Inventor · disambiguated record
Yun-Ren Wang
Also filed as: WANG YUN-REN
7 granted patents·5 pending applications·20 citations·filing 2004–2011
81Inventor score
Top patents by PatentIndex Score
12 records- 0180US8895435B2Polysilicon layer and method of forming the sameLIN CHIEN-LIANG·Filed 2011·Granted Nov 25, 2014·4 cites·13 claims
- 0273US7435640B2Method of fabricating gate structureUNITED MICROELECTRONICS CORP·Filed 2005·Granted Oct 14, 2008·4 cites·11 claims
- 0373US7265065B2Method for fabricating dielectric layer doped with nitrogenUNITED MICROELECTRONICS CORP·Filed 2005·Granted Sep 4, 2007·5 cites·12 claims
- 0471US7601404B2Method for switching decoupled plasma nitridation processes of different dosesUNITED MICROELECTRONICS CORP·Filed 2005·Granted Oct 13, 2009·4 cites·14 claims
- 0564US7811892B2Multi-step annealing processUNITED MICROELECTRONICS CORP·Filed 2006·Granted Oct 12, 2010·2 cites·31 claims
- 0654US7335548B2Method of manufacturing metal-oxide-semiconductor transistorUNITED MICROELECTRONICS CORP·Filed 2006·Granted Feb 26, 2008·1 cites·14 claims
- 0753US7709316B2Method of fabricating gate structureUNITED MICROELECTRONICS CORP·Filed 2008·Granted May 4, 2010·0 cites·22 claims
- 0849US2008157231A1Gate structureUNITED MICROELECTRONICS CORP·Filed 2008·Application pending·0 cites
- 0944US2008254642A1Method of fabricating gate dielectric layerUNITED MICROELECTRONICS CORP·Filed 2007·Application pending·0 cites
- 1042US2006062913A1Process for depositing btbas-based silicon nitride filmsWANG YUN-REN·Filed 2004·Application pending·0 cites
- 1138US2007082503A1Method of fabricating a dielectric layerWANG YUN-REN·Filed 2005·Application pending·0 cites
- 1238US2006014350A1Method for fabricating a semiconductor transistor device having ultra-shallow source/drain extensionsWANG YUN-REN·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →