Inventor · disambiguated record
Etsuji Ito
Also filed as: ITO ETSUJI
10 granted patents·2 pending applications·16 citations·filing 2004–2018
83Inventor score
Top patents by PatentIndex Score
12 records- 0184US10651012B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2016·Granted May 12, 2020·3 cites·8 claims
- 0278US9390943B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jul 12, 2016·4 cites·10 claims
- 0375US9978566B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2016·Granted May 22, 2018·2 cites·6 claims
- 0475US9859146B2Semiconductor manufacturing device and processing methodHIMORI SHINJI·Filed 2012·Granted Jan 2, 2018·3 cites·3 claims
- 0572US10699935B2Semiconductor manufacturing device and processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Jun 30, 2020·1 cites·3 claims
- 0663US2014346040A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 0757US7368876B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted May 6, 2008·3 cites·11 claims
- 0853US2015072534A1Etching method of multilayer filmTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 0952US8895454B2Etching method of multilayer filmTOKYO ELECTRON LTD·Filed 2014·Granted Nov 25, 2014·0 cites·7 claims
- 1042US10943766B2Power feed member and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Mar 9, 2021·0 cites·11 claims
- 1139US10147633B2Transfer apparatus and plasma processing systemHIMORI SHINJI·Filed 2012·Granted Dec 4, 2018·0 cites·9 claims
- 1237US10763087B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Sep 1, 2020·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →