Inventor · disambiguated record
Ganesh Balasubramanian
Also filed as: BALASUBRAMANIAN GANESH · BALASUBRAMANIAN GANESH K · BALASUBRAMANIAN GANESH KUMAR
114 granted patents·43 pending applications·819 citations·filing 2000–2025
99Inventor score
Files withAPPLIED MATERIALS INC121EATON INTELLIGENT POWER LTD8SCHLUMBERGER TECHNOLOGY CORP6PADHI DEENESH5BANK OF AMERICA3
Top patents by PatentIndex Score
157 records- 0197US11670492B2Chamber configurations and processes for particle controlAPPLIED MATERIALS INC·Filed 2020·Granted Jun 6, 2023·5 cites·17 claims
- 0297US9157730B2PECVD processAPPLIED MATERIALS INC·Filed 2013·Granted Oct 13, 2015·49 cites·18 claims
- 0397US7572337B2Blocker plate bypass to distribute gases in a chemical vapor deposition systemAPPLIED MATERIALS INC·Filed 2005·Granted Aug 11, 2009·43 cites·15 claims
- 0496US9458537B2PECVD processAPPLIED MATERIALS INC·Filed 2015·Granted Oct 4, 2016·12 cites·20 claims
- 0595US9816187B2PECVD processAPPLIED MATERIALS INC·Filed 2016·Granted Nov 14, 2017·8 cites·20 claims
- 0695US9355876B2Process load lock apparatus, lift assemblies, electronic device processing systems, and methods of processing substrates in load lock locationsAPPLIED MATERIALS INC·Filed 2014·Granted May 31, 2016·452 cites·17 claims
- 0794US10403535B2Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition systemAPPLIED MATERIALS INC·Filed 2015·Granted Sep 3, 2019·11 cites·17 claims
- 0894US8197636B2Systems for plasma enhanced chemical vapor deposition and bevel edge etchingSHAH ASHISH·Filed 2008·Granted Jun 12, 2012·30 cites·11 claims
- 0994US7829145B2Methods of uniformity control for low flow process and chamber to chamber matchingAPPLIED MATERIALS INC·Filed 2008·Granted Nov 9, 2010·18 cites·16 claims
- 1094US7622005B2Uniformity control for low flow process and chamber to chamber matchingAPPLIED MATERIALS INC·Filed 2005·Granted Nov 24, 2009·19 cites·8 claims
- 1193US11613812B2PECVD processAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·2 cites·20 claims
- 1292US11122021B1Server for handling multi-encrypted messagesBANK OF AMERICA·Filed 2020·Granted Sep 14, 2021·3 cites·18 claims
- 1391US10804044B2Electrical contact alloy for vacuum contactorsEATON INTELLIGENT POWER LTD·Filed 2019·Granted Oct 13, 2020·3 cites·7 claims
- 1491US10276353B2Dual-channel showerhead for formation of film stacksAPPLIED MATERIALS INC·Filed 2016·Granted Apr 30, 2019·4 cites·20 claims
- 1590US11721545B2Method of using dual frequency RF power in a process chamberAPPLIED MATERIALS INC·Filed 2020·Granted Aug 8, 2023·2 cites·16 claims
- 1690US10793954B2PECVD processAPPLIED MATERIALS INC·Filed 2018·Granted Oct 6, 2020·3 cites·13 claims
- 1790US10060032B2PECVD processAPPLIED MATERIALS INC·Filed 2017·Granted Aug 28, 2018·3 cites·20 claims
- 1890US9025299B2Triggered arc flash arrester and shield element for use therewithEATON CORP·Filed 2013·Granted May 5, 2015·7 cites·11 claims
- 1990US7189658B2Strengthening the interface between dielectric layers and barrier layers with an oxide layer of varying composition profileAPPLIED MATERIALS INC·Filed 2005·Granted Mar 13, 2007·11 cites·20 claims
- 2089US10100408B2Edge hump reduction faceplate by plasma modulationAPPLIED MATERIALS INC·Filed 2015·Granted Oct 16, 2018·6 cites·18 claims
- 2189US7867578B2Method for depositing an amorphous carbon film with improved density and step coverageAPPLIED MATERIALS INC·Filed 2006·Granted Jan 11, 2011·12 cites·14 claims
- 2288US11031262B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2020·Granted Jun 8, 2021·2 cites·20 claims
- 2387US11488811B2Chucking process and system for substrate processing chambersAPPLIED MATERIALS INC·Filed 2020·Granted Nov 1, 2022·2 cites·20 claims
- 2487US11069514B2Remote capacitively coupled plasma source with improved ion blockerAPPLIED MATERIALS INC·Filed 2019·Granted Jul 20, 2021·3 cites·19 claims
- 2587US10600624B2System and method for substrate processing chambersAPPLIED MATERIALS INC·Filed 2018·Granted Mar 24, 2020·5 cites·22 claims
- 2687US7259111B2Interface engineering to improve adhesion between low k stacksAPPLIED MATERIALS INC·Filed 2005·Granted Aug 21, 2007·14 cites·17 claims
- 2786US9698571B2Triggered arc flash arrester and shield element for use therewithEATON CORP·Filed 2015·Granted Jul 4, 2017·2 cites·13 claims
- 2886US9390910B2Gas flow profile modulated control of overlay in plasma CVD filmsAPPLIED MATERIALS INC·Filed 2014·Granted Jul 12, 2016·5 cites·20 claims
- 2985US11898249B2PECVD processAPPLIED MATERIALS INC·Filed 2023·Granted Feb 13, 2024·0 cites·17 claims
- 3085US11451389B2Multi-encrypted message response managerBANK OF AMERICA·Filed 2020·Granted Sep 20, 2022·2 cites·20 claims
- 3184US8282734B2Methods to improve the in-film defectivity of PECVD amorphous carbon filmsPADHI DEENESH·Filed 2008·Granted Oct 9, 2012·6 cites·8 claims
- 3284US7699935B2Method and system for supplying a cleaning gas into a process chamberAPPLIED MATERIALS INC·Filed 2008·Granted Apr 20, 2010·3 cites·6 claims
- 3384US7166544B2Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursorsAPPLIED MATERIALS INC·Filed 2004·Granted Jan 23, 2007·20 cites·22 claims
- 3483US11784229B2Profile shaping for control gate recessesAPPLIED MATERIALS INC·Filed 2020·Granted Oct 10, 2023·1 cites·11 claims
- 3583US11646216B2Systems and methods of seasoning electrostatic chucks with dielectric seasoning filmsAPPLIED MATERIALS INC·Filed 2020·Granted May 9, 2023·1 cites·14 claims
- 3683US11592812B2Sensor metrology data integrationAPPLIED MATERIALS INC·Filed 2020·Granted Feb 28, 2023·2 cites·20 claims
- 3783US10892143B2Technique to prevent aluminum fluoride build up on the heaterAPPLIED MATERIALS INC·Filed 2017·Granted Jan 12, 2021·1 cites·17 claims
- 3882US10373822B2Gas flow profile modulated control of overlay in plasma CVD filmsAPPLIED MATERIALS INC·Filed 2017·Granted Aug 6, 2019·2 cites·18 claims
- 3980US12400843B2Chamber configurations and processes for particle controlAPPLIED MATERIALS INC·Filed 2023·Granted Aug 26, 2025·0 cites·19 claims
- 4080US10748797B2Plasma parameters and skew characterization by high speed imagingAPPLIED MATERIALS INC·Filed 2018·Granted Aug 18, 2020·2 cites·10 claims
- 4180US10094486B2Method and system for supplying a cleaning gas into a process chamberAPPLIED MATERIALS INC·Filed 2015·Granted Oct 9, 2018·1 cites·14 claims
- 4280US9922819B2Wafer rotation in a semiconductor chamberAPPLIED MATERIALS INC·Filed 2017·Granted Mar 20, 2018·2 cites·20 claims
- 4379US10796867B1Coil-type axial magnetic field contact assembly for vacuum interrupterEATON INTELLIGENT POWER LTD·Filed 2019·Granted Oct 6, 2020·2 cites·22 claims
- 4479US10580623B2Plasma processing using multiple radio frequency power feeds for improved uniformityAPPLIED MATERIALS INC·Filed 2014·Granted Mar 3, 2020·3 cites·11 claims
- 4579US7922440B2Apparatus and method for centering a substrate in a process chamberAPPLIED MATERIALS INC·Filed 2008·Granted Apr 12, 2011·6 cites·20 claims
- 4679US7514125B2Methods to improve the in-film defectivity of PECVD amorphous carbon filmsAPPLIED MATERIALS INC·Filed 2007·Granted Apr 7, 2009·2 cites·7 claims
- 4779US7273823B2Situ oxide cap layer developmentAPPLIED MATERIALS INC·Filed 2005·Granted Sep 25, 2007·3 cites·20 claims
- 4879US2025271847A1Data intergrationAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 4978US10636630B2Processing chamber and method with thermal controlAPPLIED MATERIALS INC·Filed 2018·Granted Apr 28, 2020·2 cites·15 claims
- 5078US9593419B2Wafer rotation in a semiconductor chamberAPPLIED MATERIALS INC·Filed 2015·Granted Mar 14, 2017·2 cites·11 claims
Showing the top 50 of 157 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →