Inventor · disambiguated record
Vishal Chhabra
Also filed as: CHHABRA VISHAL
12 granted patents·5 pending applications·360 citations·filing 1998–2019
92Inventor score
Files withGLOBALFOUNDRIES INC5IBM4NANOCRYSTAL IMAGING CORP4HARKNESS BRIAN R1NANOCRYSTAL LIGHTING CORP1
Top patents by PatentIndex Score
17 records- 0195US10269932B1Asymmetric formation of epi semiconductor material in source/drain regions of FinFET devicesGLOBALFOUNDRIES INC·Filed 2018·Granted Apr 23, 2019·42 cites·17 claims
- 0292US6036886AMicroemulsion method for producing activated metal oxide nanocrystalsNANOCRYSTALS TECHNOLOGY L P·Filed 1998·Granted Mar 14, 2000·111 cites·15 claims
- 0391US8647445B1Process for cleaning semiconductor devices and/or tooling during manufacturing thereofIBM·Filed 2012·Granted Feb 11, 2014·12 cites·17 claims
- 0483US6452184B1Microchannel high resolution x-ray sensor having an integrated photomultiplierNANOCRYSTAL IMAGING CORP·Filed 1999·Granted Sep 17, 2002·53 cites·16 claims
- 0581US6361824B1Process for providing a highly reflective coating to the interior walls of microchannelsNANOCRYSTAL IMAGING CORP·Filed 2000·Granted Mar 26, 2002·35 cites·20 claims
- 0680US6300640B1Composite nanophosphor screen for detecting radiation having optically reflective coatingsNANOCRYSTAL IMAGING CORP·Filed 1998·Granted Oct 9, 2001·40 cites·20 claims
- 0779US7175778B1Self-aligning QCA based nanomaterialsNANOCRYSTALS TECHNOLOGY LP·Filed 2003·Granted Feb 13, 2007·41 cites·17 claims
- 0878US6534772B1High resolution high output microchannel based radiation sensorNANOCRYSTAL IMAGING CORP·Filed 2000·Granted Mar 18, 2003·24 cites·50 claims
- 0973US9058976B2Cleaning composition and process for cleaning semiconductor devices and/or tooling during manufacturing thereofIBM·Filed 2012·Granted Jun 16, 2015·2 cites·6 claims
- 1059US10658363B2Cut inside replacement metal gate trench to mitigate N-P proximity effectGLOBALFOUNDRIES INC·Filed 2019·Granted May 19, 2020·0 cites·15 claims
- 1154US10446550B2Cut inside replacement metal gate trench to mitigate N-P proximity effectGLOBALFOUNDRIES INC·Filed 2017·Granted Oct 15, 2019·0 cites·17 claims
- 1254US2015024989A1Cleaning composition and process for cleaning semiconductor devices and/or tooling during manufacturing thereofIBM·Filed 2014·Application pending·0 cites
- 1347US10020260B1Corrosion and/or etch protection layer for contacts and interconnect metallization integrationGLOBALFOUNDRIES INC·Filed 2016·Granted Jul 10, 2018·0 cites·18 claims
- 1446US2016041471A1Acidified conductive water for developer residue removalIBM·Filed 2014·Application pending·0 cites
- 1539US2007221939A1Optically reliable nanoparticle based nanocomposite HRI encapsulant, photonic waveguiding material and high electric breakdown field strength insulator/encapsulantNANOCRYSTAL LIGHTING CORP·Filed 2007·Application pending·0 cites
- 1637US2014008697A1Siloxane Compositions Including Titanium Dioxide Nanoparticles Suitable For Forming EncapsulantsHARKNESS BRIAN R·Filed 2011·Application pending·0 cites
- 1734US2018019162A1Amorphous carbon layer for cobalt etch protection in dual damascene back end of the line integrated circuit metallization integrationGLOBALFOUNDRIES INC·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →