Inventor · disambiguated record
Heeyeop Chae
Also filed as: CHAE HEEYEOP
12 granted patents·11 pending applications·264 citations·filing 2002–2024
90Inventor score
Files withRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV6APPLIED MATERIALS INC5SEMES CO LTD2UNIV SUNGKYUNKWAN RES & BUS2BERA KALLOL1
Top patents by PatentIndex Score
23 records- 0198US7955986B2Capacitively coupled plasma reactor with magnetic plasma controlAPPLIED MATERIALS INC·Filed 2006·Granted Jun 7, 2011·70 cites·13 claims
- 0297US6853141B2Capacitively coupled plasma reactor with magnetic plasma controlFiled 2002·Granted Feb 8, 2005·140 cites·30 claims
- 0390US10942450B2Inorganic nanoparticle structure, film, optical member, light-emitting device, and liquid crystal display apparatus having the sameRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2018·Granted Mar 9, 2021·3 cites·7 claims
- 0483US9899619B2Electroluminescent diode having delayed florescence quantum dotRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2016·Granted Feb 20, 2018·5 cites·14 claims
- 0581US9196849B2Polymer/inorganic multi-layer encapsulation filmUNIV SUNGKYUNKWAN RES & BUS·Filed 2014·Granted Nov 24, 2015·5 cites·14 claims
- 0679US12134821B2Multilayer encapsulation thin-filmRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2021·Granted Nov 5, 2024·0 cites·7 claims
- 0779US8236105B2Apparatus for controlling gas flow in a semiconductor substrate processing chamberBERA KALLOL·Filed 2004·Granted Aug 7, 2012·22 cites·27 claims
- 0875US2020048763A1Multilayer encapsulation thin-filmRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2019·Application pending·0 cites
- 0974US10899963B2Light-emitting structure, optical member having the light-emitting structure, light-emitting device, and liquid crystal display apparatusRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2018·Granted Jan 26, 2021·1 cites·10 claims
- 1072US7256134B2Selective etching of carbon-doped low-k dielectricsAPPLIED MATERIALS INC·Filed 2003·Granted Aug 14, 2007·16 cites·18 claims
- 1171US2024410057A1Substrate processing method and substrate processing apparatusSEMES CO LTD·Filed 2024·Application pending·0 cites
- 1271US2024414919A1Substrate processing method and substrate processing apparatusSEMES CO LTD·Filed 2024·Application pending·0 cites
- 1360US2008023143A1Capacitively coupled plasma reactor with magnetic plasma controlHOFFMAN DANIEL J·Filed 2007·Application pending·0 cites
- 1459US2024387168A1Method of manufacturing semiconductor element by using atomic layer etching (ale) processSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1557US8049872B2Endpoint detection device for realizing real-time control of plasma reactor, plasma reactor with endpoint detection device, and endpoint detection methodDMS CO LTD·Filed 2008·Granted Nov 1, 2011·1 cites·19 claims
- 1655US2011201134A1Capacitively coupled plasma reactor with magnetic plasma controlAPPLIED MATERIALS INC·Filed 2011·Application pending·0 cites
- 1753US8223329B2Endpoint detection device for realizing real-time control of plasma reactor, plasma reactor with endpoint detection device, and endpoint detection methodPARK KUN JOO·Filed 2011·Granted Jul 17, 2012·1 cites·6 claims
- 1853US2014322527A1Multilayer encapsulation thin-filmUNIV SUNGKYUNKWAN RES & BUS·Filed 2014·Application pending·0 cites
- 1947US2005001556A1Capacitively coupled plasma reactor with magnetic plasma controlAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 2045US2020239765A1Quantum dot film with polymer beadsSABIC GLOBAL TECHNOLOGIES BV·Filed 2018·Application pending·0 cites
- 2138US11098244B2Composition comprising inorganic nano particle structure, light conversion thin film using the same, and display apparatus using the filmRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2019·Granted Aug 24, 2021·0 cites·11 claims
- 2238US2004040664A1Cathode pedestal for a plasma etch reactorFiled 2003·Application pending·0 cites
- 2336US2003228768A1Dielectric etching with reduced striationAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
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