Inventor · disambiguated record
Shosuke Endoh
Also filed as: ENDOH SHOSUKE
8 granted patents·7 pending applications·57 citations·filing 1997–2012
86Inventor score
Top patents by PatentIndex Score
15 records- 0188US8124539B2Plasma processing apparatus, focus ring, and susceptorENDOH SHOSUKE·Filed 2010·Granted Feb 28, 2012·12 cites·14 claims
- 0286US8114247B2Plasma processing apparatus and focus ringENDOH SHOSUKE·Filed 2010·Granted Feb 14, 2012·8 cites·5 claims
- 0378US7927066B2Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing componentTOKYO ELECTRON LTD·Filed 2006·Granted Apr 19, 2011·8 cites·12 claims
- 0462US7850174B2Plasma processing apparatus and focus ringTOKYO ELECTRON LTD·Filed 2004·Granted Dec 14, 2010·7 cites·23 claims
- 0561US7622017B2Processing apparatus and gas discharge suppressing memberTOKYO ELECTRON LTD·Filed 2004·Granted Nov 24, 2009·8 cites·22 claims
- 0660US8727708B2Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing componentMORIYA TSUYOSHI·Filed 2011·Granted May 20, 2014·1 cites·20 claims
- 0756US2007227663A1Substrate processing apparatus and side wall componentTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 0850US2012037314A1Substrate processing apparatus and side wall componentENDOH SHOSUKE·Filed 2011·Application pending·0 cites
- 0949US2010089323A1Method for coating internal member having holes in vacuum processing apparatus and the internal member having holes coated by using the coating methodTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1047US2007187363A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1146US7604845B2Method for coating internal member having holes in vacuum processing apparatus and the internal member having holes coated by using the coating methodTOKYO ELECTRON LTD·Filed 2003·Granted Oct 20, 2009·3 cites·4 claims
- 1245US5961361AMethod for manufacturing electrode plate for plasma processing deviceTOKYO ELECTRON LTD·Filed 1997·Granted Oct 5, 1999·10 cites·6 claims
- 1342US2012200051A1Method for coating internal member having holes in vacuum processing apparatus and the internal member having holes coated by using the coating methodTAKEUCHI JUN·Filed 2012·Application pending·0 cites
- 1441US2004261946A1Plasma processing apparatus, focus ring, and susceptorTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 1538US2004108066A1Temperature measuring method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →