Inventor · disambiguated record
Takuo Ohwada
Also filed as: OHWADA TAKUO
9 granted patents·10 pending applications·6 citations·filing 2004–2020
78Inventor score
Files withKANTO KAGAKU11MURAMATSU MASAFUMI3OHWADA TAKUO2NEC ELECTRONICS CORP1RENESAS ELECTRONICS CORP1
Top patents by PatentIndex Score
19 records- 0166US7368064B2Cleaning solution and manufacturing method for semiconductor deviceNEC ELECTRONICS CORP·Filed 2005·Granted May 6, 2008·2 cites·7 claims
- 0265US9334470B2Cleaning liquid composition for electronic deviceKANTO KAGAKU·Filed 2012·Granted May 10, 2016·3 cites·16 claims
- 0364US11046910B2Cleaning solution compositionKANTO KAGAKU·Filed 2018·Granted Jun 29, 2021·1 cites·9 claims
- 0460US11512397B2Etchant composition and method for etchingKANTO KAGAKU·Filed 2020·Granted Nov 29, 2022·0 cites·8 claims
- 0552US7943516B2Manufacturing method for semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2008·Granted May 17, 2011·0 cites·9 claims
- 0650US2021163856A1Cleaning liquid compositionKANTO KAGAKU·Filed 2020·Application pending·0 cites
- 0746US11732365B2Composition for removing rutheniumKANTO KAGAKU·Filed 2019·Granted Aug 22, 2023·0 cites·3 claims
- 0845US2008188085A1Post-dry etching cleaning liquid composition and process for fabricating semiconductor deviceMURAMATSU MASAFUMI·Filed 2008·Application pending·0 cites
- 0944US2025382520A1Silicon nitride etching liquid compositionKANTO KAGAKU·Filed 2020·Application pending·0 cites
- 1042US2019301026A1Etchant compositions and method for etchingKANTO KAGAKU·Filed 2017·Application pending·0 cites
- 1142US2016083675A1Cleaning liquid compositionKANTO KAGAKU·Filed 2014·Application pending·0 cites
- 1242US2015075850A1Metal oxide etching solution and an etching methodKANTO KAGAKU·Filed 2014·Application pending·0 cites
- 1341US8513140B2Post-dry etching cleaning liquid composition and process for fabricating semiconductor deviceMURAMATSU MASAFUMI·Filed 2010·Granted Aug 20, 2013·0 cites·11 claims
- 1441US2021095378A1Cyanide-free liquid composition for immersion gold platingKANTO KAGAKU·Filed 2016·Application pending·0 cites
- 1540US2005007015A1Method of manufacturing laminated structure, laminated structure, display device and display unitFiled 2004·Application pending·0 cites
- 1640US2006019201A1Post-dry etching cleaning liquid composition and process for fabricating semiconductor deviceMURAMATSU MASAFUMI·Filed 2005·Application pending·0 cites
- 1737US11279904B2Cleaning liquid compositionKANTO KAGAKU·Filed 2017·Granted Mar 22, 2022·0 cites·8 claims
- 1837US8105998B2Liquid composition for removing photoresist residue and polymer residueOHWADA TAKUO·Filed 2007·Granted Jan 31, 2012·0 cites·11 claims
- 1928US2013231271A1Photoresist residue and polymer residue removing liquid compositionOHWADA TAKUO·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →