Inventor · disambiguated record
Ioana Graur
Also filed as: GRAUR IOANA · GRAUR IOANA C
35 granted patents·1 pending application·1,109 citations·filing 1997–2017
98Inventor score
Top patents by PatentIndex Score
36 records- 0199US6993741B2Generating mask patterns for alternating phase-shift mask lithographyIBM·Filed 2003·Granted Jan 31, 2006·313 cites·14 claims
- 0297US7115343B2Pliant SRAF for improved performance and manufacturabilityIBM·Filed 2004·Granted Oct 3, 2006·188 cites·17 claims
- 0394US7624369B2Closed-loop design for manufacturability processIBM·Filed 2006·Granted Nov 24, 2009·46 cites·21 claims
- 0494US5923566APhase shifted design verification routineIBM·Filed 1997·Granted Jul 13, 1999·138 cites·8 claims
- 0592US9690898B2Generative learning for realistic and ground rule clean hot spot synthesisGLOBALFOUNDRIES INC·Filed 2015·Granted Jun 27, 2017·13 cites·19 claims
- 0692US8078995B2Efficient isotropic modeling approach to incorporate electromagnetic effects into lithographic process simulationsTIRAPU AZPIROZ JAIONE·Filed 2009·Granted Dec 13, 2011·19 cites·42 claims
- 0791US10386714B2Creating knowledge base for optical proximity correction to reduce sub-resolution assist feature printingGLOBALFOUNDRIES INC·Filed 2017·Granted Aug 20, 2019·6 cites·20 claims
- 0891US7687207B2System for coloring a partially colored design in an alternating phase shift maskIBM·Filed 2008·Granted Mar 30, 2010·12 cites·13 claims
- 0989US6057063APhase shifted mask design system, phase shifted mask and VLSI circuit devices manufactured therewithIBM·Filed 1997·Granted May 2, 2000·171 cites·32 claims
- 1088US8392871B2Decomposition with multiple exposures in a process window based OPC flow using tolerance bandsMANSFIELD SCOTT M·Filed 2010·Granted Mar 5, 2013·7 cites·14 claims
- 1188US7650587B2Local coloring for hierarchical OPCIBM·Filed 2006·Granted Jan 19, 2010·10 cites·3 claims
- 1286US7266798B2Designer's intent tolerance bands for proximity correction and checkingIBM·Filed 2005·Granted Sep 4, 2007·15 cites·36 claims
- 1386US6996797B1Method for verification of resolution enhancement techniques and optical proximity correction in lithographyIBM·Filed 2004·Granted Feb 7, 2006·25 cites·20 claims
- 1486US6901576B2Phase-width balanced alternating phase shift mask designIBM·Filed 2002·Granted May 31, 2005·26 cites·20 claims
- 1586US6757886B2Alternating phase shift mask design with optimized phase shapesIBM·Filed 2001·Granted Jun 29, 2004·23 cites·16 claims
- 1685US6609245B2Priority coloring for VLSI designsIBM·Filed 2001·Granted Aug 19, 2003·24 cites·18 claims
- 1781US8108804B2Short path customized mask correctionGRAUR IOANA·Filed 2009·Granted Jan 31, 2012·6 cites·13 claims
- 1880US7607114B2Designer's intent tolerance bands for proximity correction and checkingIBM·Filed 2007·Granted Oct 20, 2009·9 cites·36 claims
- 1980US7378195B2System for coloring a partially colored design in an alternating phase shift maskIBM·Filed 2004·Granted May 27, 2008·16 cites·17 claims
- 2077US7305334B2Methodology for image fidelity verificationIBM·Filed 2005·Granted Dec 4, 2007·7 cites·9 claims
- 2176US10042973B2Expansion of allowed design rule space by waiving benign geometriesGLOBALFOUNDRIES INC·Filed 2016·Granted Aug 7, 2018·2 cites·19 claims
- 2276US6795961B2Priority coloring for VLSI designsIBM·Filed 2003·Granted Sep 21, 2004·13 cites·2 claims
- 2374US9904757B2Test patterns for determining sizing and spacing of sub-resolution assist features (SRAFs)GLOBALFOUNDRIES INC·Filed 2015·Granted Feb 27, 2018·2 cites·20 claims
- 2470US7475380B2Generating mask patterns for alternating phase-shift mask lithographyIBM·Filed 2005·Granted Jan 6, 2009·2 cites·3 claims
- 2566US8166423B2Photomask design verificationMANSFIELD SCOTT M·Filed 2009·Granted Apr 24, 2012·2 cites·20 claims
- 2664US9928316B2Process-metrology reproducibility bands for lithographic photomasksIBM·Filed 2015·Granted Mar 27, 2018·1 cites·15 claims
- 2764US8059884B2Method and system for obtaining bounds on process parameters for OPC-verificationMUKHERJEE MAHARAJ·Filed 2007·Granted Nov 15, 2011·1 cites·21 claims
- 2860US8174681B2Calibration of lithographic process modelsGRAUR IOANA·Filed 2009·Granted May 8, 2012·1 cites·10 claims
- 2960US7860701B2Methodology for image fidelity verificationIBM·Filed 2007·Granted Dec 28, 2010·1 cites·9 claims
- 3059US7175942B2Method of conflict avoidance in fabrication of gate-shrink alternating phase shifting masksIBM·Filed 2004·Granted Feb 13, 2007·5 cites·20 claims
- 3158US9087739B2Pattern improvement in multiprocess patterningDUNN DERREN N·Filed 2009·Granted Jul 21, 2015·1 cites·10 claims
- 3256US6927005B2Alternating phase shift mask design with optimized phase shapesIBM·Filed 2004·Granted Aug 9, 2005·3 cites·3 claims
- 3354US10210292B2Process-metrology reproducibility bands for lithographic photomasksIBM·Filed 2017·Granted Feb 19, 2019·0 cites·15 claims
- 3452US9034562B2Pattern improvement in multiprocess patterningIBM·Filed 2013·Granted May 19, 2015·0 cites·3 claims
- 3551US9330225B2Photomask error correctionIBM·Filed 2014·Granted May 3, 2016·1 cites·19 claims
- 3645US2009037866A1Alternating phase shift mask optimization for improved process windowIBM·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →