Inventor · disambiguated record
Hiroyuki Miyashita
Also filed as: MIYASHITA HIROYUKI
38 granted patents·10 pending applications·931 citations·filing 1984–2024
97Inventor score
Files withTOKYO ELECTRON LTD18DAINIPPON PRINTING CO LTD13KASAI SHIGERU5CHUGAI PHARMACEUTICAL CO LTD2FUJI ELECTRIC CO LTD2
Top patents by PatentIndex Score
48 records- 0197US8246900B2Annealing apparatusKASAI SHIGERU·Filed 2007·Granted Aug 21, 2012·468 cites·18 claims
- 0293US9281154B2Microwave introducing mechanism, microwave plasma source and microwave plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Mar 8, 2016·15 cites·17 claims
- 0391US5538816AHalftone phase shift photomask, halftone phase shift photomask blank, and methods of producing the sameDAINIPPON PRINTING CO LTD·Filed 1994·Granted Jul 23, 1996·72 cites·42 claims
- 0488US11749511B2Plasma observation system and plasma observation methodTOKYO ELECTRON LTD·Filed 2021·Granted Sep 5, 2023·2 cites·15 claims
- 0588US9520273B2Tuner, microwave plasma source and impedance matching methodTOKYO ELECTRON LTD·Filed 2016·Granted Dec 13, 2016·5 cites·10 claims
- 0684US5723234APhase shift photomask and phase shift photomask dry etching methodDAINIPPON PRINTING CO LTD·Filed 1996·Granted Mar 3, 1998·53 cites·6 claims
- 0784US4583214AKey telephone transmission systemIWATSU ELECTRIC CO LTD·Filed 1984·Granted Apr 15, 1986·51 cites·2 claims
- 0883US5702847APhase shift photomask, phase shift photomask blank, and process for fabricating themDAINIPPON PRINTING CO LTD·Filed 1995·Granted Dec 30, 1997·55 cites·23 claims
- 0981US8897631B2Annealing apparatusKASAI SHIGERU·Filed 2009·Granted Nov 25, 2014·8 cites·29 claims
- 1079US11205719B2Insulated-gate semiconductor deviceFUJI ELECTRIC CO LTD·Filed 2020·Granted Dec 21, 2021·1 cites·15 claims
- 1177US5380608APhase shift photomask comprising a layer of aluminum oxide with magnesium oxideDAINIPPON PRINTING CO LTD·Filed 1992·Granted Jan 10, 1995·30 cites·5 claims
- 1276US9520272B2Microwave emission mechanism, microwave plasma source and surface wave plasma processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Dec 13, 2016·3 cites·15 claims
- 1375US7817077B2Differential comparator, and pipeline type A/D converter equipped with the sameSANYO ELECTRONIC CO LTD·Filed 2009·Granted Oct 19, 2010·8 cites·9 claims
- 1472US12463013B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Granted Nov 4, 2025·0 cites·10 claims
- 1572US5614335ABlanks for halftone phase shift photomasks, halftone phase shift photomasks, and methods for fabricating themDAINIPPON PRINTING CO LTD·Filed 1994·Granted Mar 25, 1997·20 cites·16 claims
- 1668US2024018503A1Coagulation factor ix with improved pharmacokineticsCHUGAI PHARMACEUTICAL CO LTD·Filed 2023·Application pending·0 cites
- 1767US7491705B2Alpha-ketoamide derivative, and production method and use thereofSENJU PHARMA CO·Filed 2004·Granted Feb 17, 2009·4 cites·6 claims
- 1867US5738959AHalftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same comprising fluorine in phase shift layerDAINIPPON PRINTING CO LTD·Filed 1996·Granted Apr 14, 1998·21 cites·19 claims
- 1964US12205799B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jan 21, 2025·0 cites·20 claims
- 2064US5916712AHalftone phase shift photomask, halftone phase shift photomask blank, and method of producing the sameDAINIPPON PRINTING CO LTD·Filed 1998·Granted Jun 29, 1999·19 cites·6 claims
- 2164US2025095954A1High-Frequency Power Supply, Plasma Processing Device, and Matching MethodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2263US9548187B2Microwave radiation antenna, microwave plasma source and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jan 17, 2017·1 cites·7 claims
