Inventor · disambiguated record
Masafumi Hori
Also filed as: HORI MASAFUMI
24 granted patents·4 pending applications·28 citations·filing 2011–2022
92Inventor score
Top patents by PatentIndex Score
28 records- 0187US8609319B2Radiation-sensitive resin composition and resist film formed using the sameKIMURA TORU·Filed 2011·Granted Dec 17, 2013·6 cites·17 claims
- 0284US8815493B2Resist pattern-forming method, and radiation-sensitive resin compositionJSR CORP·Filed 2013·Granted Aug 26, 2014·4 cites·5 claims
- 0382US8728706B2Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compoundASANO YUUSUKE·Filed 2012·Granted May 20, 2014·4 cites·7 claims
- 0478US9513548B2Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compoundJSR CORP·Filed 2014·Granted Dec 6, 2016·2 cites·12 claims
- 0577US9170488B2Resist pattern-forming method, and radiation-sensitive resin compositionJSR CORP·Filed 2014·Granted Oct 27, 2015·2 cites·10 claims
- 0675US9335630B2Pattern-forming method, and radiation-sensitive compositionJSR CORP·Filed 2015·Granted May 10, 2016·1 cites·18 claims
- 0769USD1063125SWall panelKMEW CO LTD·Filed 2022·Granted Feb 18, 2025·3 cites·1 claims
- 0869US9046765B2Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist filmJSR CORP·Filed 2013·Granted Jun 2, 2015·2 cites·18 claims
- 0969US8795954B2Resist pattern-forming method, and radiation-sensitive resin compositionJSR CORP·Filed 2013·Granted Aug 5, 2014·1 cites·6 claims
- 1066US11705331B2Method and composition for selectively modifying base material surfaceJSR CORP·Filed 2021·Granted Jul 18, 2023·0 cites·20 claims
- 1163US8877429B2Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the sameWAKAMATSU GOUJI·Filed 2011·Granted Nov 4, 2014·2 cites·5 claims
- 1262US9158196B2Radiation-sensitive resin composition and pattern-forming methodJSR CORP·Filed 2013·Granted Oct 13, 2015·1 cites·12 claims
- 1359US11335559B2Pattern-forming method, and compositionJSR CORP·Filed 2020·Granted May 17, 2022·0 cites·24 claims
- 1459US10950438B2Method and composition for selectively modifying base material surfaceJSR CORP·Filed 2019·Granted Mar 16, 2021·0 cites·19 claims
- 1557US9034559B2Pattern-forming method, and radiation-sensitive compositionJSR CORP·Filed 2013·Granted May 19, 2015·0 cites·16 claims
- 1656US10048586B2Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compoundJSR CORP·Filed 2016·Granted Aug 14, 2018·0 cites·19 claims
- 1753US9029067B2Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the sameJSR CORP·Filed 2014·Granted May 12, 2015·0 cites·12 claims
- 1852US2018342387A1Pattern-forming method, and compositionJSR CORP·Filed 2018·Application pending·0 cites
- 1951US11211246B2Method and composition for selectively modifying base material surfaceJSR CORP·Filed 2019·Granted Dec 28, 2021·0 cites·20 claims
- 2050US11370872B2Composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2019·Granted Jun 28, 2022·0 cites·19 claims
- 2148US10691019B2Pattern-forming method and compositionJSR CORP·Filed 2019·Granted Jun 23, 2020·0 cites·20 claims
- 2246US2019194365A1Composition, modification method and selective modification method of base material surface, pattern-forming method, and polymerJSR CORP·Filed 2019·Application pending·0 cites
- 2345US9760004B2Radiation-sensitive resin composition and resist pattern-forming methodJSR CORP·Filed 2014·Granted Sep 12, 2017·0 cites·12 claims
- 2445US9223207B2Resist pattern-forming method, and radiation-sensitive resin compositionJSR CORP·Filed 2013·Granted Dec 29, 2015·0 cites·22 claims
- 2543US11460767B2Composition for film formation, film-forming method and directed self-assembly lithography processJSR CORP·Filed 2019·Granted Oct 4, 2022·0 cites·17 claims
- 2643US9164387B2Pattern-forming method, and radiation-sensitive resin compositionJSR CORP·Filed 2013·Granted Oct 20, 2015·0 cites·12 claims
- 2734US2011123936A1Resist pattern coating agent and resist pattern-forming methodJSR CORP·Filed 2011·Application pending·0 cites
- 2833US2011223544A1Resist pattern coating agent and resist pattern forming method using the sameJSR CORP·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →