Impedance matching slug, impedance matching device, electromagnetic wave transmission device, electromagnetic wave radiation device, and plasma processing apparatus

Abstract

An impedance matching slug that performs an impedance matching process in a waveguide is axially movably interposed between an outer conductor and an inner conductor of the waveguide. The impedance matching slug includes: a cylindrical first part and a cylindrical second part which are coupled to each other, wherein each of the first part and the second part has an inner circumferential surface facing the inner conductor and an outer circumferential surface facing the outer conductor, wherein the second part is disposed in the outside of the first part in such a manner that the inner circumferential surface of the second part is in contact with the outer circumferential surface of the first part, wherein one of the first part and the second part is constituted by a conductor, and wherein the other of the first part and the second part is constituted by a dielectric.

What is claimed is: 
     
         1 . An impedance matching slug that performs an impedance matching process between an output impedance of an electromagnetic wave supply source and an input impedance of a load, in a waveguide for transmitting an electromagnetic wave supplied from the electromagnetic wave supply source to the load, the waveguide including a cylindrical outer conductor and an inner conductor which is coaxial to the outer conductor and is installed inside the outer conductor, and the impedance matching slug being axially movably interposed between the outer conductor and the inner conductor, the impedance matching slug comprising:
 a cylindrical first part and a cylindrical second part which are coupled to each other,   wherein each of the first part and the second part has an inner circumferential surface facing the inner conductor and an outer circumferential surface facing the outer conductor,   wherein the second part is disposed in the outside of the first part in such a manner that the inner circumferential surface of the second part is in contact with the outer circumferential surface of the first part,   wherein one of the first part and the second part is constituted by a conductor, and   wherein the other of the first part and the second part is constituted by a dielectric.   
     
     
         2 . The impedance matching slug of  claim 1 , wherein the first part is constituted by a conductor and the second part is constituted by a dielectric. 
     
     
         3 . An impedance matching device that performs an impedance matching process between an output impedance of an electromagnetic wave supply source and an input impedance of a load, in a waveguide for transmitting an electromagnetic wave supplied from the electromagnetic wave supply source to the load, the waveguide including a cylindrical outer conductor and an inner conductor which is coaxial to the outer conductor and is installed inside the outer conductor, the impedance matching device comprising:
 a first slug and a second slug which are axially movably interposed between the outer conductor and the inner conductor; and   a driving mechanism that moves the first slug and the second slug in an axial direction, independently of each other,   wherein each of the first slug and the second slug includes a cylindrical first part and a cylindrical second part which are coupled to each other,   wherein each of the first part and the second part has an inner circumferential surface facing the inner conductor and an outer circumferential surface facing the outer conductor,   wherein the second part is disposed in the outside of the first part in such a manner that the inner circumferential surface of the second part is in contact with the outer circumferential surface of the first part,   wherein one of the first part and the second part is constituted by a conductor, and   wherein the other of the first part and the second part is constituted by a dielectric.   
     
     
         4 . An electromagnetic wave transmission device comprising:
 a waveguide that transmits an electromagnetic wave supplied from an electromagnetic wave supply source to a load; and   an impedance matching device that performs an impedance matching process between an output impedance of the electromagnetic wave supply source and an input impedance of the load,   wherein the waveguide includes a cylindrical outer conductor and an inner conductor which is coaxial to the outer conductor and is installed inside the outer conductor,   wherein the impedance matching device includes:
 a first slug and a second slug which are axially movably interposed between the outer conductor and the inner conductor; and 
 a driving mechanism that moves the first slug and the second slug in an axial direction, independently of each other, 
   wherein each of the first slug and the second slug includes a cylindrical first part and a cylindrical second part which are coupled to each other,   wherein each of the first part and the second part has an inner circumferential surface facing the inner conductor and an outer circumferential surface facing the outer conductor,   wherein the second part is disposed in the outside of the first part in such a manner that the inner circumferential surface of the second part is in contact with the outer circumferential surface of the first part,   wherein one of the first part and the second part is constituted by a conductor, and   wherein the other of the first part and the second part is constituted by a dielectric.   
     
     
         5 . An electromagnetic wave radiation device comprising:
 a waveguide that transmits an electromagnetic wave;   an electromagnetic wave supply source that supplies the electromagnetic wave to the waveguide;   an electromagnetic wave radiation antenna that radiates the electromagnetic wave transmitted by the waveguide; and   an impedance matching device that performs an impedance matching process between an output impedance of the electromagnetic wave supply source and an input impedance of the electromagnetic wave radiation antenna,   wherein the waveguide includes a cylindrical outer conductor and an inner conductor which is coaxial to the outer conductor and is installed inside the outer conductor,   wherein the impedance matching device includes:
 a first slug and a second slug which are axially movably interposed between the outer conductor and the inner conductor; and 
 a driving mechanism that moves the first slug and the second slug in an axial direction, independently of each other, 
   wherein each of the first slug and the second slug includes a cylindrical first part and a cylindrical second part which are coupled to each other,   wherein each of the first part and the second part has an inner circumferential surface facing the inner conductor and an outer circumferential surface facing the outer conductor,   wherein the second part is disposed in the outside of the first part in such a manner that the inner circumferential surface of the second part is in contact with the outer circumferential surface of the first part,   wherein one of the first part and the second part is constituted by a conductor, and   wherein the other of the first part and the second part is constituted by a dielectric.   
     
     
         6 . The electromagnetic wave radiation device of  claim 5 , wherein the electromagnetic wave supply source includes: an electromagnetic wave supply antenna that generates the electromagnetic wave supplied to the waveguide; and a power feeding part that feeds an electric power for generating the electromagnetic wave to the electromagnetic wave supply antenna. 
     
     
         7 . A plasma processing apparatus comprising:
 a chamber that accommodates a substrate to be processed;   a gas supply device that supplies a gas into the chamber; and   an electromagnetic wave radiation device of  claim 5 ,   wherein the electromagnetic wave radiation antenna of the electromagnetic wave radiation device radiates an electromagnetic wave into the chamber, and   wherein the gas supplied into the chamber is converted into plasma by the electromagnetic wave radiated into the chamber and the substrate is processed using the plasma.   
     
     
         8 . A plasma processing apparatus comprising:
 a chamber that accommodates a substrate to be processed;   a gas supply device that supplies a gas into the chamber; and   an electromagnetic wave radiation device of  claim 6 ,   wherein the electromagnetic wave radiation antenna of the electromagnetic wave radiation device radiates an electromagnetic wave into the chamber, and   wherein the gas supplied into the chamber is converted into plasma by the electromagnetic wave radiated into the chamber and the substrate is processed using the plasma.