- 2363US5688617APhase shift layer-containing photomask, and its production and correctionDAINIPPON PRINTING CO LTD·Filed 1996·Granted Nov 18, 1997·24 cites·3 claims
- 2462US12482637B2Plasma source and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Nov 25, 2025·0 cites·20 claims
- 2562US9702913B2Acquisition method for S-parameters in microwave introduction modules, and malfunction detection methodTOKYO ELECTRON LTD·Filed 2013·Granted Jul 11, 2017·2 cites·12 claims
- 2660US2024297018A1Distributor and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2759US5561009ABlanks for phase shift photomasks, and phase shift photomasksDAINIPPON PRINTING CO LTD·Filed 1994·Granted Oct 1, 1996·15 cites·2 claims
- 2858US8124168B2Substrate processing method and substrate processing apparatusTADA KUNIHIRO·Filed 2006·Granted Feb 28, 2012·2 cites·7 claims
- 2955US5721075ABlanks for halftone phase shift photomasks, halftone phase shift photomasks, and methods for fabricating themDAINIPPON PRINTING CO LTD·Filed 1997·Granted Feb 24, 1998·13 cites·10 claims
- 3055US2024014298A1Semiconductor device and method of manufacturing semiconductor deviceFUJI ELECTRIC CO LTD·Filed 2023·Application pending·0 cites
- 3153US2008280048A1Single wafer processing unitKASAI SHIGERU·Filed 2008·Application pending·0 cites
- 3253US2024212985A1Filter circuit and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3352US8440939B2Annealing deviceKASAI SHIGERU·Filed 2008·Granted May 14, 2013·0 cites·9 claims
- 3449US5614336APhase shift layer-containing photomask, and its production and correctionDAINIPPON PRINTING CO LTD·Filed 1994·Granted Mar 25, 1997·16 cites·2 claims
- 3549US5604060AHalftone phase shift photomask comprising a single layer of halftone light blocking and phase shiftingDAINIPPON PRINTING CO LTD·Filed 1994·Granted Feb 18, 1997·10 cites·9 claims
- 3648US11569558B2Directional coupler for use in a substrate processing apparatus, where the directional coupler includes a coaxial line coupled to a conductor on a substrateTOKYO ELECTRON LTD·Filed 2021·Granted Jan 31, 2023·0 cites·20 claims
- 3748US2012279944A1Annealing apparatusKASAI SHIGERU·Filed 2012·Application pending·0 cites
- 3846US2020109390A1Coagulation factor ix with improved pharmacokineticsCHUGAI PHARMACEUTICAL CO LTD·Filed 2018·Application pending·0 cites
- 3944US11488847B2Apparatus and method for heat-treating substrateTOKYO ELECTRON LTD·Filed 2020·Granted Nov 1, 2022·0 cites·20 claims
- 4044US11164730B2Plasma probe device and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Nov 2, 2021·0 cites·11 claims
- 4141US2004069234A1Sheet-type treating deviceFiled 2002·Application pending·0 cites
- 4237US9704693B2Power combiner and microwave introduction mechanismTOKYO ELECTRON LTD·Filed 2016·Granted Jul 11, 2017·0 cites·15 claims
- 4337US5576123AOverlying shifter type phase shift photomask blank, overlying shifter type phase shift photomask and methods of producing themDAINIPPON PRINTING CO LTD·Filed 1995·Granted Nov 19, 1996·4 cites·18 claims
- 4434US5125773ABoring barMIYASHITA KIYOSHI·Filed 1991·Granted Jun 30, 1992·5 cites·4 claims
- 4534US2015348758A1Impedance matching slug, impedance matching device, electromagnetic wave transmission device, electromagnetic wave radiation device, and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 4632US7151708B2Semiconductor integrated circuit and operational amplifierSANYO ELECTRIC CO·Filed 2005·Granted Dec 19, 2006·0 cites·16 claims
- 4732US4592046ASubscriber's circuit for time division switching systemIWATSU ELECTRIC CO LTD·Filed 1984·Granted May 27, 1986·3 cites·2 claims
- 4830US5880437AAutomatic control system and method using sameTOKYO ELECTRON LTD·Filed 1997·Granted Mar 9, 1999·1 cites·8 claims
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