Inventor · disambiguated record
Yuki Osada
Also filed as: OSADA YUKI
29 granted patents·10 pending applications·459 citations·filing 2002–2025
96Inventor score
Top patents by PatentIndex Score
39 records- 0198US9072158B2Electromagnetic-radiation power-supply mechanism for exciting a coaxial waveguide by using first and second poles and a ring-shaped reflection portionIKEDA TARO·Filed 2012·Granted Jun 30, 2015·189 cites·9 claims
- 0297US7176634B2Coaxial type impedance matching device and impedance detecting method for plasma generationTOKYO ELECTRON LTD·Filed 2004·Granted Feb 13, 2007·115 cites·4 claims
- 0393US9281154B2Microwave introducing mechanism, microwave plasma source and microwave plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Mar 8, 2016·15 cites·17 claims
- 0492US8308898B2Tuner and microwave plasma sourceKASAI SHIGERU·Filed 2011·Granted Nov 13, 2012·19 cites·10 claims
- 0590US7355379B2Coaxial type impedance matching device and impedance detecting method for plasma generationTOKYO ELECTRON LTD·Filed 2006·Granted Apr 8, 2008·16 cites·5 claims
- 0688US10414432B2Vehicle display deviceSUBARU CORP·Filed 2017·Granted Sep 17, 2019·7 cites·2 claims
- 0788US9520273B2Tuner, microwave plasma source and impedance matching methodTOKYO ELECTRON LTD·Filed 2016·Granted Dec 13, 2016·5 cites·10 claims
- 0888US7445690B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Nov 4, 2008·15 cites·12 claims
- 0987US10971413B2Plasma processing apparatus and control methodTOKYO ELECTRON LTD·Filed 2018·Granted Apr 6, 2021·4 cites·8 claims
- 1086US11244810B2Electric field sensor, surface wave plasma source, and surface wave plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Feb 8, 2022·2 cites·16 claims
- 1183US6819052B2Coaxial type impedance matching device and impedance detecting method for plasma generationJAPAN RADIO CO LTD·Filed 2003·Granted Nov 16, 2004·16 cites·2 claims
- 1281US11152269B2Plasma processing apparatus and control methodTOKYO ELECTRON LTD·Filed 2018·Granted Oct 19, 2021·2 cites·9 claims
- 1378US7070333B2Lubrication structure for rolling bearingISHIKAWAJIMA HARIMA HEAVY IND·Filed 2004·Granted Jul 4, 2006·15 cites·13 claims
- 1477US7915827B2Magnetron control method, magnetron service life judgment method, microwave generation device, magnetron service life judgment device, processing device, computer program, and storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Mar 29, 2011·5 cites·9 claims
- 1576US10293749B2Vehicle control device and vehicleSUBARU CORP·Filed 2017·Granted May 21, 2019·3 cites·7 claims
- 1676US9520272B2Microwave emission mechanism, microwave plasma source and surface wave plasma processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Dec 13, 2016·3 cites·15 claims
- 1774US7226524B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Jun 5, 2007·12 cites·12 claims
- 1872US12463013B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Granted Nov 4, 2025·0 cites·10 claims
- 1970US8945342B2Surface wave plasma generating antenna and surface wave plasma processing apparatusIKEDA TARO·Filed 2012·Granted Feb 3, 2015·2 cites·14 claims
- 2069US12068208B2Plasma processing apparatus and control methodTOKYO ELECTRON LTD·Filed 2021·Granted Aug 20, 2024·0 cites·18 claims
- 2169US2025285838A1Filter circuit and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2266US2025210840A1Filter circuit and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2366US2025201522A1Plasma Processing Apparatus and Plasma Processing MethodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2464US2025095954A1High-Frequency Power Supply, Plasma Processing Device, and Matching MethodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2563US9548187B2Microwave radiation antenna, microwave plasma source and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jan 17, 2017·1 cites·7 claims
- 2663US2024339304A1Plasma Processing Apparatus and Plasma Control MethodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2762US12482637B2Plasma source and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Nov 25, 2025·0 cites·20 claims
- 2862US10324470B2Vehicle control device and vehicleSUBARU CORP·Filed 2017·Granted Jun 18, 2019·1 cites·4 claims
- 2962US9702913B2Acquisition method for S-parameters in microwave introduction modules, and malfunction detection methodTOKYO ELECTRON LTD·Filed 2013·Granted Jul 11, 2017·2 cites·12 claims
- 3062US8163128B2Plasma processing apparatusKASAI SHIGERU·Filed 2008·Granted Apr 24, 2012·1 cites·11 claims
- 3160US10557200B2Plasma processing device with shower plate having protrusion for suppressing film formation in gas holes of shower plateTOKYO ELECTRON LTD·Filed 2014·Granted Feb 11, 2020·1 cites·6 claims
- 3260US2024297018A1Distributor and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3353US6856211B2Coaxial type impedance matching deviceJAPAN RADIO CO LTD·Filed 2003·Granted Feb 15, 2005·8 cites·21 claims
- 3448US11569558B2Directional coupler for use in a substrate processing apparatus, where the directional coupler includes a coaxial line coupled to a conductor on a substrateTOKYO ELECTRON LTD·Filed 2021·Granted Jan 31, 2023·0 cites·20 claims
- 3544US11164730B2Plasma probe device and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Nov 2, 2021·0 cites·11 claims
- 3642US2013192760A1Microwave emitting device and surface wave plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3742US2014034636A1Microwave irradiation apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3840US2012090782A1Microwave plasma source and plasma processing apparatusIKEDA TARO·Filed 2011·Application pending·0 cites
- 3934US2015348758A1Impedance matching slug, impedance matching device, electromagnetic wave transmission device, electromagnetic wave radiation device, and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →