Inventor · disambiguated record
Rajeev Bajaj
Also filed as: BAJAJ RAJEEV
112 granted patents·53 pending applications·3,118 citations·filing 1996–2025
99Inventor score
Top patents by PatentIndex Score
165 records- 0199US11745302B2Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing processAPPLIED MATERIALS INC·Filed 2021·Granted Sep 5, 2023·5 cites·20 claims
- 0299US10456886B2Porous chemical mechanical polishing padsAPPLIED MATERIALS INC·Filed 2016·Granted Oct 29, 2019·26 cites·20 claims
- 0399US10399201B2Advanced polishing pads having compositional gradients by use of an additive manufacturing processAPPLIED MATERIALS INC·Filed 2016·Granted Sep 3, 2019·24 cites·21 claims
- 0499US10391605B2Method and apparatus for forming porous advanced polishing pads using an additive manufacturing processAPPLIED MATERIALS INC·Filed 2016·Granted Aug 27, 2019·19 cites·12 claims
- 0599US10029405B2Printing a chemical mechanical polishing padAPPLIED MATERIALS INC·Filed 2017·Granted Jul 24, 2018·24 cites·13 claims
- 0699US9744724B2Apparatus for printing a chemical mechanical polishing padAPPLIED MATERIALS INC·Filed 2016·Granted Aug 29, 2017·42 cites·20 claims
- 0799US9457520B2Apparatus for printing a chemical mechanical polishing padAPPLIED MATERIALS INC·Filed 2015·Granted Oct 4, 2016·48 cites·16 claims
- 0899US9067299B2Printed chemical mechanical polishing padBAJAJ RAJEEV·Filed 2012·Granted Jun 30, 2015·60 cites·21 claims
- 0999US8075745B2Electro-method and apparatus for improved chemical mechanical planarization pad with uniform polish performanceBAJAJ RAJEEV·Filed 2005·Granted Dec 13, 2011·41 cites·19 claims
- 1098US11724362B2Polishing pads produced by an additive manufacturing processAPPLIED MATERIALS INC·Filed 2020·Granted Aug 15, 2023·5 cites·24 claims
- 1198US10773509B2Pad structure and fabrication methodsAPPLIED MATERIALS INC·Filed 2017·Granted Sep 15, 2020·15 cites·20 claims
- 1298US10537974B2CMP pad construction with composite material properties using additive manufacturing processesAPPLIED MATERIALS INC·Filed 2018·Granted Jan 21, 2020·17 cites·8 claims
- 1398US10493691B2Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articlesAPPLIED MATERIALS INC·Filed 2017·Granted Dec 3, 2019·16 cites·16 claims
- 1498US9873180B2CMP pad construction with composite material properties using additive manufacturing processesAPPLIED MATERIALS INC·Filed 2015·Granted Jan 23, 2018·41 cites·20 claims
- 1598US9776361B2Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articlesAPPLIED MATERIALS INC·Filed 2015·Granted Oct 3, 2017·21 cites·19 claims
- 1698US8292692B2Polishing pad with endpoint window and systems and method using the sameBAJAJ RAJEEV·Filed 2009·Granted Oct 23, 2012·38 cites·10 claims
- 1798US8177603B2Polishing pad compositionBAJAJ RAJEEV·Filed 2009·Granted May 15, 2012·37 cites·14 claims
- 1898US8066555B2Polishing padBAJAJ RAJEEV·Filed 2008·Granted Nov 29, 2011·43 cites·10 claims
- 1998US7846008B2Method and apparatus for improved chemical mechanical planarization and CMP padSEMIQUEST INC·Filed 2007·Granted Dec 7, 2010·52 cites·32 claims
- 2098US6602724B2Chemical mechanical polishing of a metal layer with polishing rate monitoringAPPLIED MATERIALS INC·Filed 2001·Granted Aug 5, 2003·95 cites·14 claims
- 2197US10953515B2Apparatus and method of forming a polishing pads by use of an additive manufacturing processAPPLIED MATERIALS INC·Filed 2016·Granted Mar 23, 2021·16 cites·29 claims
- 2297US10875145B2Polishing pads produced by an additive manufacturing processAPPLIED MATERIALS INC·Filed 2015·Granted Dec 29, 2020·17 cites·19 claims
- 2397US10875153B2Advanced polishing pad materials and formulationsAPPLIED MATERIALS INC·Filed 2016·Granted Dec 29, 2020·16 cites·21 claims
- 2497US10821573B2Polishing pads produced by an additive manufacturing processAPPLIED MATERIALS INC·Filed 2015·Granted Nov 3, 2020·17 cites·25 claims
- 2597US10618141B2Apparatus for forming a polishing article that has a desired zeta potentialAPPLIED MATERIALS INC·Filed 2016·Granted Apr 14, 2020·18 cites·20 claims
- 2697US10384330B2Polishing pads produced by an additive manufacturing processAPPLIED MATERIALS INC·Filed 2015·Granted Aug 20, 2019·22 cites·22 claims
- 2797US10322491B2Printed chemical mechanical polishing padAPPLIED MATERIALS INC·Filed 2015·Granted Jun 18, 2019·17 cites·17 claims
- 2897US9296085B2Polishing pad with homogeneous body having discrete protrusions thereonBAJAJ RAJEEV·Filed 2014·Granted Mar 29, 2016·32 cites·16 claims
- 2997US7815778B2Electro-chemical mechanical planarization pad with uniform polish performanceSEMIQUEST INC·Filed 2006·Granted Oct 19, 2010·44 cites·20 claims
- 3097US6537144B1Method and apparatus for enhanced CMP using metals having reductive propertiesAPPLIED MATERIALS INC·Filed 2000·Granted Mar 25, 2003·145 cites·32 claims
- 3197US6068539AWafer polishing device with movable windowLAM RES CORP·Filed 1998·Granted May 30, 2000·200 cites·35 claims
- 3296US10593574B2Techniques for combining CMP process tracking data with 3D printed CMP consumablesAPPLIED MATERIALS INC·Filed 2015·Granted Mar 17, 2020·19 cites·27 claims
- 3396US6254459B1Wafer polishing device with movable windowLAM RES CORP·Filed 1999·Granted Jul 3, 2001·143 cites·20 claims
- 3496US6001730AChemical mechanical polishing (CMP) slurry for polishing copper interconnects which use tantalum-based barrier layersMOTOROLA INC·Filed 1997·Granted Dec 14, 1999·324 cites·32 claims
- 3595US11673225B2Printing a chemical mechanical polishing padAPPLIED MATERIALS INC·Filed 2021·Granted Jun 13, 2023·1 cites·17 claims
- 3695US11207758B2Printing a chemical mechanical polishing padAPPLIED MATERIALS INC·Filed 2020·Granted Dec 28, 2021·2 cites·21 claims
- 3795US10919123B2Piezo-electric end-pointing for 3D printed CMP padsAPPLIED MATERIALS INC·Filed 2019·Granted Feb 16, 2021·17 cites·12 claims
- 3895US10086500B2Method of manufacturing a UV curable CMP polishing padAPPLIED MATERIALS INC·Filed 2014·Granted Oct 2, 2018·14 cites·16 claims
- 3995US7530880B2Method and apparatus for improved chemical mechanical planarization pad with pressure control and process monitorSEMIQUEST INC·Filed 2005·Granted May 12, 2009·54 cites·21 claims
- 4095US6569349B1Additives to CMP slurry to polish dielectric filmsAPPLIED MATERIALS INC·Filed 2000·Granted May 27, 2003·92 cites·5 claims
- 4195US5897375AChemical mechanical polishing (CMP) slurry for copper and method of use in integrated circuit manufactureMOTOROLA INC·Filed 1997·Granted Apr 27, 1999·338 cites·32 claims
- 4294US10843306B2Printing a chemical mechanical polishing padAPPLIED MATERIALS INC·Filed 2018·Granted Nov 24, 2020·3 cites·23 claims
- 4394US10500694B2Chemical mechanical polishing apparatus and methodsAPPLIED MATERIALS INC·Filed 2017·Granted Dec 10, 2019·7 cites·15 claims
- 4494US8920219B2Polishing pad with alignment apertureALLISON WILLIAM C·Filed 2011·Granted Dec 30, 2014·13 cites·17 claims
- 4594US8398463B2Pad conditioner and methodBAJAJ RAJEEV·Filed 2009·Granted Mar 19, 2013·14 cites·8 claims
- 4694US6561873B2Method and apparatus for enhanced CMP using metals having reductive propertiesAPPLIED MATERIALS INC·Filed 2002·Granted May 13, 2003·66 cites·54 claims
- 4793US11446788B2Precursor formulations for polishing pads produced by an additive manufacturing processAPPLIED MATERIALS INC·Filed 2019·Granted Sep 20, 2022·3 cites·18 claims
- 4892US9669512B2CMP pads having material composition that facilitates controlled conditioningAPPLIED MATERIALS INC·Filed 2014·Granted Jun 6, 2017·16 cites·26 claims
- 4990US6585574B1Polishing pad with reduced moisture absorptionFiled 2000·Granted Jul 1, 2003·51 cites·20 claims
- 5089US6638143B2Ion exchange materials for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2000·Granted Oct 28, 2003·41 cites·18 claims
Showing the top 50 of 165 patent records by PatentIndex Score.
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