Inventor · disambiguated record
Agus Sofian Tjandra
Also filed as: TJANDRA AGUS · TJANDRA AGUS S · TJANDRA AGUS SOFIAN
26 granted patents·7 pending applications·109 citations·filing 2005–2023
95Inventor score
Top patents by PatentIndex Score
33 records- 0195US11049696B2Dogbone inlet cone profile for remote plasma oxidation chamberAPPLIED MATERIALS INC·Filed 2020·Granted Jun 29, 2021·3 cites·20 claims
- 0292US10636626B2Dogbone inlet cone profile for remote plasma oxidation chamberAPPLIED MATERIALS INC·Filed 2018·Granted Apr 28, 2020·3 cites·13 claims
- 0392US7509035B2Lamp array for thermal processing exhibiting improved radial uniformityAPPLIED MATERIALS INC·Filed 2005·Granted Mar 24, 2009·37 cites·9 claims
- 0490US11732355B2Method and apparatus for supplying improved gas flow to a processing volume of a processing chamberAPPLIED MATERIALS INC·Filed 2019·Granted Aug 22, 2023·5 cites·20 claims
- 0590US8056500B2Thermal reactor with improved gas flow distributionTSENG MING-KUEI MICHAEL·Filed 2008·Granted Nov 15, 2011·17 cites·20 claims
- 0689US8608853B2Thermal reactor with improved gas flow distributionTSENG MING-KUEI MICHAEL·Filed 2011·Granted Dec 17, 2013·10 cites·15 claims
- 0787US8888916B2Thermal reactor with improved gas flow distributionAPPLIED MATERIALS INC·Filed 2013·Granted Nov 18, 2014·6 cites·20 claims
- 0886US11501954B2Dogbone inlet cone profile for remote plasma oxidation chamberAPPLIED MATERIALS INC·Filed 2021·Granted Nov 15, 2022·1 cites·20 claims
- 0986US9123758B2Gas injection apparatus and substrate process chamber incorporating sameAPPLIED MATERIALS INC·Filed 2014·Granted Sep 1, 2015·7 cites·18 claims
- 1084US11501945B2Side inject designs for improved radical concentrationsAPPLIED MATERIALS INC·Filed 2020·Granted Nov 15, 2022·1 cites·14 claims
- 1184US8492292B2Methods of forming oxide layers on substratesYOKOTA YOSHITAKA·Filed 2010·Granted Jul 23, 2013·7 cites·19 claims
- 1283US9514968B2Methods and apparatus for selective oxidation of a substrateAPPLIED MATERIALS INC·Filed 2015·Granted Dec 6, 2016·3 cites·11 claims
- 1380US10847337B2Side inject designs for improved radical concentrationsAPPLIED MATERIALS INC·Filed 2019·Granted Nov 24, 2020·2 cites·20 claims
- 1478US10260149B2Side inject nozzle design for processing chamberAPPLIED MATERIALS INC·Filed 2017·Granted Apr 16, 2019·2 cites·8 claims
- 1571US11268193B2Gas injection apparatus with heating channelsAPPLIED MATERIALS INC·Filed 2020·Granted Mar 8, 2022·0 cites·13 claims
- 1671US10020186B2Silicon germanium selective oxidation processAPPLIED MATERIALS INC·Filed 2017·Granted Jul 10, 2018·1 cites·18 claims
- 1770US10689757B2Gas injection apparatus with heating channelsAPPLIED MATERIALS INC·Filed 2017·Granted Jun 23, 2020·0 cites·20 claims
- 1863US8435906B2Methods for forming conformal oxide layers on semiconductor devicesTJANDRA AGUS S·Filed 2010·Granted May 7, 2013·2 cites·15 claims
- 1956US11091835B2Side inject nozzle design for processing chamberAPPLIED MATERIALS INC·Filed 2019·Granted Aug 17, 2021·0 cites·9 claims
- 2056US10600641B2Silicon germanium selective oxidation processAPPLIED MATERIALS INC·Filed 2018·Granted Mar 24, 2020·0 cites·16 claims
- 2154US8993458B2Methods and apparatus for selective oxidation of a substrateAPPLIED MATERIALS INC·Filed 2013·Granted Mar 31, 2015·0 cites·13 claims
- 2253US2022375870A1Gap-fill for 3d nand staircaseIntel NDTM US LLC·Filed 2022·Application pending·0 cites
- 2352US10714333B2Apparatus and method for selective oxidation at lower temperature using remote plasma sourceAPPLIED MATERIALS INC·Filed 2016·Granted Jul 14, 2020·0 cites·17 claims
- 2451US2023282578A1Engineered dielectric profile for high aspect-ratio 3d nand structuresIntel NDTM US LLC·Filed 2023·Application pending·0 cites
- 2548US9869017B2H2/O2 side inject to improve process uniformity for low temperature oxidation processAPPLIED MATERIALS INC·Filed 2015·Granted Jan 16, 2018·0 cites·17 claims
- 2647US2010120245A1Plasma and thermal anneal treatment to improve oxidation resistance of metal-containing filmsTJANDRA AGUS SOFIAN·Filed 2008·Application pending·0 cites
- 2745US2014034632A1Apparatus and method for selective oxidation at lower temperature using remote plasma sourcePAN HENG·Filed 2013·Application pending·0 cites
- 2844US2014349491A1Methods and apparatus for selective oxidation of a substrateAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 2943USD1023987SChamber inletAPPLIED MATERIALS INC·Filed 2021·Granted Apr 23, 2024·0 cites·1 claims
- 3043US2019295822A1Method and apparatus for providing radical species to a processing volume of a processing chamberAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 3142US11615944B2Remote plasma oxidation chamberAPPLIED MATERIALS INC·Filed 2018·Granted Mar 28, 2023·0 cites·20 claims
- 3241USD924825SChamber inletAPPLIED MATERIALS INC·Filed 2018·Granted Jul 13, 2021·2 cites·1 claims
- 3337US2006240680A1Substrate processing platform allowing processing in different ambientsAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
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