Inventor · disambiguated record
Rainer Pforr
Also filed as: PFORR RAINER
21 granted patents·10 pending applications·247 citations·filing 1993–2012
95Inventor score
Files withINFINEON TECHNOLOGIES AG11PFORR RAINER5QIMONDA AG5IMEC INTER UNI MICRO ELECTR2HENKE WOLFGANG1
Top patents by PatentIndex Score
31 records- 0189US5496669ASystem for detecting a latent image using an alignment apparatusIMEC INTER UNI MICRO ELECTR·Filed 1993·Granted Mar 5, 1996·87 cites·19 claims
- 0283US8539394B2Method and apparatus for minimizing overlay errors in lithographyPFORR RAINER·Filed 2012·Granted Sep 17, 2013·4 cites·20 claims
- 0383US7339652B2Apparatus for projecting a pattern into an image planeINFINEON TECHNOLOGIES AG·Filed 2006·Granted Mar 4, 2008·9 cites·22 claims
- 0480US6660437B2Alternating phase maskINFINEON TECHNOLOGIES AG·Filed 2002·Granted Dec 9, 2003·22 cites·16 claims
- 0578US7644389B2Method for producing a mask for the lithographic projection of a pattern onto a substrateQIMONDA AG·Filed 2007·Granted Jan 5, 2010·7 cites·16 claims
- 0676US7489386B2System and method for projecting a pattern from a mask onto a substrateQIMONDA AG·Filed 2007·Granted Feb 10, 2009·4 cites·26 claims
- 0773US6627392B2Method of transferring a pattern of high structure density by multiple exposure of less dense partial patternsINFINEON TECHNOLOGIES AG·Filed 2002·Granted Sep 30, 2003·14 cites·12 claims
- 0873US5624773AResolution-enhancing optical phase structure for a projection illumination systemIMEC INTER UNI MICRO ELECTR·Filed 1993·Granted Apr 29, 1997·33 cites·16 claims
- 0971US8871409B2Lithographic targets for uniformity controlPFORR RAINER·Filed 2011·Granted Oct 28, 2014·3 cites·48 claims
- 1068US8293431B2Lithographic mask and method of forming a lithographic maskROLFF HAIKO·Filed 2010·Granted Oct 23, 2012·3 cites·23 claims
- 1167US10157804B2Method and apparatus for determining a critical dimension variation of a photolithographic maskPFORR RAINER·Filed 2012·Granted Dec 18, 2018·2 cites·24 claims
- 1267US7425396B2Method for reducing an overlay error and measurement mark for carrying out the sameINFINEON TECHNOLOGIES AG·Filed 2004·Granted Sep 16, 2008·19 cites·12 claims
- 1363US7855776B2Methods of compensating lens heating, lithographic projection system and photo maskQIMONDA AG·Filed 2008·Granted Dec 21, 2010·2 cites·25 claims
- 1461US6692875B2Mask for optical projection systems, and a process for its productionINFINEON TECHNOLOGIES AG·Filed 2001·Granted Feb 17, 2004·7 cites·14 claims
- 1560US7588867B2Reflection mask, use of the reflection mask and method for fabricating the reflection maskINFINEON TECHNOLOGIES AG·Filed 2005·Granted Sep 15, 2009·1 cites·21 claims
- 1660US6838216B2Photolithographic mask and methods for producing a structure and of exposing a wafer in a projection apparatusINFINEON TECHNOLOGIES AG·Filed 2003·Granted Jan 4, 2005·9 cites·12 claims
- 1759US7393613B2Set of at least two masks for the projection of structure patternsINFINEON TECHNOLOGIES AG·Filed 2004·Granted Jul 1, 2008·7 cites·5 claims
- 1859US6466373B1Trimming mask with semitransparent phase-shifting regionsSIEMENS AG·Filed 2000·Granted Oct 15, 2002·7 cites·11 claims
- 1950US7393614B2Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor waferINFINEON TECHNOLOGIES AG·Filed 2004·Granted Jul 1, 2008·3 cites·9 claims
- 2045US2008318153A1Photosensitive layer stackQIMONDA AG·Filed 2007·Application pending·0 cites
- 2144US2009170024A1Method of Patterning a Substrate, Photosensitive Layer Stack and System for LithographyHENNIG MARIO·Filed 2007·Application pending·0 cites
- 2242US2008204686A1Mask Structure for Manufacturing an Integrated Circuit by Photolithographic PatterningHENKE WOLFGANG·Filed 2008·Application pending·0 cites
- 2339US2005196689A1Method for transferring a layout of an integrated circuit level to a semiconductor substrateFiled 2005·Application pending·0 cites
- 2438US2007009816A1Method and system for photolithographyPFORR RAINER·Filed 2006·Application pending·0 cites
- 2536US7354683B2Lithography mask for imaging of convex structuresINFINEON TECHNOLOGIES AG·Filed 2004·Granted Apr 8, 2008·0 cites·30 claims
- 2636US2008304029A1Method and System for Adjusting an Optical ModelQIMONDA AG·Filed 2007·Application pending·0 cites
- 2735US6635388B1Contact hole fabrication with the aid of mutually crossing sudden phase shift edges of a single phase shift maskINFINEON TECHNOLOGIES AG·Filed 1999·Granted Oct 21, 2003·4 cites·11 claims
- 2835US2007229790A1Arrangement for the transfer of structural elements of a photomask onto a substrate and method thereforKUECHLER BERND·Filed 2007·Application pending·0 cites
- 2935US2007287075A1Mask arrangement, optical projection system and method for obtaining grating parameters and absorption properties of a diffractive optical elementPFORR RAINER·Filed 2006·Application pending·0 cites
- 3032US2008042171A1Transistor arrangement, sense-amplifier arrangement and methods of manufacturing the same via a phase shift maskMOSLER SEBASTIAN·Filed 2006·Application pending·0 cites
- 3131US2001021476A1Phase maskFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →