Inventor · disambiguated record
Mario D. Sanchez
Also filed as: SANCHEZ MARIO D · SANCHEZ Mario Dan
10 granted patents·2 pending applications·7 citations·filing 2015–2023
80Inventor score
Files withAPPLIED MATERIALS INC12
Top patents by PatentIndex Score
12 records- 0192US11384432B2Atomic layer deposition chamber with funnel-shaped gas dispersion channel and gas distribution plateAPPLIED MATERIALS INC·Filed 2015·Granted Jul 12, 2022·5 cites·20 claims
- 0280US11732358B2High temperature chemical vapor deposition lidAPPLIED MATERIALS INC·Filed 2022·Granted Aug 22, 2023·0 cites·15 claims
- 0379US10704142B2Quick disconnect resistance temperature detector assembly for rotating pedestalAPPLIED MATERIALS INC·Filed 2017·Granted Jul 7, 2020·2 cites·20 claims
- 0475US11932939B2Lids and lid assembly kits for atomic layer deposition chambersAPPLIED MATERIALS INC·Filed 2021·Granted Mar 19, 2024·0 cites·20 claims
- 0573US11447866B2High temperature chemical vapor deposition lidAPPLIED MATERIALS INC·Filed 2021·Granted Sep 20, 2022·0 cites·20 claims
- 0672US11719255B2Pumping liner for improved flow uniformityAPPLIED MATERIALS INC·Filed 2022·Granted Aug 8, 2023·0 cites·18 claims
- 0770US12054826B2ALD cycle time reduction using process chamber lid with tunable pumpingAPPLIED MATERIALS INC·Filed 2023·Granted Aug 6, 2024·0 cites·15 claims
- 0870US11415147B2Pumping liner for improved flow uniformityAPPLIED MATERIALS INC·Filed 2020·Granted Aug 16, 2022·0 cites·17 claims
- 0955US10755947B2Methods of increasing selectivity for selective etch processesAPPLIED MATERIALS INC·Filed 2019·Granted Aug 25, 2020·0 cites·20 claims
- 1054US11767590B2ALD cycle time reduction using process chamber lid with tunable pumpingAPPLIED MATERIALS INC·Filed 2020·Granted Sep 26, 2023·0 cites·19 claims
- 1150US2023307216A1Enhanced chamber clean and recovery with dual flow pathAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1249US2019048467A1Showerhead and process chamber incorporating sameAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →