Inventor · disambiguated record
Peter Renteln
Also filed as: RENTELN PETER · RENTELN PETER H · RENTELN PETER HENRY
9 granted patents·10 pending applications·442 citations·filing 1992–2025
90Inventor score
Top patents by PatentIndex Score
19 records- 0195US5287663APolishing pad and method for polishing semiconductor wafersNAT SEMICONDUCTOR CORP·Filed 1992·Granted Feb 22, 1994·141 cites·7 claims
- 0292US6620031B2Method for optimizing the planarizing length of a polishing padLAM RES CORP·Filed 2001·Granted Sep 16, 2003·52 cites·26 claims
- 0392US5664987AMethods and apparatus for control of polishing pad conditioning for wafer planarizationNAT SEMICONDUCTOR CORP·Filed 1996·Granted Sep 9, 1997·207 cites·20 claims
- 0471US7252582B2Optimized grooving structure for a CMP polishing padJH RHODES COMPANY INC·Filed 2004·Granted Aug 7, 2007·14 cites·18 claims
- 0569US6645052B2Method and apparatus for controlling CMP pad surface finishLAM RES CORP·Filed 2001·Granted Nov 11, 2003·12 cites·26 claims
- 0664US2025339833A1Novel High-Efficiency Plasma/Pyrolytic Gas-phase Reactor with Enhanced Neutralization CapabilityFREEMAN BRUCE·Filed 2025·Application pending·0 cites
- 0757US7189156B2Stacked polyurethane polishing pad and method of producing the sameJH RHODES COMPANY INC·Filed 2004·Granted Mar 13, 2007·3 cites·24 claims
- 0857US6752698B1Method and apparatus for conditioning fixed-abrasive polishing padsLAM RES CORP·Filed 2002·Granted Jun 22, 2004·8 cites·20 claims
- 0954US6939207B2Method and apparatus for controlling CMP pad surface finishLAM RES CORP·Filed 2003·Granted Sep 6, 2005·5 cites·17 claims
- 1051US2022018486A1Effective heat shielding and heat dispersing apparatusRENTELN PETER·Filed 2020·Application pending·0 cites
- 1148US2020205560A1Porous polymeric polishing bristles and methods for their manufactureJH RHODES COMPANY INC·Filed 2020·Application pending·0 cites
- 1245US2008145302A1High strength low density fiberRENTELN PETER HENRY·Filed 2007·Application pending·0 cites
- 1345US2013205679A1Method of manufacturing a chemical mechanical planarization padINNOPAD INC·Filed 2013·Application pending·0 cites
- 1440US2008146129A1Fast break-in polishing pad and a method of making the sameKOUZUMA MAKOTO·Filed 2007·Application pending·0 cites
- 1540US2009017729A1Polishing pad and methods of improving pad removal rates and planarizationJH RHODES COMPANY INC·Filed 2005·Application pending·0 cites
- 1637US6758726B2Partial-membrane carrier headLAM RES CORP·Filed 2002·Granted Jul 6, 2004·0 cites·20 claims
- 1737US2006046627A1Method of improving planarization of urethane polishing pads, and urethane polishing pad produced by the sameRENTELN PETER·Filed 2004·Application pending·0 cites
- 1837US2006099891A1Method of chemical mechanical polishing, and a pad provided thereforeRENTELN PETER·Filed 2004·Application pending·0 cites
- 1937US2006046064A1Method of improving removal rate of padsHALBERG DWAINE·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →