Inventor · disambiguated record
Manabu Shinriki
Also filed as: SHINRIKI MANABU
3 granted patents·7 pending applications·4 citations·filing 2004–2015
55Inventor score
Top patents by PatentIndex Score
10 records- 0169US8497391B2Insulating film material, method of film formation using insulating film material, and insulating filmOHNO TAKAHISA·Filed 2009·Granted Jul 30, 2013·3 cites·4 claims
- 0257US8642454B2Low temperature selective epitaxy of silicon germanium alloys employing cyclic deposit and etchBRABANT PAUL D·Filed 2012·Granted Feb 4, 2014·1 cites·25 claims
- 0348US2013040440A1EPITAXIAL PROCESS WITH SURFACE CLEANING FIRST USING HCl/GeH4/H2SiCl2IBM·Filed 2012·Application pending·0 cites
- 0446US2013040438A1EPITAXIAL PROCESS WITH SURFACE CLEANING FIRST USING HCl/GeH4/H2SiCl2IBM·Filed 2011·Application pending·0 cites
- 0545US9218962B2Low temperature epitaxy of a semiconductor alloy including silicon and germanium employing a high order silane precursorGLOBALFOUNDRIES INC·Filed 2013·Granted Dec 22, 2015·0 cites·19 claims
- 0644US2011159212A1Insulating film material, method for forming film by using the insulating film material, and insulating filmNAT INST FOR MATERIALS SCIENCE·Filed 2009·Application pending·0 cites
- 0737US2007259131A1Plasma-Assisted Deposition Method and System for Carrying Out the SameKOBAYASHI YASUO·Filed 2006·Application pending·0 cites
- 0835US2014120678A1Methods for Selective and Conformal Epitaxy of Highly Doped Si-containing Materials for Three Dimensional StructuresSHINRIKI MANABU·Filed 2013·Application pending·0 cites
- 0933US2017194138A1Low temperature selective deposition employing a germanium-containing gas assisted etchIBM·Filed 2015·Application pending·0 cites
- 1030US2005096238A1Cleaning gas and cleaning methodTAIYO NIPPON SANSO CORP·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →