Assignee
BAJAJ RAJEEV
US·11 granted patents·10 pending applications·277 citations·filing 2005–2023
Top patents by PatentIndex Score
21 records- 0199US9067299B2Printed chemical mechanical polishing padBAJAJ RAJEEV·Filed 2012·Granted Jun 30, 2015·60 cites·21 claims
- 0299US8075745B2Electro-method and apparatus for improved chemical mechanical planarization pad with uniform polish performanceBAJAJ RAJEEV·Filed 2005·Granted Dec 13, 2011·41 cites·19 claims
- 0398US8292692B2Polishing pad with endpoint window and systems and method using the sameBAJAJ RAJEEV·Filed 2009·Granted Oct 23, 2012·38 cites·10 claims
- 0498US8177603B2Polishing pad compositionBAJAJ RAJEEV·Filed 2009·Granted May 15, 2012·37 cites·14 claims
- 0598US8066555B2Polishing padBAJAJ RAJEEV·Filed 2008·Granted Nov 29, 2011·43 cites·10 claims
- 0697US9296085B2Polishing pad with homogeneous body having discrete protrusions thereonBAJAJ RAJEEV·Filed 2014·Granted Mar 29, 2016·32 cites·16 claims
- 0794US8398463B2Pad conditioner and methodBAJAJ RAJEEV·Filed 2009·Granted Mar 19, 2013·14 cites·8 claims
- 0879US7762871B2Pad conditioner design and method of useBAJAJ RAJEEV·Filed 2006·Granted Jul 27, 2010·5 cites·8 claims
- 0977US7759165B1NanospringBAJAJ RAJEEV·Filed 2009·Granted Jul 20, 2010·7 cites·24 claims
- 1068US2025073842A1Multilayer cmp padsBAJAJ RAJEEV·Filed 2023·Application pending·0 cites
- 1159US9162344B2Method and apparatus for CMP conditioningBAJAJ RAJEEV·Filed 2013·Granted Oct 20, 2015·0 cites·21 claims
- 1258US2009266002A1Polishing pad and method of useBAJAJ RAJEEV·Filed 2009·Application pending·0 cites
- 1356US10226853B2Methods and apparatus for conditioning of chemical mechanical polishing padsBAJAJ RAJEEV·Filed 2013·Granted Mar 12, 2019·0 cites·21 claims
- 1456US2024381994A1Post cmp brush and method of manufacturingBAJAJ RAJEEV·Filed 2022·Application pending·0 cites
- 1552US2009061744A1Polishing pad and method of useBAJAJ RAJEEV·Filed 2007·Application pending·0 cites
- 1652US2012302148A1Polishing pad with homogeneous body having discrete protrusions thereonBAJAJ RAJEEV·Filed 2011·Application pending·0 cites
- 1748US2007224925A1Chemical Mechanical Polishing PadBAJAJ RAJEEV·Filed 2006·Application pending·0 cites
- 1848US2011143539A1Polishing pad with endpoint window and systems and methods using the sameBAJAJ RAJEEV·Filed 2009·Application pending·0 cites
- 1948US2011244768A1Polishing pad and method of useBAJAJ RAJEEV·Filed 2011·Application pending·0 cites
- 2046US2008318505A1Chemical mechanical planarization pad and method of use thereofBAJAJ RAJEEV·Filed 2008·Application pending·0 cites
- 2145US2009011679A1Method of removal profile modulation in cmp padsBAJAJ RAJEEV·Filed 2008·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →