Inventor · disambiguated record
Sheeba J. Panayil
Also filed as: PANAYIL SHEEBA · PANAYIL SHEEBA J
15 granted patents·1 pending application·143 citations·filing 2002–2015
92Inventor score
Top patents by PatentIndex Score
16 records- 0192US7909961B2Method and apparatus for photomask plasma etchingAPPLIED MATERIALS INC·Filed 2006·Granted Mar 22, 2011·21 cites·4 claims
- 0291US7976671B2Mask etch plasma reactor with variable process gas distributionAPPLIED MATERIALS INC·Filed 2006·Granted Jul 12, 2011·20 cites·16 claims
- 0391US7520999B2Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one anotherAPPLIED MATERIALS INC·Filed 2006·Granted Apr 21, 2009·16 cites·20 claims
- 0490US7943005B2Method and apparatus for photomask plasma etchingAPPLIED MATERIALS INC·Filed 2006·Granted May 17, 2011·15 cites·19 claims
- 0589US9218944B2Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensorsCHANDRACHOOD MADHAVI R·Filed 2006·Granted Dec 22, 2015·15 cites·12 claims
- 0687US7504041B2Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicatorAPPLIED MATERIALS INC·Filed 2006·Granted Mar 17, 2009·13 cites·15 claims
- 0787US7341907B2Single wafer thermal CVD processes for hemispherical grained silicon and nano-crystalline grain-sized polysiliconAPPLIED MATERIALS INC·Filed 2005·Granted Mar 11, 2008·16 cites·20 claims
- 0883US8017029B2Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backsideAPPLIED MATERIALS INC·Filed 2006·Granted Sep 13, 2011·7 cites·19 claims
- 0981US7335266B2Method of forming a controlled and uniform lightly phosphorous doped silicon filmAPPLIED MATERIALS INC·Filed 2005·Granted Feb 26, 2008·7 cites·6 claims
- 1072US7419551B2Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one anotherAPPLIED MATERIALS INC·Filed 2006·Granted Sep 2, 2008·4 cites·16 claims
- 1165US7431797B2Plasma reactor with a dynamically adjustable plasma source power applicatorAPPLIED MATERIALS INC·Filed 2006·Granted Oct 7, 2008·2 cites·19 claims
- 1262US6982214B2Method of forming a controlled and uniform lightly phosphorous doped silicon filmAPPLIED MATERIALS INC·Filed 2002·Granted Jan 3, 2006·7 cites·15 claims
- 1348US10170280B2Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wallAPPLIED MATERIALS INC·Filed 2015·Granted Jan 1, 2019·0 cites·15 claims
- 1448US8568553B2Method and apparatus for photomask plasma etchingKUMAR AJAY·Filed 2011·Granted Oct 29, 2013·0 cites·20 claims
- 1546US2007287271A1Deposition of nano-crystal silicon using a single wafer chamberPANAYIL SHEEBA J·Filed 2007·Application pending·0 cites
- 1641US7265036B2Deposition of nano-crystal silicon using a single wafer chamberAPPLIED MATERIALS INC·Filed 2004·Granted Sep 4, 2007·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →