Inventor · disambiguated record
Ofer Sneh
Also filed as: SNEH OFER
37 granted patents·12 pending applications·6,167 citations·filing 1997–2017
99Inventor score
Top patents by PatentIndex Score
49 records- 0199US7682454B2Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systemsSUNDEW TECHNOLOGIES LLC·Filed 2004·Granted Mar 23, 2010·550 cites·50 claims
- 0299US6911092B2ALD apparatus and methodSUNDEW TECHNOLOGIES LLC·Filed 2003·Granted Jun 28, 2005·583 cites·47 claims
- 0399US6540838B2Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer depositionGENUS INC·Filed 2002·Granted Apr 1, 2003·447 cites·10 claims
- 0499US6503330B1Apparatus and method to achieve continuous interface and ultrathin film during atomic layer depositionGENUS INC·Filed 1999·Granted Jan 7, 2003·616 cites·15 claims
- 0599US6475910B1Radical-assisted sequential CVDGENUS INC·Filed 2000·Granted Nov 5, 2002·263 cites·23 claims
- 0699US6451695B2Radical-assisted sequential CVDGENUS INC·Filed 2000·Granted Sep 17, 2002·372 cites·11 claims
- 0799US6305314B1Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer depositionGENUS INC·Filed 1999·Granted Oct 23, 2001·487 cites·20 claims
- 0899US6200893B1Radical-assisted sequential CVDGENUS INC·Filed 1999·Granted Mar 13, 2001·1k cites·35 claims
- 0998US8083205B2Fail safe pneumatically actuated valve with fast time response and adjustable conductanceSNEH OFER·Filed 2010·Granted Dec 27, 2011·26 cites·15 claims
- 1098US6451119B2Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer depositionGENUS INC·Filed 2000·Granted Sep 17, 2002·341 cites·8 claims
- 1198US6090442AMethod of growing films on substrates at room temperatures using catalyzed binary reaction sequence chemistryUNIV TECHNOLOGY CORP·Filed 1997·Granted Jul 18, 2000·444 cites·40 claims
- 1297US6638859B2Apparatus and method to achieve continuous interface and ultrathin film during atomic layer depositionGENUS INC·Filed 2002·Granted Oct 28, 2003·154 cites·31 claims
- 1397US6602784B2Radical-assisted sequential CVDGENUS INC·Filed 2002·Granted Aug 5, 2003·96 cites·3 claims
- 1497US6551399B1Fully integrated process for MIM capacitors using atomic layer depositionGENUS INC·Filed 2000·Granted Apr 22, 2003·169 cites·12 claims
- 1596US7250083B2ALD method and apparatusSUNDEW TECHNOLOGIES LLC·Filed 2003·Granted Jul 31, 2007·75 cites·43 claims
- 1695US6638862B2Radical-assisted sequential CVDGENUS INC·Filed 2002·Granted Oct 28, 2003·58 cites·3 claims
- 1794US6630401B2Radical-assisted sequential CVDGENUS INC·Filed 2002·Granted Oct 7, 2003·52 cites·5 claims
- 1894US6617173B1Integration of ferromagnetic films with ultrathin insulating film using atomic layer depositionGENUS INC·Filed 2001·Granted Sep 9, 2003·78 cites·21 claims
- 1993US8012261B2ALD apparatus and methodSUNDEW TECHNOLOGIES LLC·Filed 2009·Granted Sep 6, 2011·16 cites·5 claims
- 2092US8252116B2Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systemsSNEH OFER·Filed 2010·Granted Aug 28, 2012·12 cites·7 claims
- 2191US6897119B1Apparatus and method to achieve continuous interface and ultrathin film during atomic layer depositionGENUS INC·Filed 2003·Granted May 24, 2005·46 cites·3 claims
- 2290US7662233B2ALD apparatus and methodSNEH OFER·Filed 2004·Granted Feb 16, 2010·42 cites·11 claims
- 2390US7635502B2ALD apparatus and methodSUNDEW TECHNOLOGIES LLC·Filed 2005·Granted Dec 22, 2009·12 cites·28 claims
- 2490US7608539B2ALD method and apparatusSUNDEW TECHNOLOGIES LLC·Filed 2007·Granted Oct 27, 2009·8 cites·3 claims
- 2589US7744060B2Fail-safe pneumatically actuated valve with fast time response and adjustable conductanceSUNDEW TECHNOLOGIES LLC·Filed 2004·Granted Jun 29, 2010·30 cites·10 claims
- 2689US6897508B2Integrated capacitor with enhanced capacitance density and method of fabricating sameSUNDEW TECHNOLOGIES LLC·Filed 2002·Granted May 24, 2005·47 cites·65 claims
- 2786US6863021B2Method and apparatus for providing and integrating a general metal delivery source (GMDS) with atomic layer deposition (ALD)GENUS INC·Filed 2002·Granted Mar 8, 2005·29 cites·15 claims
- 2884US8451582B2Capacitors with high energy storage density and low ESRSNEH ANAT·Filed 2005·Granted May 28, 2013·15 cites·18 claims
- 2983US9181097B2Apparatus and methods for safely providing hazardous reactantsSNEH OFER·Filed 2010·Granted Nov 10, 2015·2 cites·21 claims
- 3079US10465817B2Fluid-actuated flow control valvesSUNDEW TECH LLC·Filed 2017·Granted Nov 5, 2019·3 cites·19 claims
- 3175US9909682B2Fluid-actuated flow control valvesSUNDEW TECH LLC·Filed 2014·Granted Mar 6, 2018·5 cites·17 claims
- 3270US10890282B2Face sealed fittingsSUNDEW TECH LLC·Filed 2015·Granted Jan 12, 2021·3 cites·11 claims
- 3369US2010003404A1Ald method and apparatusSUNDEW TECHNOLOGIES LLC·Filed 2009·Application pending·0 cites
- 3468US8673394B2Deposition method and apparatusSNEH OFER·Filed 2009·Granted Mar 18, 2014·0 cites·15 claims
- 3568US5949944AApparatus and method for dissipating charge from lithium niobate devicesLUCENT TECHNOLOGIES INC·Filed 1997·Granted Sep 7, 1999·36 cites·19 claims
- 3667US2014137802A1Deposition method and apparatusSNEH OFER·Filed 2014·Application pending·0 cites
- 3759US2016002777A1Apparatus and methods for safely providing hazardous reactantsSUNDEW TECHNOLOGIES LLC·Filed 2015·Application pending·0 cites
- 3858US2010301011A1Apparatus and method for downstream pressure control and sub-atmospheric reactive gas abatementSUNDEW TECHNOLOGIES LLC·Filed 2010·Application pending·0 cites
- 3950US2007012402A1Apparatus and method for downstream pressure control and sub-atmospheric reactive gas abatementSUNDEW TECHNOLOGIES LLC·Filed 2004·Application pending·0 cites
- 4050US2011310526A1Capacitors with high energy storage density and low esrSNEH ANAT·Filed 2011·Application pending·0 cites
- 4149US6037268AMethod for etching tantalum oxideLUCENT TECHNOLOGIES INC·Filed 1998·Granted Mar 14, 2000·13 cites·10 claims
- 4248US2012321910A1Methods and apparatus for atomic layer deposition on large area substratesSNEH OFER·Filed 2011·Application pending·0 cites
- 4347US2010129548A1Ald apparatus and methodSUNDEW TECHNOLOGIES LLC·Filed 2010·Application pending·0 cites
- 4446US6189238B1Portable purge system for transporting materialsLUCENT TECHNOLOGIES INC·Filed 1998·Granted Feb 20, 2001·11 cites·24 claims
- 4546US2011206909A1Coatings for suppressing metallic whiskersSUNDEW TECHNOLOGIES LLC·Filed 2009·Application pending·0 cites
- 4645US2005103269A1Method and apparatus for providing and integrating a general metal delivery source (GMDS) with atomic layer deposition (ALD)Filed 2004·Application pending·0 cites
- 4742US2003183171A1Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer depositionFiled 2003·Application pending·0 cites
- 4841US2003190424A1Process for tungsten silicide atomic layer depositionFiled 2001·Application pending·0 cites
- 4931US6007685ADeposition of highly doped silicon dioxide filmsLUCENT TECHNOLOGIES INC·Filed 1997·Granted Dec 28, 1999·3 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →