Inventor · disambiguated record
Etsuo Iijima
Also filed as: IIJIMA ETSUO
5 granted patents·6 pending applications·87 citations·filing 2002–2012
77Inventor score
Top patents by PatentIndex Score
11 records- 0196US7504040B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2007·Granted Mar 17, 2009·81 cites·7 claims
- 0252US7531460B2Dry-etching methodTOKYO ELECTRON LTD·Filed 2006·Granted May 12, 2009·2 cites·20 claims
- 0352US7476624B2Dry-etching methodTOKYO ELECTRON LTD·Filed 2002·Granted Jan 13, 2009·3 cites·14 claims
- 0450US8288286B2Dry-etching methodIIJIMA ETSUO·Filed 2008·Granted Oct 16, 2012·0 cites·15 claims
- 0550US2013025789A1Dry-etching methodTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
- 0643US2006081337A1Capacitive coupling plasma processing apparatusHIMORI SHINJI·Filed 2005·Application pending·0 cites
- 0741US2007184657A1Etching methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 0841US2008261406A1Etching method and semiconductor device fabrication methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 0940US7183217B2Dry-etching methodTOKYO ELECTRON LTD·Filed 2002·Granted Feb 27, 2007·1 cites·7 claims
- 1034US2004076762A1Plasma processor and plasma processing methodFiled 2002·Application pending·0 cites
- 1130US2004009667A1Etching methodFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →