Inventor · disambiguated record
Fumiko Yamashita
Also filed as: YAMASHITA FUMIKO
15 granted patents·4 pending applications·29 citations·filing 2010–2019
88Inventor score
Top patents by PatentIndex Score
19 records- 0186US8383521B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2010·Granted Feb 26, 2013·8 cites·8 claims
- 0279US9412618B2Pattern forming methodTOKYO ELECTRON LTD·Filed 2014·Granted Aug 9, 2016·4 cites·2 claims
- 0377US9660182B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted May 23, 2017·5 cites·8 claims
- 0474US8778206B2Substrate processing method and storage mediumNISHIMURA EIICHI·Filed 2012·Granted Jul 15, 2014·3 cites·10 claims
- 0571US9208997B2Method of etching copper layer and maskTOKYO ELECTRON LTD·Filed 2013·Granted Dec 8, 2015·2 cites·3 claims
- 0671US8877081B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Nov 4, 2014·2 cites·9 claims
- 0768US9165784B2Substrate processing method and storage mediumNISHIMURA EIICHI·Filed 2012·Granted Oct 20, 2015·2 cites·4 claims
- 0865US9691643B2Etching apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Jun 27, 2017·1 cites·8 claims
- 0963US9419211B2Etching method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Aug 16, 2016·1 cites·7 claims
- 1062US9177781B2Plasma processing method and manufacturing method of semiconductor deviceTAHARA SHIGERU·Filed 2011·Granted Nov 3, 2015·1 cites·8 claims
- 1156US10923329B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Feb 16, 2021·0 cites·14 claims
- 1252US2015132970A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1342US9245764B2Semiconductor device manufacturing methodTOKYO ELECTRON LTD·Filed 2012·Granted Jan 26, 2016·0 cites·11 claims
- 1442US9150969B2Method of etching metal layerTOKYO ELECTRON LTD·Filed 2014·Granted Oct 6, 2015·0 cites·3 claims
- 1542US2016203998A1Etching methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1641US9882124B2Etching method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Jan 30, 2018·0 cites·5 claims
- 1741US9234083B2Method and apparatus for forming a periodic pattern using a self-assembled block copolymerTOKYO ELECTRON LTD·Filed 2013·Granted Jan 12, 2016·0 cites·13 claims
- 1838US2011174337A1Method and apparatus for recovering pattern on silicon substrateTOKYO ELECTRON LTD·Filed 2011·Application pending·0 cites
- 1937US2011168205A1Substrate cleaning method and substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 2011·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →