 1259US6429139B1Serial wafer handling mechanismEATON CORP·Filed 1999·Granted Aug 6, 2002·23 cites·34 claims
- 1353US9589769B2Apparatus and method for efficient materials use during substrate processingVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2014·Granted Mar 7, 2017·0 cites·13 claims
- 1452US2023083497A1Uniform plasma linear ion sourceAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 1546US10395969B2Transparent halo for reduced particle generationVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Aug 27, 2019·0 cites·19 claims
- 1644US6065499ALateral stress relief mechanism for vacuum bellowsEATON CORP·Filed 1998·Granted May 23, 2000·12 cites·17 claims
- 1743US10062548B2Gas injection system for ion beam deviceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Aug 28, 2018·0 cites·10 claims
- 1840US11424112B2Transparent halo assembly for reduced particle generationVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Aug 23, 2022·0 cites·16 claims
- 1937US2018122670A1Removable substrate plane structure ringVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Application pending·0 cites
- 2030US2011226739A1Process chamber liner with apertures for particle containmentVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →